Patents by Inventor Chengwei ZHAO

Chengwei ZHAO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • BIOELECTRODE FOR INCREASING ABUNDANCE OF CABLE BACTERIA AND USING METHOD THEREOF
    Publication number: 20240166987
    Abstract: The present invention relates to a bioelectrode for increasing abundance of cable bacteria, including an anode, a cathode, and a partition. The anode is horizontally disposed, and the cathode is disposed perpendicular to the anode. The anode and the cathode are separated by using the partition. An objective of the present invention is to provide a method for keeping a high abundance of the cable bacteria in sediments when oxygen content of overlying water is low and even in an anaerobic environment. The method can be further performed in a self-starting manner, and has a potential application prospect in ecological remediation of sediments.
    Type: Application
    Filed: September 26, 2023
    Publication date: May 23, 2024
    Inventors: HUAN WANG, YANG ZHOU, LIJUN ZHU, SHAOFENG LI, LIUYI CHEN, CANLIANG HUANG, QIANWEN ZHAO, CHENGWEI YAN
  • Super-resolution imaging photolithography
    Patent number: 9958784
    Abstract: Provided are apparatuses and methods for super resolution imaging photolithography. An exemplary apparatus may include an illumination light generation device configured to generate illumination light for imaging a pattern included in a mask through the mask. The illumination light may include a high-frequency spatial spectrum such that a high-frequency evanescent wave component of spatial spectrum information for the light is converted to a low-frequency evanescent wave component after being transmitted through the mask pattern. For example, the illumination light generation device may be configured to form the illumination in accordance with a high numerical aperture (NA) illumination mode and/or a surface plasmon (SP) wave illumination mode.
    Type: Grant
    Filed: September 23, 2014
    Date of Patent: May 1, 2018
    Assignee: THE INSTITUTE OF OPTICS AND ELECTRONICS, CHINESE ACADEMY OF SCIENCES
    Inventors: Xiangang Luo, Changtao Wang, Zeyu Zhao, Yanqin Wang, Mingbo Pu, Na Yao, Ping Gao, Chenggang Hu, Xiong Li, Cheng Huang, Leilei Yang, Liqin Liu, Jiong Wang, Jiayu He, Yunfei Luo, Kaipeng Liu, Chengwei Zhao, Ling Liu, Xiaoliang Ma, Min Wang
  • SUPER-RESOLUTION IMAGING PHOTOLITHOGRAPHY
    Publication number: 20160259253
    Abstract: Provided are apparatuses and methods for super resolution imaging photolithography. An exemplary apparatus may include an illumination light generation device configured to generate illumination light for imaging a pattern included in a mask through the mask. The illumination light may include a high-frequency spatial spectrum such that a high-frequency evanescent wave component of spatial spectrum information for the light is converted to a low-frequency evanescent wave component after being transmitted through the mask pattern. For example, the illumination light generation device may be configured to form the illumination in accordance with a high numerical aperture (NA) illumination mode and/or a surface plasmon (SP) wave illumination mode.
    Type: Application
    Filed: September 23, 2014
    Publication date: September 8, 2016
    Inventors: Xiangang LUO, Changtao WANG, Zeyu ZHAO, Yanqin WANG, Mingbo PU, Na YAO, Ping GAO, Chenggang HU, Xiong LI, Cheng HUANG, Leilei YANG, Liqin LIU, Jiong WANG, Jiayu HE, Yunfei LUO, Kaipeng LIU, Chengwei ZHAO, Ling LIU, Xiaoliang MA, Min WANG