Abstract: A liquid cooling device for cooling a memory module is provided. The liquid cooling device includes a slot, installed on a motherboard, where the memory module is inserted into the slot; a first heat sink and a second heat sink, where the first, second heat sinks dissipate heat from the memory module between the first heat sink and the second heat sink, with the first, second heat sinks abutting the memory module; a liquid cooling plate, movably installed on a side of the slot, covering a top part of the memory module after the memory module is inserted into the slot, for liquid cooling of the first heat sink and the second heat sink; and at least one first fixing clamp, abutting surfaces of the first, second heat sinks, and clamping the first, second heat sinks and the memory module together.

Abstract: A display panel and a manufacturing method thereof, and a display device are provided. The display panel includes a backlight module and an array substrate. The array substrate includes an insulation structure is located in the opening region. A first groove is defined at a side of the insulation structure away from the backlight module. A first insulation layer and a second insulation layer are filled in the first groove. The second insulation layer is located on a side of the first insulation layer close to the backlight module, and a refractive index of the second insulation layer is less than a refractive index of the first insulation layer.

Abstract: An array substrate and a display panel are provided. The array substrate includes a substrate, an array layer, an inorganic insulation layer, a conductive electrode, a passivation layer, and a pixel electrode disposed in sequence. The array layer includes a source electrode and a drain electrode. A first via hole is defined in the array substrate. The first via hole penetrates the passivation layer and the inorganic insulation layer and exposes the drain electrode. The pixel electrode is connected to the drain electrode in the first via hole.

Abstract: A thin-film transistor (TFT) having a vertical structure and an electronic device are provided. The TFT having the vertical structure includes an insulating substrate and an active layer disposed on the insulating substrate. The active layer includes a first conductive part, an active section, and a second conductive part which are stacked. An orthographic projection of the first conductive part on the insulating substrate partly overlaps an orthographic projection of the second conductive part on the insulating substrate. Therefore, contamination ions may be prevented from entering the active section from the insulating substrate during manufacturing processes of the TFT. Thus, reliability of performance of the TFT may be improved.

Abstract: The present application discloses an array substrate, a manufacturing method for array substrate, a display panel, and a display device. The array substrate includes a first conductive layer close to an active layer, a third conductive layer disposed on a side of the first conductive layer away from the active layer, and a second conductive layer disposed between two conductive layers. A light reflectivity of the second conductive layer is greater than a light reflectivity of the first conductive layer and the third conductive layer, and an orthographic projection region of the first conductive layer on the substrate is less than an orthographic projection region of the second conductive layer on the substrate.

Abstract: Embodiments of the present disclosure provide an array substrate, a preparation method thereof, and a display panel, where the array substrate includes a first filter layer, an active layer, and a second filter layer. By reflecting the light to the second filter layer through the first filter layer, and then reflecting the light to the active layer through the second filter layer, the active layer can act as a photosensitive unit to meet a requirement for detecting an ultraviolet intensity in the ambient light.

Abstract: An array substrate and a display panel are provided. The array substrate includes a plurality of recess-shaped light-shielding patterns. An oxide semiconductor layer is correspondingly formed in a recess of one of the light-shielding patterns. In comparison with increasing a plane area for improving light-shielding performance of the light-shielding patterns, an area of an orthographic projection of the recess-shaped light-shielding patterns on the array substrate is smaller. Therefore, an area of a light-transmitting region of the array substrate is greater, thereby increasing an aperture of the array substrate.

Abstract: A 3D display device and a manufacturing method thereof are provided. Metal nanowires perpendicular to each other are provided at the TFT glass substrate side and the CF glass substrate side. The metal nanowires can realize inherent function of polarizers at the TFT glass substrate side and the CF glass substrate side, and can also make the emitted light into stripe-shaped polarized light perpendicular to each other. Therefore, the polarizers, the ?/2 phase retarder with stripes, and the polarizers with stripes and perpendicular polarization that are originally at the TFT glass substrate side and the CF glass substrate side in a 3D polarizer display are excluded. The thickness of the 3D display device is made thinner. Moreover, according to the structural design, polarization effect is not limited by wavelength range of the light. Therefore, 3D stereoscopic display effect is greatly enhanced.

Abstract: The present disclosure provides a display panel and a manufacturing method of the display panel, and the display panel includes an array substrate. The array substrate includes a planarization layer, a first protective layer, a first electrode layer, and a passivation layer. The passivation layer is made of silicon-based inorganic dielectric material. A first protective layer is added between the planarization layer and the first electrode layer to support the first electrode layer.

Abstract: The present disclosure provides a display panel and a manufacturing method of the display panel, and the display panel includes an array substrate. The array substrate includes a planarization layer, a first protective layer, a first electrode layer, and a passivation layer. The passivation layer is made of silicon-based inorganic dielectric material, so as to improve light transmittance of the passivation layer. A first protective layer is added between the planarization layer and the first electrode layer to support the first electrode layer, thereby improving light transmittance of the display panel.

Abstract: A 3D display device and a manufacturing method thereof are provided. Metal nanowires perpendicular to each other are provided at the TFT glass substrate side and the CF glass substrate side. The metal nanowires can realize inherent function of polarizers at the TFT glass substrate side and the CF glass substrate side, and can also make the emitted light into stripe-shaped polarized light perpendicular to each other. Therefore, the polarizers, the ?/2 phase retarder with stripes, and the polarizers with stripes and perpendicular polarization that are originally at the TFT glass substrate side and the CF glass substrate side in a 3D polarizer display are excluded. The thickness of the 3D display device is made thinner. Moreover, according to the structural design, polarization effect is not limited by wavelength range of the light. Therefore, 3D stereoscopic display effect is greatly enhanced.

Abstract: An array substrate and a method of manufacturing the same are provided. The array substrate includes a base substrate, a buffer layer, an active layer, a dielectric insulating layer, and a source/drain layer stacked in sequence. A trench is provided on a surface of the base substrate facing the buffer layer, and the trench is sunk to another surface of the base substrate. The array substrate further includes a gate layer. The gate layer is disposed in the trench of the base substrate. The buffer layer is disposed on the base substrate and totally covers the gate layer.

Abstract: The present disclosure proposes a monomolecular substrate strain sensing device and a manufacturing method thereof. The device includes a substrate, a monomolecular substance, and a Raman spectrometer. The monomolecular substance is attached to a surface of the substrate in a predetermined direction. Two terminals of the monomolecular substance are fixed in the surface of the substrate. The Raman spectrometer is arranged above the substrate. When the monomolecular carbon nanotube is strained, a measured G? peak shift of a monomolecular carbon nanotube represents the strain amount of the substrate. Accordingly, detecting a tiny strain of a microdomain of the substrate is advantageous for improving the production precision and production efficiency of industries.

Abstract: Disclosed is a liquid crystal display device, including a common polarizer, a liquid crystal layer and a backlight module; and the backlight module includes: a diffusion sheet, a multilayer film polarizer, a ?/4 wave plate, a light source, a light guide plate and a reflection sheet; the diffusion sheet is disposed under the liquid crystal layer; the multilayer film polarizer includes a plurality of films disposed right under the diffusion sheet; the ?/4 wave plate is disposed between the multilayer film polarizer and the light guide plate; the light guide plate is disposed under the ?/4 wave plate; and the reflection sheet is disposed under the light guide plate.

Abstract: This application discloses an artificial retinal nerve flexible microelectrode device and a fabrication method thereof. The device includes a flexible transparent substrate and a transparent thin film transistor (TFT) array layer. The transparent TFT array layer is disposed on the flexible transparent substrate and used for connecting with an optic nerve in a human eye to transmit a visual electrical signal to the optic nerve.

Abstract: The present disclosure provides an array substrate and a method for manufacturing the same. By disposing hybrid TFT on the substrate which includes disposing an oxide TFT in a display driving area and disposing an LTPS TFT in a non-display driving area, not only can a driving current of an LCD gate driving circuit be improved, but a leakage current can also be diminished when LCD display pixels are driven. When manufacturing a hybrid TFT structure, a second active layer in the display driving area is disposed on a first active layer, and a semiconductor insulation layer is disposed between the first active layer and the second active layer, so that patterns of the first active layer and the second active layer can be formed by etching through one mask during an etching process, thus reducing manufacturing cost.

Abstract: A manufacturing method for a liquid crystal display panel is disclosed and includes a step forming a refractive index gradient layer, a step forming a gate electrode insulation layer, a step forming a first interlayer dielectric layer, and a step forming a second interlayer dielectric layer. The step forming a refractive index gradient layer includes depositing a silicon nitride layer on a glass substrate, depositing the refractive index gradient layer on the silicon nitride layer. The refractive index gradient layer is silicon oxide, and includes a lower refractive index decremental layer and a lower refractive index constant layer. A refractive index of the decremental layer gradually decreases along a direction away from the silicon nitride layer, the lower refractive index constant layer is on the lower refractive index decremental layer. A reflection rate between light in film layers can be lowered to improve light transmittance of the display panel.

Abstract: A manufacturing method for a liquid crystal display panel is disclosed and includes a step forming a refractive index gradient layer, a step forming a gate electrode insulation layer, a step forming a first interlayer dielectric layer, and a step forming a second interlayer dielectric layer. The step forming a refractive index gradient layer includes depositing a silicon nitride layer on a glass substrate, depositing the refractive index gradient layer on the silicon nitride layer. The refractive index gradient layer is silicon oxide, and includes a lower refractive index decremental layer and a lower refractive index constant layer. A refractive index of the decremental layer gradually decreases along a direction away from the silicon nitride layer, the lower refractive index constant layer is on the lower refractive index decremental layer. A reflection rate between light in film layers can be lowered to improve light transmittance of the display panel.