Patents by Inventor Chenhua Lu

Chenhua Lu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240044038
    Abstract: Disclosed in one embodiment of the present invention is an electroplating apparatus and an electroplating method. The electroplating apparatus comprises a plurality of paddles arranged in parallel. The paddles move in a direction parallel to a substrate, and are used to stir electroplating solution. Within one cycle, the paddles perform reciprocating motion at a set stroke, and the turning points of the reciprocating motion are related to the width of the paddles and the narrowest width of a gap between adjacent paddles. According to the present invention, by designing the size and movement mode of the paddles, the accumulated time in which each corresponding point on the substrate is blocked by the paddles is equal, so that the received quantity of electricity is equal, and thus the consistency of an electroplating height is further improved.
    Type: Application
    Filed: December 13, 2021
    Publication date: February 8, 2024
    Applicant: ACM RESEARCH (SHANGHAI), INC.
    Inventors: Hui Wang, Jian Wang, Zhaowei Jia, Hongchao Yang, Jun Cai, Chenhua Lu, Jiaqi Li, Meng Wu
  • Patent number: 11859303
    Abstract: A plating apparatus for depositing metal on a substrate, comprising a membrane frame (14), a catholyte inlet pipe (30) and a center cap (40). The membrane frame (14) has a center passage (144) which passes through the center of the membrane frame (14). The catholyte inlet pipe (30) is connected to the center passage (144) of the membrane frame (14). The center cap (40) is fixed at the center of the membrane frame (14) and covers over the center passage (144) of the membrane frame (14). The top of the center cap (40) has a plurality of first holes (42). The catholyte inlet pipe (30) supplies catholyte to the center cap (40) through the center passage (144) of the membrane frame (14), and the catholyte is supplied to a center area of the substrate through the first holes (42) of the center cap (40).
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: January 2, 2024
    Assignee: ACM RESEARCH (SHANGHAI), INC.
    Inventors: Zhaowei Jia, Hongchao Yang, Chenhua Lu, Jian Wang, Hui Wang
  • Publication number: 20200354851
    Abstract: A plating apparatus for depositing metal on a substrate, comprising a membrane frame (14), a catholyte inlet pipe (30) and a center cap (40). The membrane frame (14) has a center passage (144) which passes through the center of the membrane frame (14). The catholyte inlet pipe (30) is connected to the center passage (144) of the membrane frame (14). The center cap (40) is fixed at the center of the membrane frame (14) and covers over the center passage (144) of the membrane frame (14). The top of the center cap (40) has a plurality of first holes (42). The catholyte inlet pipe (30) supplies catholyte to the center cap (40) through the center passage (144) of the membrane frame (14), and the catholyte is supplied to a center area of the substrate through the first holes (42) of the center cap (40).
    Type: Application
    Filed: August 30, 2017
    Publication date: November 12, 2020
    Applicant: ACM Research (Shanghai) Inc.
    Inventors: Zhaowei Jia, Hongchao Yang, Chenhua Lu, Jian Wang, Hui Wang