Patents by Inventor Chen-Long Duan

Chen-Long Duan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask defect analysis
    Patent number: 8335369
    Abstract: A method of inspecting a photomask includes directing radiation from a radiation source onto a photomask so that at least a portion of the radiation is transmitted through the photomask. A first photomask image is detected from the transmitted portion of the radiation transmitted through the photomask and perceptible at a second side of the photomask. A second photomask image is created by applying an exposure simulation model to a photomask design. A difference between the first photomask image and the second photomask image is then determined.
    Type: Grant
    Filed: May 10, 2007
    Date of Patent: December 18, 2012
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Liang-Jung Huang, Chen-Long Duan
  • MASK DEFECT ANALYSIS
    Publication number: 20080205743
    Abstract: A method of inspecting a photomask includes directing radiation from a radiation source onto a photomask so that at least a portion of the radiation is transmitted through the photomask. A first photomask image is detected from the transmitted portion of the radiation transmitted through the photomask and perceptible at a second side of the photomask. A second photomask image is created by applying an exposure simulation model to a photomask design. A difference between the first photomask image and the second photomask image is then determined.
    Type: Application
    Filed: May 10, 2007
    Publication date: August 28, 2008
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Liang-Jung Huang, Chen-Long Duan