Patents by Inventor Chenlong WANG

Chenlong WANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11947259
    Abstract: Provided is a photoinitiator composition containing an acylcarbazole derivative and a carbazolyl oxime ester. The photoinitiator composition is used in a photocurable composition, especially a photoresist formulation, and exhibits the best sensibilization effect when the molar ratio of the acylcarbazole derivative to the carbazolyl oxime ester photoinitiator is between 0.1 and 1.4.
    Type: Grant
    Filed: March 17, 2020
    Date of Patent: April 2, 2024
    Assignee: IGM (ANQING) HIGH TECHNOLOGY DEVELOPMENT CO., LTD
    Inventors: Wenchao Zhao, Chenlong Wang, Jiaqi Li, Yonglin Wang
  • Publication number: 20240068078
    Abstract: A die steel with a high thermal diffusion coefficient includes 0.30-0.40 wt. % of C, 0.05-0.10 wt. % of Si, 2.50-3.40 wt. % of Mo, 0.01-0.05 wt. % of Nb, 0.30-0.50 wt. % of Co, 0.01-0.05 wt. % of RE, the rest is Fe and unavoidable impurities, wherein in the die steel, P?0.15 wt. %, S?0.025 wt. %. A preparation method of the die steel includes steps of melting, electroslag remelting, electroslag ingot annealing, forging, spheroidizing annealing, quenching and tempering.
    Type: Application
    Filed: March 9, 2022
    Publication date: February 29, 2024
    Inventors: Shuang LI, Zhen CAO, Zhen WANG, Yanlin Shi, Long LIU, Lulu ZHAO, Ziliang Wang, Yongliang Shi, Chenlong Wang, Yunchang Huo
  • Patent number: 11639331
    Abstract: A diketone oxime ester compound shown in formula I and a manufacturing method therefor, and a photo-curable composition using the compound of formula I as a photoinitiator. The composition has extremely high light sensitivity and relatively low yellowing resistance when applied to prepare a color filter for a light resistance device such as a display screen.
    Type: Grant
    Filed: August 30, 2018
    Date of Patent: May 2, 2023
    Assignee: INSIGHT HIGH TECHNOLOGY CO., LTD
    Inventors: Wenchao Zhao, Jiaqi Li, Chenlong Wang
  • Patent number: 11608395
    Abstract: A polyacrylate macromolecular photoinitiator, a synthesis method therefor, and the use thereof. The polyacrylate macromolecular photoinitiator is free of a component having a molecular weight of less than 1000, and can effectively avoid the introduction of a material having a mall molecular weight in the photoinitiator and the odor and migration contamination produced thereby, the general formula thereof being as shown in formula I.
    Type: Grant
    Filed: September 13, 2018
    Date of Patent: March 21, 2023
    Assignee: INSIGHT HIGH TECHNOLOGY CO., LTD
    Inventors: Chenlong Wang, Wenchao Zhao
  • Publication number: 20220185775
    Abstract: Provided in the present invention is a novel diaroyl carbazole compound, used together with a carbazolyl oxime ester photo initiator to show a significant synergistic initiation effect in a photoresist composition; the best sensitising effect is shown when the molar ratio of the diaroyl carbazole compound and the carbazolyl oxime ester photoinitiator is 0.1-1.
    Type: Application
    Filed: March 17, 2020
    Publication date: June 16, 2022
    Applicant: IGM (ANQING) HIGH TECHNOLOGY DEVELOPMENT CO., LTD.
    Inventors: Wenchao Zhao, Jiaqi Li, Zhongli Ma, Chenlong Wang, Yonglin Wang
  • Publication number: 20220179309
    Abstract: Provided is a photoinitiator composition containing an acylcarbazole derivative and a carbazolyl oxime ester. The photoinitiator composition is used in a photocurable composition, especially a photoresist formulation, and exhibits the best sensibilization effect when the molar ratio of the acylcarbazole derivative to the carbazolyl oxime ester photoinitiator is between 0.1 and 1.4.
    Type: Application
    Filed: March 17, 2020
    Publication date: June 9, 2022
    Applicant: IGM (ANQING) HIGH TECHNOLOGY DEVELOPMENT CO., LTD
    Inventors: Wenchao Zhao, Chenlong Wang, Jiaqi Li, Yonglin Wang
  • Publication number: 20210198193
    Abstract: Involved are a diketone oxime ester compound shown in formula I and a manufacturing method therefor, and a photo-curable composition using the compound of formula I as a photoinitiator. The composition has extremely high light sensitivity and relatively low yellowing resistance when applied to prepare a color filter for a light resistance device such as a display screen.
    Type: Application
    Filed: August 30, 2018
    Publication date: July 1, 2021
    Inventors: Wenchao ZHAO, Jiaqi LI, Chenlong WANG
  • Publication number: 20210147585
    Abstract: A polyacrylate macromolecular photoinitiator, a synthesis method therefor, and the use thereof. The polyacrylate macromolecular photoinitiator is free of a component having a molecular weight of less than 1000, and can effectively avoid the introduction of a material having a mall molecular weight in the photoinitiator and the odor and migration contamination produced thereby, the general formula thereof being as shown in formula I.
    Type: Application
    Filed: September 13, 2018
    Publication date: May 20, 2021
    Applicant: Insight High Technology Co., Ltd
    Inventors: Chenlong WANG, Wenchao ZHAO