Patents by Inventor Cheol-Hwi Ruy

Cheol-Hwi Ruy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SLURRY FOR POLISHING RUTHENIUM AND METHOD FOR POLISHING USING THE SAME
    Publication number: 20090124082
    Abstract: A slurry for polishing a ruthenium layer comprises distilled water, sodium periodate (NaIO4), an abrasive and a pH controlling agent.
    Type: Application
    Filed: June 30, 2008
    Publication date: May 14, 2009
    Applicant: Hynix Semiconductor Inc.
    Inventors: Hyung-Soon PARK, Jin-Woong Kim, Noh-Jung Kwak, Yong-Soo Choi, Jong-Han Shin, Cheol-Hwi Ruy, Jum-Yong Park, Sung-Jun Kim, Jin-Goo Park, In-Kwon Kim, Tae-Young Kwon