Patents by Inventor Cheol-Ki Min

Cheol-Ki Min has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11727557
    Abstract: A defect inspecting apparatus includes a reference image generator configured to generate a first reference image and a second reference image from design layout data. An image inspector is configured to obtain a first inspection image of a first inspection region of a photomask and a second inspection image of a second inspection region of the photomask. An operation processor is configured to extract a first coordinate offset by comparing the first inspection image with the first reference image and to extract a second coordinate offset by comparing the second inspection image with the second reference image.
    Type: Grant
    Filed: May 3, 2022
    Date of Patent: August 15, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kang Won Lee, Cheol Ki Min, Jong Ju Park, Hyon Seok Song
  • Publication number: 20220261976
    Abstract: A defect inspecting apparatus includes a reference image generator configured to generate a first reference image and a second reference image from design layout data. An image inspector is configured to obtain a first inspection image of a first inspection region of a photomask and a second inspection image of a second inspection region of the photomask. An operation processor is configured to extract a first coordinate offset by comparing the first inspection image with the first reference image and to extract a second coordinate offset by comparing the second inspection image with the second reference image.
    Type: Application
    Filed: May 3, 2022
    Publication date: August 18, 2022
    Inventors: KANG WON LEE, CHEOL KI MIN, JONG JU PARK, HYON SEOK SONG
  • Patent number: 11354798
    Abstract: A defect inspecting apparatus includes a reference image generator configured to generate a first reference image and a second reference image from design layout data. An image inspector is configured to obtain a first inspection image of a first inspection region of a photomask and a second inspection image of a second inspection region of the photomask. An operation processor is configured to extract a first coordinate offset by comparing the first inspection image with the first reference image and to extract a second coordinate offset by comparing the second inspection image with the second reference image.
    Type: Grant
    Filed: May 28, 2020
    Date of Patent: June 7, 2022
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kang Won Lee, Cheol Ki Min, Jong Ju Park, Hyon Seok Song
  • Publication number: 20200294219
    Abstract: A defect inspecting apparatus includes a reference image generator configured to generate a first reference image and a second reference image from design layout data. An image inspector is configured to obtain a first inspection image of a first inspection region of a photomask and a second inspection image of a second inspection region of the photomask. An operation processor is configured to extract a first coordinate offset by comparing the first inspection image with the first reference image and to extract a second coordinate offset by comparing the second inspection image with the second reference image.
    Type: Application
    Filed: May 28, 2020
    Publication date: September 17, 2020
    Inventors: KANG WON LEE, Cheol ki Min, Jong Ju Park, Hyon Seok Song
  • Patent number: 10726541
    Abstract: A defect inspecting apparatus includes a reference image generator configured to generate a first reference image and a second reference image from design layout data. An image inspector is configured to obtain a first inspection image of a first inspection region of a photomask and a second inspection image of a second inspection region of the photomask. An operation processor is configured to extract a first coordinate offset by comparing the first inspection image with the first reference image and to extract a second coordinate offset by comparing the second inspection image with the second reference image.
    Type: Grant
    Filed: June 20, 2018
    Date of Patent: July 28, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kang Won Lee, Cheol Ki Min, Jong Ju Park, Hyon Seok Song
  • Publication number: 20190139209
    Abstract: A defect inspecting apparatus includes a reference image generator configured to generate a first reference image and a second reference image from design layout data. An image inspector is configured to obtain a first inspection image of a first inspection region of a photomask and a second inspection image of a second inspection region of the photomask. An operation processor is configured to extract a first coordinate offset by comparing the first inspection image with the first reference image and to extract a second coordinate offset by comparing the second inspection image with the second reference image.
    Type: Application
    Filed: June 20, 2018
    Publication date: May 9, 2019
    Inventors: Kang Won Lee, Cheol Ki Min, Jong Ju Park, Hyon Seok Song
  • Publication number: 20060035316
    Abstract: The present invention relates to human insulin expression plasmids and a method for producing insulin using the same. The plasmids comprise a sequence encoding a compound of the formula R—B—X-A, in which R is a leader peptide of the formula of Met-Thr-Met-Ile-Thr-Y (SEQ ID NO: 36), in which Y is one selected from lysine, arginine, a peptide containing lysine as an amino acid at its C-terminal, or a peptide containing arginine as an amino acid at its C-terminal; B is human insulin B-chain or analogue thereof; X is a peptide connecting B with A; and A is human insulin A-chain or analogue thereof. The method for preparing insulin using the plasmids according to the present invention converts the proinsulin fusion protein into human insulin in a single enzymatic cleavage process and minimizes the generation of by-products after the enzymatic cleavage, thereby producing insulin at a high yield.
    Type: Application
    Filed: November 12, 2003
    Publication date: February 16, 2006
    Inventors: Sang-Yong Lee, Sung-Jin Oh, Chang-Kyu Kim, Young-Jin Son, Kyong-Hee Park, Cheol-Ki Min, Byung-Min Chol, Tae-Won Kang, Jung-Woo Kim