Patents by Inventor Cheol Min CHOI

Cheol Min CHOI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Thinner composition
    Patent number: 10048584
    Abstract: A thinner composition includes propyleneglycol alkylether acetate, cycloketone, and methyl 2-hydroxy isobutyrate. The thinner composition has excellent EBR, RRC, and rework properties, as well as effects of improving photoresist application uniformity, and in particular, exhibiting excellent solubility to photoresist having a high polarity, so as to be applicable to various photoresists.
    Type: Grant
    Filed: August 30, 2016
    Date of Patent: August 14, 2018
    Assignee: DONGWOO FINE-CHEM CO., LTD.
    Inventors: Cheol Min Choi, In Kak Song, Kyong Ho Lee
  • Thinner composition
    Patent number: 9952510
    Abstract: A thinner composition includes propyleneglycol C1-C10 alkylether, C1-C10 alkyl C1-C10 alkoxy propionate, and C1-C10 alkyl lactate, thereby is it possible to improve applicability of a photoresist while remarkably reducing an amount of the used photoresist, as well as having excellent solubility and EBR property to various photoresists, BARCs and underlayers.
    Type: Grant
    Filed: February 5, 2016
    Date of Patent: April 24, 2018
    Assignee: DONGWOO FINE-CHEM CO., LTD.
    Inventors: Cheol Min Choi, In Kak Song, Kyong Ho Lee
  • THINNER COMPOSITION
    Publication number: 20170059987
    Abstract: A thinner composition includes propyleneglycol alkylether acetate, cycloketone, and methyl 2-hydroxy isobutyrate. The thinner composition has excellent EBR, RRC, and rework properties, as well as effects of improving photoresist application uniformity, and in particular, exhibiting excellent solubility to photoresist having a high polarity, so as to be applicable to various photoresists.
    Type: Application
    Filed: August 30, 2016
    Publication date: March 2, 2017
    Inventors: Cheol Min CHOI, In Kak SONG, Kyong Ho LEE
  • THINNER COMPOSITION
    Publication number: 20160230129
    Abstract: A thinner composition includes propyleneglycol C1-C10 alkylether, C1-C10 alkyl C1-C10 alkoxy propionate, and C1-C10 alkyl lactate, thereby is it possible to improve applicability of a photoresist while remarkably reducing an amount of the used photoresist, as well as having excellent solubility and EBR property to various photoresists, BARCs and underlayers.
    Type: Application
    Filed: February 5, 2016
    Publication date: August 11, 2016
    Inventors: Cheol Min CHOI, In Kak SONG, Kyong Ho LEE