Patents by Inventor Cheol-Shin Kwak

Cheol-Shin Kwak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240124666
    Abstract: A polyimide precursor monomer having an E value of 2.0 or more calculated by Equation 1 is selected among polyimide raw materials. A polyimide includes a structural unit derived from the polyimide precursor monomer having the E value of 2.0 or more. Optical properties of a polyimide film formed from the polyimide can be improved, and the optical properties of a polyimide film can be predicted from the E value of the polyimide precursor monomer even before production of the polyimide film.
    Type: Application
    Filed: September 19, 2023
    Publication date: April 18, 2024
    Inventors: Chang Q LEE, Hyo Shin KWAK, Cheol Min YUN, Seung Min JEON, Hyun Kyu CHO
  • Publication number: 20240106073
    Abstract: Provided are a separator coating composition for a secondary battery including inorganic particles and a silane salt compound having a specific structure, a separator using the same, and an electrochemical device including the same. Specifically, a separator coating composition for a secondary battery which implements adhesion between an inorganic material layer and a porous substrate without including an acid/polymer-based organic binder in a coating composition for forming the inorganic material layer on one or both surfaces of the porous substrate and does not need a separate dispersing agent for dispersing the inorganic particles, a separator manufactured using the same, and an electrochemical device including the separator are provided.
    Type: Application
    Filed: September 13, 2023
    Publication date: March 28, 2024
    Inventors: Tae Wook KWON, Sang Ick LEE, Won Sub KWACK, Cheol Woo KIM, Hyo Shin KWAK, Heung Taek BAE
  • Patent number: 7340560
    Abstract: A method of accessing an integrated circuit memory device can include reading from an address in a first memory sub-block during a first clock cycle. The address of a first data memory block address mapped to the first memory sub-block can be written to during the first clock cycle. The address of a second data memory block address mapped can be written to the second memory sub-block during a second clock cycle immediately subsequent in time to the first clock cycle. Related device are disclosed.
    Type: Grant
    Filed: July 22, 2004
    Date of Patent: March 4, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Byong-kwon Lee, Cheol-Shin Kwak, Chul-sung Park
  • Publication number: 20050018521
    Abstract: A method of accessing an integrated circuit memory device can include reading from an address in a first memory sub-block during a first clock cycle. The address of a first data memory block address mapped to the first memory sub-block can be written to during the first clock cycle. The address of a second data memory block address mapped can be written to the second memory sub-block during a second clock cycle immediately subsequent in time to the first clock cycle. Related device are disclosed.
    Type: Application
    Filed: July 22, 2004
    Publication date: January 27, 2005
    Inventors: Byong-kwon Lee, Cheol-Shin Kwak, Chul-sung Park