Abstract: According to the disclosed substrate processing apparatus, a first bowl is located to correspond to a substrate, and a first chemical solution supply module supplies a first chemical solution while a support module rotates at a first speed, and a second bowl is located to correspond to the substrate, and a second chemical solution supply module supplies a second chemical solution at a first flow rate while a support module rotates at a second speed equal to or smaller than the first speed, and the second bowl is located to correspond to the substrate, and the second chemical solution supply module does not supply the second chemical solution or supplies the second chemical solution at a second flow rate smaller than the first flow rate while the support module rotates at a third speed smaller than the second speed.

Abstract: An inkjet apparatus for display manufacturing includes a nozzle unit having a discharge port for discharging ink to a substrate, a charging unit disposed on a side of the nozzle unit and charging the ink, and an accelerating electrode disposed on an opposite side of the nozzle unit with the substrate interposed therebetween, and accelerating the ink towards the substrate by electrical attraction.

Abstract: A particle alignment device for a micro LED display, the particle alignment device includes a glass electrode arranged on one surface of the glass substrate on which a pattern is formed, a gripper supporting a glass substrate, the gripper including a gripper electrode interposed between the glass substrate and the gripper, a resistance unit connecting the glass electrode, and an AC signal generator connected to the gripper electrode to generate an AC signal. The glass electrode and the gripper electrode are arranged to oppose each other with the glass substrate interposed therebetween.

Abstract: A support structure, includes: a support plate supporting a substrate; a lower cover covering a lower portion of the support plate; and a catching unit comprising a concave-convex structure having portions corresponding to each other so that the support plate and the lower cover are rotated and assembled with each other.

Abstract: According to an embodiment of the present disclosure, a processing liquid supply nozzle includes a nozzle body, a nozzle tip member connected to a lower portion of the nozzle body, and a fastening member that is disposed between the nozzle body and the nozzle tip member to connect the nozzle body and the nozzle tip member to each other and introduces air into the nozzle body and the nozzle tip member.

Abstract: According to the disclosed substrate processing apparatus, a first bowl is located to correspond to a substrate, and a first chemical solution supply module supplies a first chemical solution while a support module rotates at a first speed, and a second bowl is located to correspond to the substrate, and a second chemical solution supply module supplies a second chemical solution at a first flow rate while a support module rotates at a second speed equal to or smaller than the first speed, and the second bowl is located to correspond to the substrate, and the second chemical solution supply module does not supply the second chemical solution or supplies the second chemical solution at a second flow rate smaller than the first flow rate while the support module rotates at a third speed smaller than the second speed.

Abstract: Provided is a support unit for supporting a substrate, the support unit including: a heating member configured to transmit thermal energy to a supported substrate; a reflective plate disposed under the heating member and configured to reflect thermal energy generated by the heating member to the substrate; a cooling plate disposed under the reflective plate and formed with a cooling flow path in which a cooling fluid flows; and a gas supply line configured to supply gas to a space between the reflective plate and the cooling plate.

Abstract: Disclosed are a standby port and a substrate processing apparatus having the same. The standby port exhausts fumes generated when a processing liquid is discharged into the standby port before the supply of the processing liquid onto a substrate, thereby preventing pollution of a chamber atmosphere.

Abstract: Disclosed are a standby port and a substrate processing apparatus having the same. The standby port exhausts fumes generated when a processing liquid is discharged into the standby port before the supply of the processing liquid onto a substrate, thereby preventing pollution of a chamber atmosphere.