Patents by Inventor Cheong-jun Kim

Cheong-jun Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Direction-controllable catheter using drug injection channel
    Patent number: 10363395
    Abstract: The present invention relates to a direction-controllable drug injection catheter. According to the present invention, provided is the catheter extending along a central axis “A” including a drug injection part in which a drug injection channel has been formed; a channel opening and closing means which opens and closes the drug injection channel; and a steering structure which is rotationally asymmetric with respect to the central axis “A” and varies according to a pressure change of the drug injection channel for the purpose of steering.
    Type: Grant
    Filed: April 1, 2015
    Date of Patent: July 30, 2019
    Assignee: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Doo Yong Lee, Hye Hyun Han, Yun Jin Gu, Seung Gyu Kang, Myeong Jin Kim, Cheong Jun Kim, Seong Pil Byeon, Young Gi Jung, Su Bon Kim, Hyun Seok Lee, Dong Myoung Lee, Su Hwan Park, Ji Hye Hwang
  • DIRECTION-CONTROLLABLE CATHETER USING DRUG INJECTION CHANNEL
    Publication number: 20180085556
    Abstract: The present invention relates to a direction-controllable drug injection catheter. According to the present invention, provided is the catheter extending along a central axis “A” including a drug injection part in which a drug injection channel has been formed; a channel opening and closing means which opens and closes the drug injection channel; and a steering structure which is rotationally asymmetric with respect to the central axis “A” and varies according to a pressure change of the drug injection channel for the purpose of steering.
    Type: Application
    Filed: April 1, 2015
    Publication date: March 29, 2018
    Applicant: Korea Advanced Institute of Science And Technology
    Inventors: Doo Yong LEE, Hye Hyun HAN, Yun Jin GU, Seung Gyu KANG, Myeong Jin KIM, Cheong Jun KIM, Seong Pil BYEON, Young Gi JUNG, Su Bon KIM, Hyun Seok LEE, Dong Myounq LEE, Su Hwan PARK, Ji Hye HWANG
  • Semiconductor wafer, semiconductor structure and method of manufacturing the semiconductor wafer
    Patent number: 9806036
    Abstract: A semiconductor wafer including a main body including first and second surfaces opposite each other, a notch including a recess on an outer periphery, a first bevel region formed along the outer periphery of the main body, including a first slope connecting the first and second surfaces and having a first height with respect to a straight line extending from a first point where the first surface and the first slope meet to a second point where the second surface and the first slope meet, and a second bevel region in contact with the recess or opening, including a second slope connecting the first and second surfaces and having a second height, different from the first height, with respect to a straight line extending from a third point where the first surface and the second slope meet to a fourth point where the second surface and the second slope meet.
    Type: Grant
    Filed: November 17, 2016
    Date of Patent: October 31, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jong-soo Kim, Sam-jong Choi, Sue-ryeon Kim, Tae-hyoung Koo, Hyun-hee Ju, Cheong-jun Kim, Ji-won You
  • SEMICONDUCTOR WAFER, SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR WAFER
    Publication number: 20170200683
    Abstract: A semiconductor wafer including a main body including first and second surfaces opposite each other, a notch including a recess on an outer periphery, a first bevel region formed along the outer periphery of the main body, including a first slope connecting the first and second surfaces and having a first height with respect to a straight line extending from a first point where the first surface and the first slope meet to a second point where the second surface and the first slope meet, and a second bevel region in contact with the recess or opening, including a second slope connecting the first and second surfaces and having a second height, different from the first height, with respect to a straight line extending from a third point where the first surface and the second slope meet to a fourth point where the second surface and the second slope meet.
    Type: Application
    Filed: November 17, 2016
    Publication date: July 13, 2017
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: JONG-SOO KIM, Sam-jong Choi, Sue-ryeon Kim, Tae-hyoung Koo, Hyun-hee Ju, Cheong-jun Kim, Ji-won You