Patents by Inventor Cherng-Chang Lee

Cherng-Chang Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Exhaust adaptor and method for chamber de-gassing
    Patent number: 6920891
    Abstract: An exhaust adaptor and method which includes attachment of an exhaust bellow or conduit to a process chamber to facilitate vacuum-induced evacuation of residual toxic gases from the chamber during cleaning and/or maintenance of the chamber. A throttle valve of the chamber is first removed from a throttle valve housing, and one end of the exhaust adaptor is next attached to the throttle valve housing. An exhaust bellow or conduit is attached to the opposite end of the adaptor. As a down flow of air is directed into the open chamber, vacuum pressure is induced in the chamber interior through the exhaust bellow or conduit, the adaptor and the valve housing, respectively. Air disturbances in the chamber interior are thus eliminated, and toxic residual gases generated in the chamber interior are therefore incapable of diffusing to the exterior of the chamber.
    Type: Grant
    Filed: October 5, 2002
    Date of Patent: July 26, 2005
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Mu-Tsang Lin, Wie-Liang Tsai, Cherng-Chang Lee, Yen-Chan Lee, Chia-Hsin Liu
  • Exhaust adaptor and method for chamber de-gassing
    Publication number: 20040065366
    Abstract: An exhaust adaptor and method which includes attachment of an exhaust bellow or conduit to a process chamber to facilitate vacuum-induced evacuation of residual toxic gases from the chamber during cleaning and/or maintenance of the chamber. A throttle valve of the chamber is first removed from a throttle valve housing, and one end of the exhaust adaptor is next attached to the throttle valve housing. An exhaust bellow or conduit is attached to the opposite end of the adaptor. As a down flow of air is directed into the open chamber, vacuum pressure is induced in the chamber interior through the exhaust bellow or conduit, the adaptor and the valve housing, respectively. Air disturbances in the chamber interior are thus eliminated, and toxic residual gases generated in the chamber interior are therefore incapable of diffusing to the exterior of the chamber.
    Type: Application
    Filed: October 5, 2002
    Publication date: April 8, 2004
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Mu-Tsang Lin, Wie-Liang Tsai, Cherng-Chang Lee, Yen-Chan Lee, Chia-Hsin Liu