Patents by Inventor Cherngye Hwang

Cherngye Hwang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9747929
    Abstract: Embodiments disclosed herein generally relate to a method for forming a HAMR head. The method includes depositing a drop-on-demand mask on a portion of a surface of a slider using a drop-on-demand tool. The surface of the slider includes at least a portion of an NFT. A first protective layer is deposited over a remaining portion of the surface of the slider and over the drop-on-demand mask. The drop-on-demand mask and a portion of the first protective layer disposed on the drop-on-demand mask are removed, exposing at least the portion of the NFT. A second protective layer is deposited on the first protective layer and at least the exposed portion of the NFT. By using the drop-on-demand tool to deposit the drop-on-demand mask, the alignment between the drop-on-demand mask and the portion of the NFT is less stringent, and the drop-on-demand mask can be easily removed using a wiping tool.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: August 29, 2017
    Assignee: Western Digital Technologies, Inc.
    Inventors: Eduardo Torres, Cherngye Hwang, Randy Simmons
  • Publication number: 20170018283
    Abstract: Embodiments disclosed herein generally relate to a method for forming a HAMR head. The method includes depositing a drop-on-demand mask on a portion of a surface of a slider using a drop-on-demand tool. The surface of the slider includes at least a portion of an NFT. A first protective layer is deposited over a remaining portion of the surface of the slider and over the drop-on-demand mask. The drop-on-demand mask and a portion of the first protective layer disposed on the drop-on-demand mask are removed, exposing at least the portion of the NFT. A second protective layer is deposited on the first protective layer and at least the exposed portion of the NFT. By using the drop-on-demand tool to deposit the drop-on-demand mask, the alignment between the drop-on-demand mask and the portion of the NFT is less stringent, and the drop-on-demand mask can be easily removed using a wiping tool.
    Type: Application
    Filed: September 29, 2016
    Publication date: January 19, 2017
    Inventors: Eduardo TORRES, Cherngye HWANG, Randy SIMMONS
  • Patent number: 9460738
    Abstract: Embodiments disclosed herein generally relate to a method for forming a HAMR head. The method includes depositing a drop-on-demand mask on a portion of a surface of a slider using a drop-on-demand tool. The surface of the slider includes at least a portion of an NFT. A first protective layer is deposited over a remaining portion of the surface of the slider and over the drop-on-demand mask. The drop-on-demand mask and a portion of the first protective layer disposed on the drop-on-demand mask are removed, exposing at least the portion of the NFT. A second protective layer is deposited on the first protective layer and at least the exposed portion of the NFT. By using the drop-on-demand tool to deposit the drop-on-demand mask, the alignment between the drop-on-demand mask and the portion of the NFT is less stringent, and the drop-on-demand mask can be easily removed using a wiping tool.
    Type: Grant
    Filed: July 13, 2015
    Date of Patent: October 4, 2016
    Assignee: HGST Netherlands B.V.
    Inventors: Eduardo Torres, Cherngye Hwang, Randy Simmons
  • Publication number: 20160240355
    Abstract: A plasma sputtering apparatus according to one embodiment includes a chamber and a reservoir in fluidic communication with the chamber. The reservoir stores a vapor source therein, and is configured to release vapor at a predetermined rate. The vapor released by the reservoir is effective to diminish an etch rate of a first magnetic material, the vapor having a smaller effect on an etch rate of a second magnetic material that is different than the first magnetic material. The apparatus also includes a mount for a substrate and a plasma source.
    Type: Application
    Filed: April 27, 2016
    Publication date: August 18, 2016
    Inventors: Robert G. Biskeborn, Calvin S. Lo, Cherngye Hwang, Andrew C. Ting
  • Patent number: 9349395
    Abstract: A method according to one embodiment includes placing a substrate in a chamber; and plasma sputtering the substrate in a presence of a non-zero pressure of a vapor, wherein the vapor at the non-zero pressure is effective to diminish an etch rate of a first material of the substrate. A plasma sputtering apparatus according to one embodiment includes a chamber; a reservoir in the chamber for releasing a vapor at an established rate; a mount for a substrate; and a plasma source.
    Type: Grant
    Filed: August 31, 2012
    Date of Patent: May 24, 2016
    Assignee: International Business Machines Corporation
    Inventors: Robert G. Biskeborn, Calvin S. Lo, Cherngye Hwang, Andrew C. Ting
  • Patent number: 9177588
    Abstract: The embodiments of the present invention relate to a method for forming a magnetic read head with pinned layers extending to the ABS of the read head and magnetically coupled with an antiferromagnetic layer that is recessed in relation to the ABS of the read head. Portions of the antiferromagnetic layer and a magnetic layer that are extending to the ABS are removed, exposing a shield. A shielding material is formed on the exposed shield and a seed layer is formed on the shield and on or over a portion of the remaining antiferromagnetic layer. A pinned layer structure is formed on the seed layer and the magnetic layer.
    Type: Grant
    Filed: January 17, 2014
    Date of Patent: November 3, 2015
    Assignee: HGST NETHERLANDS B.V.
    Inventors: James Mac Freitag, Ying Hong, Cherngye Hwang, Stefan Maat, Masaya Nishioka, David John Seagle, Hicham Moulay Sougrati, Shuxia Wang, Yi Zheng, Honglin Zhu
  • Publication number: 20150235892
    Abstract: A wafer clamp according to one embodiment includes an outer ring, and at least three members extending inwardly from the outer ring, each of the members having a contact area for engaging a wafer. A system includes a structure having at least one ring, each ring being for receiving a wafer, and a wafer clamp configured to clamp a wafer to each ring, the wafer clamp having an outer ring, and at least three members extending inwardly from the outer ring, each of the members having a contact area for engaging a wafer.
    Type: Application
    Filed: February 18, 2014
    Publication date: August 20, 2015
    Inventors: Yunxiao Gao, Cherngye Hwang, Xavier C. Lelong, Stefan Maat, Bruce W. Saxton, Charles G. Seegel, III, Yong Shen
  • Publication number: 20150206550
    Abstract: The embodiments of the present invention relate to a method for forming a magnetic read head with pinned layers extending to the ABS of the read head and magnetically coupled with an antiferromagnetic layer that is recessed in relation to the ABS of the read head. Portions of the antiferromagnetic layer and a magnetic layer that are extending to the ABS are removed, exposing a shield. A shielding material is formed on the exposed shield and a seed layer is formed on the shield and on or over a portion of the remaining antiferromagnetic layer. A pinned layer structure is formed on the seed layer and the magnetic layer.
    Type: Application
    Filed: January 17, 2014
    Publication date: July 23, 2015
    Applicant: HGST Netherlands B.V.
    Inventors: James Mac FREITAG, Ying HONG, Cherngye HWANG, Stefan MAAT, Masaya NISHIOKA, David John SEAGLE, Hicham Moulay SOUGRATI, Shuxia WANG, Yi ZHENG, Honglin ZHU
  • Patent number: 9053718
    Abstract: A method for forming a protective overcoat onto a tape bearing surface of a tape head used for magnetic tape recording. In order to ensure optimal surface tension and liftoff properties of the ink mask, the tape bearing surface is treated with a first application of ethanol, followed by an application of polydimethylsiloxane, followed by a second application of ethanol. After this treatment an ink mask can be printed onto the tape bearing surface so as to form a mask having an opening over the location of the magnetic transducer. An etching can then be performed followed by the deposition of a protective coating such as alumina.
    Type: Grant
    Filed: November 21, 2013
    Date of Patent: June 9, 2015
    Assignee: HGST Netherlands B.V.
    Inventors: Que Adrong, Cherngye Hwang, Dung T. Nguyen, Eduardo Torres Mireles
  • Publication number: 20150138673
    Abstract: A method for forming a protective overcoat onto a tape bearing surface of a tape head used for magnetic tape recording. In order to ensure optimal surface tension and liftoff properties of the ink mask, the tape bearing surface is treated with a first application of ethanol, followed by an application of polydimethylsiloxane, followed by a second application of ethanol. After this treatment an ink mask can be printed onto the tape bearing surface so as to form a mask having an opening over the location of the magnetic transducer. An etching can then be performed followed by the deposition of a protective coating such as alumina.
    Type: Application
    Filed: November 21, 2013
    Publication date: May 21, 2015
    Applicant: HGST Netherlands B.V.
    Inventors: Que Adrong, Cherngye Hwang, Dung T. Nguyen, Eduardo Torres Mireles
  • Publication number: 20150118520
    Abstract: A magnetic read sensor having improved pinning and reduced area resistance. The sensor has pinned magnetic layer that extends beyond the functional stripe of the sensor to improve magnetic pinning. The free layer has a magnetic portion that extends to the functional stripe height and a non-magnetic portion that extends beyond the functional stripe height. The sensor may have an end point detection layer located between the magnetic pinned layer and the magnetic free layer.
    Type: Application
    Filed: October 24, 2013
    Publication date: April 30, 2015
    Applicant: HGST Netherlands B.V.
    Inventors: Yongchul Ahn, Xiaozhong Dang, Cherngye Hwang, Quang Le, Simon H. Liao, Guangli Liu, Stefan Maat
  • Patent number: 9011704
    Abstract: A method according to one embodiment includes contacting an oxidant with an AlTiC portion of a magnetic head for recessing TiC grains of the AlTiC portion. A method according to another embodiment includes contacting a peroxide with an AlTiC portion of a magnetic head for recessing TiC grains of the AlTiC portion from a media bearing surface of the AlTiC portion.
    Type: Grant
    Filed: February 14, 2013
    Date of Patent: April 21, 2015
    Assignee: International Business Machines Corporation
    Inventors: Robert G. Biskeborn, Cherngye Hwang, Jason Liang, Calvin S. Lo
  • Patent number: 8797688
    Abstract: A magnetic slider for magnetic data recording constructed by a process that allows for careful control of seed layer and overcoat thickness. The slider is treated by a process that result in surface pits and scratches. A refill layer is used to fill in the pits and scratches, the refill layer being constructed of a material that does not include Si or carbon. An angled ion beam etching can be used to remove portions of the refill layer that extend outside of the pits and scratches. Then, a seed layer comprising Si and a protective layer comprising C are deposited over the surface. Because the refill layer does not contain either of Si or C, the thickness of the seed layer and carbon overcoat can be acurately measured and controlled, without the refill layer being mistaken for seed or overcoat material.
    Type: Grant
    Filed: November 30, 2012
    Date of Patent: August 5, 2014
    Assignee: HGST Netherlands B.V.
    Inventors: Eric W. Flint, Cherngye Hwang, Randall G. Simmons
  • Publication number: 20140153136
    Abstract: A magnetic slider for magnetic data recording constructed by a process that allows for careful control of seed layer and overcoat thickness. The slider is treated by a process that result in surface pits and scratches. A refill layer is used to fill in the pits and scratches, the refill layer being constructed of a material that does not include Si or carbon. An angled ion beam etching can be used to remove portions of the refill layer that extend outside of the pits and scratches. Then, a seed layer comprising Si and a protective layer comprising C are deposited over the surface. Because the refill layer does not contain either of Si or C, the thickness of the seed layer and carbon overcoat can be accurately measured and controlled, without the refill layer being mistaken for seed or overcoat material.
    Type: Application
    Filed: November 30, 2012
    Publication date: June 5, 2014
    Applicant: HGST Netherlands B.V.
    Inventors: Eric W. Flint, Cherngye Hwang, Randall G. Simmons
  • Patent number: 8679733
    Abstract: A method according to one embodiment includes applying a photoresist to a substrate; exposing the photoresist such that a local intensity of radiation applied to the photoresist at each pixel thereof is a function of a mathematically-generated representation of a target surface shape; developing the resist; and performing a subtractive process on the developed photoresist and the substrate for creating the target surface shape on the substrate. A method according to another embodiment includes applying a photoresist to a substrate; patterning the photoresist using a machine-readable profile; and performing a subtractive process to transfer the profile onto the substrate.
    Type: Grant
    Filed: January 19, 2011
    Date of Patent: March 25, 2014
    Assignee: International Business Machines Corporation
    Inventors: Robert G. Biskeborn, Cherngye Hwang, Calvin S. Lo
  • Publication number: 20140061033
    Abstract: A method according to one embodiment includes placing a substrate in a chamber; and plasma sputtering the substrate in a presence of a non-zero pressure of a vapor, wherein the vapor at the non-zero pressure is effective to diminish an etch rate of a first material of the substrate. A plasma sputtering apparatus according to one embodiment includes a chamber; a reservoir in the chamber for releasing a vapor at an established rate; a mount for a substrate; and a plasma source.
    Type: Application
    Filed: August 31, 2012
    Publication date: March 6, 2014
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Robert G. Biskeborn, Calvin S. Lo, Cherngye Hwang, Andrew C. Ting
  • Patent number: 8611049
    Abstract: A structure according to one embodiment includes a substrate having a media facing side; and a thin film stack formed on the substrate, the thin film stack including magnetic films and insulating films, wherein the thin film stack is recessed from a plane extending along the media facing side of the substrate, wherein the magnetic films are recessed more than the insulating films, wherein the magnetic films each have a substantially flat media facing surface, wherein the insulating films each have a substantially flat media facing surface.
    Type: Grant
    Filed: December 21, 2010
    Date of Patent: December 17, 2013
    Assignee: International Business Machines Corporation
    Inventors: Robert Glenn Biskeborn, Cherngye Hwang, Calvin Shyhjong Lo, Andrew C. Ting
  • Publication number: 20130295296
    Abstract: A method for forming an at least partially crystalline alumina film includes providing a substrate, and depositing alumina onto the substrate at an ambient temperature to form the at least partially crystalline alumina film.
    Type: Application
    Filed: July 10, 2013
    Publication date: November 7, 2013
    Inventors: Robert G. Biskeborn, Cherngye Hwang, Calvin S. Lo, Andrew C. Ting
  • Patent number: 8526137
    Abstract: A magnetic head produced at low ambient temperatures that comprise a crystalline alumina layer for increasing the durability of the head is provided. According to one embodiment, a magnetic head for at least one of reading and writing data on to a magnetic data storage media. The magnetic head comprises a substrate, an at least partially crystalline alumina layer formed on the substrate, at least one of a write transducer and a read transducer formed on the substrate, and a surface for engaging the magnetic data storage media. In another embodiment, a method for forming an at least partially crystalline alumina film. The method comprises providing a substrate, and depositing alumina onto the substrate at an ambient temperature to form the at least partially crystalline alumina film.
    Type: Grant
    Filed: April 16, 2010
    Date of Patent: September 3, 2013
    Assignee: International Business Machines Corporation
    Inventors: Robert G. Biskeborn, Cherngye Hwang, Calvin S. Lo, Andrew C. Ting
  • Patent number: 8444865
    Abstract: A method for encapsulating a magnetic recording head including coating at least a portion of a magnetic recording head containing a recording gap with a first layer of at least one coating material, including silicon nitride, the first layer of at least one coating material having a first removal rate, coating at least a portion of the magnetic recording head containing a recording gap and coated with the first layer of at least one coating material with a second layer of at least one coating material, including aluminum oxide, the second layer of at least one coating material having a second removal rate higher than the first removal rate, and removing at least a portion of the second layer of at least one coating material via a removal process, including chemical-mechanical polishing, lapping, or vacuum processing to at least partially planarize the surface of the recording gap.
    Type: Grant
    Filed: August 18, 2008
    Date of Patent: May 21, 2013
    Assignee: International Busines Machines Corporation
    Inventors: Robert G. Biskeborn, Calvin S. Lo, Gary M. Decad, Cherngye Hwang