Patents by Inventor CHESTER E. BALUT

CHESTER E. BALUT has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8431491
    Abstract: A method for protecting a chuck membrane in a reactive ion etcher during plasma processing is described. The method utilizes a photoresist as a protective layer. Suitable photoresists can be used in this invention to not only image a semiconductor substrate to protect areas where vias and/or cavities are not desired during plasma processing but also to protect the chuck membrane(s) of the reactive ion etcher from being damaged and/or contaminated during plasma processing. Both negative-working and positive-working photoresists can be used.
    Type: Grant
    Filed: October 30, 2009
    Date of Patent: April 30, 2013
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Chester E. Balut, Frank Leonard Schadt, III, Stephen E. Vargo
  • Publication number: 20100112820
    Abstract: A method for protecting a chuck membrane in a reactive ion etcher during plasma processing is described. The method utilizes a photoresist as a protective layer. Suitable photoresists can be used in this invention to not only image a semiconductor substrate to protect areas where vias and/or cavities are not desired during plasma processing but also to protect the chuck membrane(s) of the reactive ion etcher from being damaged and/or contaminated during plasma processing. Both negative-working and positive-working photoresists can be used.
    Type: Application
    Filed: October 30, 2009
    Publication date: May 6, 2010
    Applicant: E.I. DU PONT DE NEMOURS AND COMPANY
    Inventors: CHESTER E. BALUT, Frank Leonard Schadt, III, Stephen E. Vargo