Patents by Inventor Cheul Ock Chae

Cheul Ock Chae has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Upper surface foreign material detecting device of ultra-thin transparent substrate
    Patent number: 9733196
    Abstract: Provided are a foreign material detecting device and method for detecting only a foreign material on a surface of a substrate except for a foreign material on a lower surface of the substrate in a manufacturing process of a transparent substrate passing light therethrough, such as a glass substrate used in a flat panel display (FPD) such as a liquid crystal display (LCD), an organic light emitting diode (OLED), a plasma display panel (PDP), etc., a sapphire wafer used in some of semiconductors, or the like, and in a pattern forming process in a manufacturing process of the FPD and the semiconductor using the transparent substrate. More particularly, provided are a foreign material detecting device and method for detecting only a foreign material on a surface of an ultra-thin transparent substrate having a thickness of 0.3 T or less.
    Type: Grant
    Filed: November 23, 2015
    Date of Patent: August 15, 2017
    Assignee: Nanoprotech Co., Ltd.
    Inventors: Hyung Seok Lee, Yeong Ryeol Kim, Cheul Ock Chae, Jin Yong Kim, Soung Jin Kim
  • Upper Surface Foreign Material Detecting Device of Ultra-Thin Transparent Substrate
    Publication number: 20160327494
    Abstract: Provided are a foreign material detecting device and method for detecting only a foreign material on a surface of a substrate except for a foreign material on a lower surface of the substrate in a manufacturing process of a transparent substrate passing light therethrough, such as a glass substrate used in a flat panel display (FPD) such as a liquid crystal display (LCD), an organic light emitting diode (OLED), a plasma display panel (PDP), etc., a sapphire wafer used in some of semiconductors, or the like, and in a pattern forming process in a manufacturing process of the FPD and the semiconductor using the transparent substrate. More particularly, provided are a foreign material detecting device and method for detecting only a foreign material on a surface of an ultra-thin transparent substrate having a thickness of 0.3 T or less.
    Type: Application
    Filed: November 23, 2015
    Publication date: November 10, 2016
    Inventors: Hyung Seok Lee, Yeong Ryeol Kim, Cheul Ock Chae, Jin Yong Kim, Soung Jin Kim
  • Method of detecting foreign material on upper surface of transparent substrate using polarized light
    Patent number: 9316598
    Abstract: Provided are an apparatus and a method of detecting a foreign material capable of detecting only a foreign material on a surface of a substrate except for a foreign material on a lower surface of the substrate in a manufacturing process of a transparent substrate passing light therethrough, such as a glass substrate used in a flat panel display (FPD) such as a liquid crystal display (LCD), an organic light emitting diode (OLED), a plasma display panel (PDP), a sapphire wafer used in some of semiconductors, or the like, and in a pattern forming process in a manufacturing process of the FPD and the semiconductor using the transparent substrate.
    Type: Grant
    Filed: March 13, 2015
    Date of Patent: April 19, 2016
    Assignee: Nanoprotech Co., Ltd.
    Inventors: Yeong Ryeol Kim, Cheul Ock Chae, Jin Yong Kim, Sang Tae Kim
  • Apparatus and Method of Detecting Foreign Material on Upper Surface of Transparent Substrate Using Polarized Light
    Publication number: 20150316492
    Abstract: Provided are an apparatus and a method of detecting a foreign material capable of detecting only a foreign material on a surface of a substrate except for a foreign material on a lower surface of the substrate in a manufacturing process of a transparent substrate passing light therethrough, such as a glass substrate used in a flat panel display (FPD) such as a liquid crystal display (LCD), an organic light emitting diode (OLED), a plasma display panel (PDP), a sapphire wafer used in some of semiconductors, or the like, and in a pattern forming process in a manufacturing process of the FPD and the semiconductor using the transparent substrate.
    Type: Application
    Filed: March 13, 2015
    Publication date: November 5, 2015
    Inventors: Yeong Ryeol Kim, Cheul Ock Chae, Jin Yong Kim, Sang Tae Kim