Patents by Inventor Chi-Cheng Huang
Chi-Cheng Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11964299Abstract: A method for manufacturing a golf ball having a multi-layered pattern is provided. Firstly, a semi-finished product of the golf ball is provided and includes a ball-shaped body and a base layer covering an outer surface of the ball-shaped body. Then, the semi-finished product of the golf ball is rotated at a predetermined rotation speed, and a color paint is applied to the semi-finished product of the golf ball by spraying from each of an upper position, a middle position, and a lower position. The multi-layered pattern includes an upper-layer pattern area, a mid-layer pattern area, and a lower-layer pattern area that are different in color from each other.Type: GrantFiled: October 26, 2021Date of Patent: April 23, 2024Assignee: FOREMOST GOLF MFG. LTD.Inventors: Chia-Sheng Huang, Chi-Ling Lin, Chia-Cheng Wu, Ching-Hsiang Liu
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Patent number: 11955397Abstract: A semiconductor structure is provided. The semiconductor structure includes a substrate, a channel layer, a barrier layer, a compound semiconductor layer, a gate electrode, and a stack of dielectric layers. The channel layer is disposed on the substrate. The barrier layer is disposed on the channel layer. The compound semiconductor layer is disposed on the barrier layer. The gate electrode is disposed on the compound semiconductor layer. The stack of dielectric layers is disposed on the gate electrode. The stack of dielectric layers includes layers having different etching rates.Type: GrantFiled: November 9, 2020Date of Patent: April 9, 2024Assignee: Vanguard International Semiconductor CorporationInventors: Shin-Cheng Lin, Cheng-Wei Chou, Ting-En Hsieh, Yi-Han Huang, Kwang-Ming Lin, Yung-Fong Lin, Cheng-Tao Chou, Chi-Fu Lee, Chia-Lin Chen, Shu-Wen Chang
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Patent number: 11955370Abstract: A system and methods of forming a dielectric material within a trench are described herein. In an embodiment of the method, the method includes introducing a first precursor into a trench of a dielectric layer, such that portions of the first precursor react with the dielectric layer and attach on sidewalls of the trench. The method further includes partially etching portions of the first precursor on the sidewalls of the trench to expose upper portions of the sidewalls of the trench. The method further includes introducing a second precursor into the trench, such that portions of the second precursor react with the remaining portions of the first precursor to form the dielectric material at the bottom of the trench.Type: GrantFiled: September 18, 2020Date of Patent: April 9, 2024Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Bo-Cyuan Lu, Ting-Gang Chen, Sung-En Lin, Chunyao Wang, Yung-Cheng Lu, Chi On Chui, Tai-Chun Huang, Chieh-Ping Wang
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Patent number: 11936299Abstract: A transistor includes a gate structure over a substrate, wherein the substrate includes a channel region. The transistor further includes a source/drain (S/D) in the substrate adjacent to the gate structure. The transistor further includes a lightly doped drain (LDD) region adjacent to the S/D, wherein a dopant concentration in the first LDD is less than a dopant concentration in the S/D. The transistor further includes a doping extension region adjacent the LDD region, wherein the doping extension region extends farther under the gate structure than the LDD region, and a maximum depth of the doping extension region is 10-times to 30-times greater than a maximum depth of the LDD.Type: GrantFiled: September 21, 2020Date of Patent: March 19, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chu Fu Chen, Chi-Feng Huang, Chia-Chung Chen, Chin-Lung Chen, Victor Chiang Liang, Chia-Cheng Pao
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Publication number: 20240079263Abstract: A wafer container includes a frame, a door and at least a pair of shelves. The frame has opposite sidewalls. The pair of the shelves are respectively disposed and aligned on the opposite sidewalls of the frame. Various methods and devices are provided for holding at least one wafer to the shelves during transport.Type: ApplicationFiled: February 22, 2023Publication date: March 7, 2024Inventors: Kai-Hung HSIAO, Chi-Chung JEN, Yu-Chun SHEN, Yuan-Cheng KUO, Chih-Hsiung HUANG, Wen-Chih CHIANG
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Publication number: 20240063052Abstract: A manufacturing method of a gate structure includes the following steps. A semiconductor substrate is provided. An isolation structure is formed in the semiconductor substrate and surrounds an active region in the semiconductor substrate. A gate pattern is formed on the active region and the isolation structure. The gate pattern includes a first gate structure and a first capping layer disposed on the first gate structure. A part of the first capping layer located above an interface between the active region and the isolation structure is removed for exposing a part of the first gate structure located above the interface between the active region and the isolation structure. A removing process is performed for reducing a thickness of the part of the first gate structure located above the interface between the active region and the isolation structure.Type: ApplicationFiled: September 20, 2022Publication date: February 22, 2024Applicant: UNITED MICROELECTRONICS CORP.Inventors: Tzu-Feng Weng, Chao-Sheng Cheng, Chi-Cheng Huang
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Patent number: 11600709Abstract: A memory cell includes a substrate. A first STI and a second STI are embedded within the substrate. The first STI and the second STI extend along a first direction. An active region is disposed on the substrate and between the first STI and the second STI. A control gate is disposed on the substrate and extends along a second direction. The first direction is different from the second direction. A tunneling region is disposed in the active region overlapping the active region. A first trench is embedded within the tunneling region. Two second trenches are respectively embedded within the first STI and the second STI. The control gate fills in the first trench and the second trenches. An electron trapping stack is disposed between the tunneling region and the control gate.Type: GrantFiled: June 30, 2022Date of Patent: March 7, 2023Assignee: UNITED MICROELECTRONICS CORP.Inventors: Chih-Hao Pan, Chi-Cheng Huang, Kuo-Lung Li, Szu-Ping Wang, Po-Hsuan Chen, Chao-Sheng Cheng
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Publication number: 20220336606Abstract: A memory cell includes a substrate. A first STI and a second STI are embedded within the substrate. The first STI and the second STI extend along a first direction. An active region is disposed on the substrate and between the first STI and the second STI. A control gate is disposed on the substrate and extends along a second direction. The first direction is different from the second direction. A tunneling region is disposed in the active region overlapping the active region. A first trench is embedded within the tunneling region. Two second trenches are respectively embedded within the first STI and the second STI. The control gate fills in the first trench and the second trenches. An electron trapping stack is disposed between the tunneling region and the control gate.Type: ApplicationFiled: June 30, 2022Publication date: October 20, 2022Applicant: UNITED MICROELECTRONICS CORP.Inventors: Chih-Hao Pan, Chi-Cheng Huang, Kuo-Lung Li, Szu-Ping Wang, Po-Hsuan Chen, Chao-Sheng Cheng
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Publication number: 20220271137Abstract: A memory cell includes a substrate. A first STI and a second STI are embedded within the substrate. The first STI and the second STI extend along a first direction. An active region is disposed on the substrate and between the first STI and the second STI. A control gate is disposed on the substrate and extends along a second direction. The first direction is different from the second direction. A tunneling region is disposed in the active region overlapping the active region. A first trench is embedded within the tunneling region. Two second trenches are respectively embedded within the first STI and the second STI. The control gate fills in the first trench and the second trenches. An electron trapping stack is disposed between the tunneling region and the control gate.Type: ApplicationFiled: March 31, 2021Publication date: August 25, 2022Inventors: Chih-Hao Pan, Chi-Cheng Huang, Kuo-Lung Li, Szu-Ping Wang, Po-Hsuan Chen, Chao-Sheng Cheng
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Patent number: 11417742Abstract: A memory cell includes a substrate. A first STI and a second STI are embedded within the substrate. The first STI and the second STI extend along a first direction. An active region is disposed on the substrate and between the first STI and the second STI. A control gate is disposed on the substrate and extends along a second direction. The first direction is different from the second direction. A tunneling region is disposed in the active region overlapping the active region. A first trench is embedded within the tunneling region. Two second trenches are respectively embedded within the first STI and the second STI. The control gate fills in the first trench and the second trenches. An electron trapping stack is disposed between the tunneling region and the control gate.Type: GrantFiled: March 31, 2021Date of Patent: August 16, 2022Assignee: UNITED MICROELECTRONICS CORP.Inventors: Chih-Hao Pan, Chi-Cheng Huang, Kuo-Lung Li, Szu-Ping Wang, Po-Hsuan Chen, Chao-Sheng Cheng
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Patent number: 11374109Abstract: A method for fabricating gate structures includes providing a substrate, configured to have a first region and a second region. Dummy gate structures are formed on the substrate at the first and second regions, wherein each of the dummy gate structures has a first gate insulating layer on the substrate and a dummy gate on the first gate insulating layer. An inter-layer dielectric layer is formed over the dummy gate structures. The inter-layer dielectric layer is polished to expose all of the dummy gates. The dummy gates are removed. The first gate insulating layer at the second region is removed. A second gate insulating layer is formed on the substrate at the second region, wherein the first gate insulating layer is thicker than the second insulating layer. Metal gates are formed on the first and the second insulating layer.Type: GrantFiled: October 31, 2019Date of Patent: June 28, 2022Assignee: UNITED MICROELECTRONICS CORP.Inventors: Chih-Hao Pan, Chi-Cheng Huang, Kuo-Lung Li, Szu-Ping Wang, Po-Hsuan Chen, Chao-Sheng Cheng
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Patent number: 11362186Abstract: A non-volatile memory device is provided. The non-volatile memory device includes a substrate, a first gate structure disposed on the substrate, a second gate structure disposed on the substrate, and a memory gate structure disposed on the substrate and between the first gate structure and the second gate structure. The memory gate structure at least covers the first gate structure and the second gate structure. The memory gate structure includes a charge storage layer disposed on the substrate and a memory gate layer disposed on the charge storage layer.Type: GrantFiled: March 27, 2020Date of Patent: June 14, 2022Assignee: UNITED MICROELECTRONICS CORP.Inventors: Kuo-Lung Li, Chih-Hao Pan, Szu-Ping Wang, Po-Hsuan Chen, Chi-Cheng Huang
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Publication number: 20210265474Abstract: A non-volatile memory device is provided. The non-volatile memory device includes a substrate, a first gate structure disposed on the substrate, a second gate structure disposed on the substrate, and a memory gate structure disposed on the substrate and between the first gate structure and the second gate structure. The memory gate structure at least covers the first gate structure and the second gate structure. The memory gate structure includes a charge storage layer disposed on the substrate and a memory gate layer disposed on the charge storage layer.Type: ApplicationFiled: March 27, 2020Publication date: August 26, 2021Applicant: United Microelectronics Corp.Inventors: Kuo-Lung Li, Chih-Hao Pan, Szu-Ping Wang, Po-Hsuan Chen, Chi-Cheng Huang
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Publication number: 20210134979Abstract: A method for fabricating gate structures includes providing a substrate, configured to have a first region and a second region. Dummy gate structures are formed on the substrate at the first and second regions, wherein each of the dummy gate structures has a first gate insulating layer on the substrate and a dummy gate on the first gate insulating layer. An inter-layer dielectric layer is formed over the dummy gate structures. The inter-layer dielectric layer is polished to expose all of the dummy gates. The dummy gates are removed. The first gate insulating layer at the second region is removed. A second gate insulating layer is formed on the substrate at the second region, wherein the first gate insulating layer is thicker than the second insulating layer. Metal gates are formed on the first and the second insulating layer.Type: ApplicationFiled: October 31, 2019Publication date: May 6, 2021Applicant: United Microelectronics Corp.Inventors: Chih-Hao Pan, Chi-Cheng Huang, Kuo-Lung Li, Szu-Ping Wang, Po-Hsuan Chen, Chao-Sheng Cheng
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Patent number: 10580780Abstract: Provided is a semiconductor structure including a substrate, an isolation structure, a fuse and two gate electrodes. The isolation structure is located in the substrate and defines active regions of the substrate. The fuse is disposed on the isolation structure. The gate electrodes are disposed on the active regions and connected to ends of the fuse. In an embodiment, a portion of a bottom surface of the fuse is lower than top surfaces of the active regions of the substrate.Type: GrantFiled: June 11, 2018Date of Patent: March 3, 2020Assignee: United Microelectronics Corp.Inventors: Zi-Jun Liu, Ping-Chia Shih, Chi-Cheng Huang, Kuo-Lung Li, Hung-Wei Lin, An-Hsiu Cheng, Chih-Hao Pan, Cheng-Hua Chou, Chih-Hung Wang
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Publication number: 20190378846Abstract: Provided is a semiconductor structure including a substrate, an isolation structure, a fuse and two gate electrodes. The isolation structure is located in the substrate and defines active regions of the substrate. The fuse is disposed on the isolation structure. The gate electrodes are disposed on the active regions and connected to ends of the fuse. In an embodiment, a portion of a bottom surface of the fuse is lower than top surfaces of the active regions of the substrate.Type: ApplicationFiled: June 11, 2018Publication date: December 12, 2019Applicant: United Microelectronics Corp.Inventors: Zi-Jun Liu, Ping-Chia Shih, Chi-Cheng Huang, Kuo-Lung Li, Hung-Wei Lin, An-Hsiu Cheng, Chih-Hao Pan, Cheng-Hua Chou, Chih-Hung Wang
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Patent number: 10340282Abstract: A semiconductor memory device includes a substrate, having a plurality of cell regions, wherein the cell regions are parallel and extending along a first direction. A plurality of STI structures is disposed in the substrate, extending along the first direction to isolate the cell regions, wherein the STI structures have a uniform height lower than the substrate in the cell regions. A selection gate line is extending along a second direction and crossing over the cell regions and the STI structures. A control gate line is adjacent to the selection gate line in parallel extending along the second direction and also crosses over the cell regions and the STI structures. The selection gate line and the control gate line together form a two-transistor (2T) memory cell.Type: GrantFiled: February 13, 2018Date of Patent: July 2, 2019Assignee: United Microelectronics Corp.Inventors: Shu-Hung Yu, Chun-Hung Cheng, Chuan-Fu Wang, An-Hsiu Cheng, Ping-Chia Shih, Chi-Cheng Huang, Kuo-Lung Li, Chia-Hui Huang, Chih-Yao Wang, Zi-Jun Liu, Chih-Hao Pan
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Patent number: 10312250Abstract: A semiconductor device and a manufacturing method thereof are provided. The semiconductor device includes a substrate, a plurality of isolation structures, a charge storage layer, and a conductive layer. The substrate has a memory region and a logic region. The substrate in the memory region has a plurality of semiconductor fins. The isolation structures are disposed in the substrate to isolate the semiconductor fins. The semiconductor fins are protruded beyond the isolation structures. The charge storage layer covers the semiconductor fins. The conductive layer is disposed across the semiconductor fins and the isolation structures such that the charge storage layer is disposed between the conductive layer and the semiconductor fins.Type: GrantFiled: January 23, 2018Date of Patent: June 4, 2019Assignee: United Microelectronics Corp.Inventors: Hsuan-Chun Tseng, Hsueh-Chun Hsiao, Tzu-Yun Chang, Chi-Cheng Huang, Ping-Chia Shih
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Publication number: 20180182900Abstract: A semiconductor device and a manufacturing method thereof are provided. The semiconductor device includes a semiconductor substrate having a tunneling well, a tunneling oxide layer, a charge storage layer and a control gate. The tunneling oxide layer is disposed on the tunneling well. The tunneling oxide layer includes a first tunneling oxide segment having a first thickness, a second tunneling oxide segment having a second thickness, and a third tunneling oxide segment having a third thickness, and the first thickness, the second thickness and the third thickness are different from each other. The charge storage layer is disposed on the tunneling oxide layer, and the control gate is disposed on the charge storage layer.Type: ApplicationFiled: February 21, 2017Publication date: June 28, 2018Inventors: Ya-Sheng Feng, Chi-Cheng Huang, Ping-Chia Shih, Hung-Wei Lin, Yu-Chun Chen, Ling-Hsiu Chou, An-Hsiu Cheng
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Patent number: 10008615Abstract: A semiconductor device and a manufacturing method thereof are provided. The semiconductor device includes a semiconductor substrate having a tunneling well, a tunneling oxide layer, a charge storage layer and a control gate. The tunneling oxide layer is disposed on the tunneling well. The tunneling oxide layer includes a first tunneling oxide segment having a first thickness, a second tunneling oxide segment having a second thickness, and a third tunneling oxide segment having a third thickness, and the first thickness, the second thickness and the third thickness are different from each other. The charge storage layer is disposed on the tunneling oxide layer, and the control gate is disposed on the charge storage layer.Type: GrantFiled: February 21, 2017Date of Patent: June 26, 2018Assignee: UNITED MICROELECTRONICS CORP.Inventors: Ya-Sheng Feng, Chi-Cheng Huang, Ping-Chia Shih, Hung-Wei Lin, Yu-Chun Chen, Ling-Hsiu Chou, An-Hsiu Cheng