Patents by Inventor Chi Chung Lee

Chi Chung Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11991824
    Abstract: A circuit board structure includes a first sub-circuit board, a second sub-circuit board, and a third sub-circuit board. The first sub-circuit board has an upper surface and a lower surface opposite to each other, and includes at least one first conductive through hole. The second sub-circuit board is disposed on the upper surface of the first sub-circuit board and includes at least one second conductive through hole. The third sub-circuit board is disposed on the lower surface of the first sub-circuit board and includes at least one third conductive through hole. At least two of the first conductive through hole, the second conductive through hole, and the third conductive through hole are alternately arranged in an axial direction perpendicular to an extending direction of the first sub-circuit board. The first, second and third sub-circuit boards are electrically connected to one another.
    Type: Grant
    Filed: September 26, 2021
    Date of Patent: May 21, 2024
    Assignee: Unimicron Technology Corp.
    Inventors: Tzyy-Jang Tseng, Cheng-Ta Ko, Pu-Ju Lin, Chi-Hai Kuo, Shao-Chien Lee, Ming-Ru Chen, Cheng-Chung Lo
  • Publication number: 20240088224
    Abstract: A semiconductor structure includes a first gate structure, a second gate structure coupled to the first gate structure, a source region, a first drain region, and a second drain region. The source region is surrounded by the first gate structure and the second gate structure. The first drain region is separated from the source region by the first gate structure. The second drain region is separated from the source region by the second gat structure. A shape of the first drain region and a shape of the second drain region are different from each other from a plan view.
    Type: Application
    Filed: November 14, 2023
    Publication date: March 14, 2024
    Inventors: HSING-I TSAI, FU-HUAN TSAI, CHIA-CHUNG CHEN, HSIAO-CHUN LEE, CHI-FENG HUANG, CHO-YING LU, VICTOR CHIANG LIANG
  • Patent number: 8012886
    Abstract: A method is provided for treating a leadframe comprising copper or copper alloy to enhance adhesion of molding compound to it. The leadframe is oxidized in an oxidation treatment bath to form copper oxide on the surface of the leadframe. It is then dipped in a complexing or chelating agent to enhance the purity of the copper oxide formed. Thereafter, the leadframe is cleaned with an acid to remove any contaminants remaining on the leadframe.
    Type: Grant
    Filed: March 7, 2007
    Date of Patent: September 6, 2011
    Assignee: ASM Assembly Materials Ltd
    Inventors: Yiu Fai Kwan, Tat Chi Chan, Wai Chan, Chi Chung Lee
  • Patent number: 7691679
    Abstract: A process for producing a pre-plated leadframe that has enhanced adhesion by molding compound is provided, wherein a base leadframe material is first plated with multiple layers of metallic material. Thereafter, the plated base leadframe material is covered with a mask, so as to expose selected surfaces thereof at unmasked areas where enhanced adhesion of molding compound is desired. The said unmasked areas are plated with a layer of copper before removing the mask. Optionally, the layer of copper may further be oxidized to form a layer of specially controlled copper oxide.
    Type: Grant
    Filed: March 23, 2007
    Date of Patent: April 6, 2010
    Assignee: ASM Assembly Materials Ltd.
    Inventors: Yiu Fai Kwan, Tat Chi Chan, Chun Ho Yau, Chi Chung Lee
  • Publication number: 20080233683
    Abstract: A process for producing a pre-plated leadframe that has enhanced adhesion by molding compound is provided, wherein a base leadframe material is first plated with multiple layers of metallic material. Thereafter, the plated base leadframe material is covered with a mask, so as to expose selected surfaces thereof at unmasked areas where enhanced adhesion of molding compound is desired. The said unmasked areas are plated with a layer of copper before removing the mask. Optionally, the layer of copper may further be oxidized to form a layer of specially controlled copper oxide.
    Type: Application
    Filed: March 23, 2007
    Publication date: September 25, 2008
    Inventors: Yiu Fai Kwan, Tat Chi Chan, Chun Ho Yau, Chi Chung Lee
  • Publication number: 20080216921
    Abstract: A method is provided for treating a leadframe comprising copper or copper alloy to enhance adhesion of molding compound to it. The leadframe is oxidized in an oxidation treatment bath to form copper oxide on the surface of the leadframe. It is then dipped in a complexing or chelating agent to enhance the purity of the copper oxide formed. Thereafter, the leadframe is cleaned with an acid to remove any contaminants remaining on the leadframe.
    Type: Application
    Filed: March 7, 2007
    Publication date: September 11, 2008
    Inventors: Yiu Fai KWAN, Tat Chi CHAN, Wai CHAN, Chi Chung LEE
  • Patent number: 6274010
    Abstract: An apparatus for electroplating at least one substrate is disclosed as including a trough, two anodes, at least one bath and two poly-tetrafluoroethylene sheets or a number of substantially rigid polypropylene plates, in which the trough supports the substrate and is in an electrically conductive relationship therewith, and the bath contains the anodes, the trough and an electrolyte, in which, in operation, an electric field exists in the electrolyte between the trough and the anodes, and in which the poly-tetrafluoroethylene sheets or the polypropylene plates are movable to vary the amount of electric current passing between the trough and the anodes.
    Type: Grant
    Filed: July 13, 1998
    Date of Patent: August 14, 2001
    Assignee: Process Automation International Limited
    Inventors: Paul Henington, Chun Pan Fung, Kwok Wah Li, Chi Chung Lee
  • Patent number: 6251234
    Abstract: An electroplating machine is disclosed as including an electrode positioning apparatus, an electrolyte delivery apparatus, an apparatus for covering a roller, an apparatus for dissolving copper oxide powder in an electrolyte passing through the apparatus, and an apparatus allowing the variation of the distance between two rollers. The electrode positioning apparatus has a first open end and a second end joined by two sets of connecting members, in which the connecting members in each set are parallel to one another and equally spaced from the adjacent member. The electrolyte delivery apparatus includes a pipe connected to a source of electrolyte and a nozzle through which the electrolyte is deliverable to an electrode mounted on the electrode positioning apparatus. The covering apparatus is elongate in shape and includes a cavity for accommodating a majority part of the outside surface of a roller.
    Type: Grant
    Filed: November 8, 1999
    Date of Patent: June 26, 2001
    Assignees: Process Automation International, Ltd., Shipley Company, LLC
    Inventors: Paul Henington, Kwok Wah Li, Kwok Wing Ng, Chi Chung Lee, Pin Chun Huang, Fang Hao Lee, Marlin Vance Marsh, Carl John Colangelo
  • Patent number: 6174417
    Abstract: An electroplating machine is disclosed as including an electrode positioning apparatus, an electrolyte delivery apparatus, an apparatus for covering a roller, an apparatus for dissolving copper oxide powder in an electrolyte passing through the apparatus, and an apparatus allowing the variation of the distance between two rollers. The electrode positioning apparatus has a first open end and a second end joined by two sets of connecting members, in which the connecting members in each set are parallel to one another and equally spaced from the adjacent member. The electrolyte delivery apparatus includes a pipe connected to a source of electrolyte and a nozzle through which the electrolyte is deliverable to an electrode mounted on the electrode positioning apparatus. The nozzle includes an elongate gap and the electrolyte exits the nozzle continuously along the entire length of the elongate gap. The electrode positioning and the electrolyte delivery apparatus are slidably engageable with each other.
    Type: Grant
    Filed: August 28, 1998
    Date of Patent: January 16, 2001
    Assignees: Process Automation International Ltd., Shipley Company, L.L.C.
    Inventors: Paul Henington, Kwok Wah Li, Kwok Wing Ng, Chi Chung Lee, Pin Chun Huang, Fang Hao Lee, Marlin Vance Marsh, Carl John Colangelo