Patents by Inventor Chi-Fei NIEN

Chi-Fei NIEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL
    Publication number: 20220365446
    Abstract: A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.
    Type: Application
    Filed: July 27, 2022
    Publication date: November 17, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Manouk RIJPSTRA, Cornelis Johannes Henricus LAMBREGTS, Wim Tjibbo TEL, Sarathi ROY, Cédric Désiré GROUWSTRA, Chi-Fei NIEN, Weitian KOU, Chang-Wei CHEN, Pieter Gerardus Jacobus SMORENBERG
  • Computational metrology based correction and control
    Patent number: 11448973
    Abstract: A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.
    Type: Grant
    Filed: November 20, 2018
    Date of Patent: September 20, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Manouk Rijpstra, Cornelis Johannes Henricus Lambregts, Wim Tjibbo Tel, Sarathi Roy, Cédric Désiré Grouwstra, Chi-Fei Nien, Weitian Kou, Chang-Wei Chen, Pieter Gerardus Jacobus Smorenberg
  • COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL
    Publication number: 20210080837
    Abstract: A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.
    Type: Application
    Filed: November 20, 2018
    Publication date: March 18, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Manouk RIJPSTRA, Cornelis Johannes Henricus LAMBREGTS, Wim Tjibbo TEL, Sarathi ROY, Cédric Désiré GROUWSTRA, Chi-Fei NIEN, Weitian KOU, Chang-Wei CHEN, Pieter Gerardus Jacobus SMORENBERG