Patents by Inventor Chi-Han Chiou

Chi-Han Chiou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120261263
    Abstract: A three-dimensional nanochannel device and a method of manufacturing the same are provided. In the device, a first substrate, a second substrate, and a channel layer sandwiched by the first and the second substrates are included. At least one channel is constituted by the first and the second substrates and the channel layer and includes a fluid inlet, a fluid outlet, and at least one condensed channel between the fluid inlet and the fluid outlet. The condensed channel at least has a first size and a second size on an X-Y plane and has a third size and a fourth size on an X-Z plane. A difference between the first size and the second size is about at least two orders in scale, and a difference between the third size and the fourth size is about at least two orders in scale.
    Type: Application
    Filed: August 9, 2011
    Publication date: October 18, 2012
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Liang-Ju Chien, Chi-Han Chiou
  • Publication number: 20110168561
    Abstract: A dielectrophoretic particle concentrator includes first substrate, detection electrodes, second substrate, protrudent structure and edge wall structures. The first substrate extends along first direction. The detection electrodes are disposed on the first substrate and extend along second direction. The second direction crosses the first direction. The second substrate is disposed over the first substrate and extends along the first direction. The protrudent structure is disposed on the second substrate and protruded towards the first substrate. A top portion of the protrudent structure includes a line-like structure extending along the second direction and adjacent to the detection electrodes. The edge wall structures are integrated with the first substrate and the second substrate, to form pipe-like structure to enable a fluid flowing through the protrudent structure from an end to another end.
    Type: Application
    Filed: April 19, 2010
    Publication date: July 14, 2011
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Liang-Ju Chien, Chi-Han Chiou