Abstract: A method of fabricating a device includes forming a dummy gate over a plurality of fins. Thereafter, a first portion of the dummy gate is removed to form a first trench that exposes a first hybrid fin and a first part of a second hybrid fin. The method further includes filling the first trench with a dielectric material disposed over the first hybrid fin and over the first part of the second hybrid fin. Thereafter, a second portion of the dummy gate is removed to form a second trench and the second trench is filled with a metal layer. The method further includes etching-back the metal layer, where a first plane defined by a first top surface of the metal layer is disposed beneath a second plane defined by a second top surface of a second part of the second hybrid fin after the etching-back the metal layer.

Abstract: A capacitive touch key is disclosed. The capacitive touch key includes a capacitive key, generating a first capacitance value when a user is close to the capacitive key; a mechanical key connected with the capacitive key; a capacitor connected with the mechanical key and having a second capacitance value; and a processing unit connected with the capacitive key, wherein the processing unit detects the first capacitance value when the mechanical key is not pressed by a user, and the processing unit detects the first capacitance value and the second capacitance value when the mechanical key is pressed by a user.