Patents by Inventor Chi-Hsien Tuan

Chi-Hsien Tuan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Evaporation method and apparatus thereof
    Patent number: 7125581
    Abstract: An evaporation method and an apparatus thereof are disclosed. The evaporation apparatus comprises a rotator, a heater and a source supplying device. The rotator, which is disposed above the central portion of the substrate, can rotate the substrate. An evaporation source is disposed on the heater, and the evaporation region is a circular region. The heater and the source supplying device are disposed below the substrate, wherein the source supplying device provides the evaporation source on the heater along a supply direction. In order to prevent the location of the evaporation source shifts along the supply direction from affecting the uniformity of deposited film, a circular trace is defined and the heater is disposed below the circular trace so that the supplying direction is parallel to the tangential direction of the circular trace.
    Type: Grant
    Filed: October 24, 2003
    Date of Patent: October 24, 2006
    Assignee: RiTdisplay Corporation
    Inventors: Chun-An Chen, Chi-Hsien Tuan
  • Evaporation method and apparatus thereof
    Publication number: 20040091251
    Abstract: An evaporation method and an apparatus thereof are disclosed. The evaporation apparatus comprises a rotator, a heater and a source supplying device. The rotator, which is disposed above the central portion of the substrate, can rotate the substrate. An evaporation source is disposed on the heater, and the evaporation region is a circular region. The heater and the source supplying device are disposed below the substrate, wherein the source supplying device provides the evaporation source on the heater along a supply direction. In order to prevent the location of the evaporation source shifts along the supply direction from affecting the uniformity of deposited film, a circular trace is defined and the heater is disposed below the circular trace so that the supplying direction is parallel to the tangential direction of the circular trace.
    Type: Application
    Filed: October 24, 2003
    Publication date: May 13, 2004
    Inventors: Chun-An Chen, Chi-Hsien Tuan