Abstract: A method is described. The method includes obtaining a relationship between a thickness of a contamination layer formed on a mask and an amount of compensation energy to remove the contamination layer, obtaining a first thickness of a first contamination layer formed on the mask from a thickness measuring device, and applying first compensation energy calculated from the relationship to a light directed to the mask.

Abstract: A semiconductor device and method of manufacturing the same are provided. The semiconductor device includes a substrate and a first gate electrode disposed on the substrate and located in a first region of the semiconductor device. The semiconductor device also includes a first sidewall structure covering the first gate electrode. The semiconductor device further includes a protective layer disposed between the first gate electrode and the first sidewall structure. In addition, the semiconductor device includes a second gate electrode disposed on the substrate and located in a second region of the semiconductor device. The semiconductor device also includes a second sidewall structure covering a lateral surface of the second gate electrode.

Abstract: A method of manufacturing a carrying substrate is provided. At least one circuit component is disposed on a first circuit structure. An encapsulation layer is formed on the first circuit structure and encapsulates the circuit component. A second circuit structure is formed on the encapsulation layer and electrically connected to the circuit component. The circuit component is embedded in the encapsulation layer via an existing packaging process. Therefore, the routing area is increased, and a package substrate requiring a large size has a high yield and low manufacturing cost.

Abstract: A method of manufacturing a porous fluorine-containing polymer membrane is provided, which includes mixing a fluorine-containing polymer, a pore creating agent, and a solvent to form a mixture; forming a membrane of the mixture, and removing the pore creating agent and the solvent in the membrane to form the porous fluorine-containing polymer film. The pore creating agent has a chemical formula of wherein R1 is a C1-8 alkyl group, a C2-8 alkenyl group, a C2-8 alkynyl group, or a C6-12 aromatic group, and A? is hydrogen sulfite ion, dihydrogen phosphate ion, nitrate ion, halogen ion, or a combination thereof.