Patents by Inventor Chi-Hung Liu

Chi-Hung Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11935804
    Abstract: In an embodiment, a device includes: an integrated circuit die; an encapsulant at least partially surrounding the integrated circuit die, the encapsulant including fillers having an average diameter; a through via extending through the encapsulant, the through via having a lower portion of a constant width and an upper portion of a continuously decreasing width, a thickness of the upper portion being greater than the average diameter of the fillers; and a redistribution structure including: a dielectric layer on the through via, the encapsulant, and the integrated circuit die; and a metallization pattern having a via portion extending through the dielectric layer and a line portion extending along the dielectric layer, the metallization pattern being electrically coupled to the through via and the integrated circuit die.
    Type: Grant
    Filed: April 10, 2023
    Date of Patent: March 19, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tzu-Sung Huang, Ming Hung Tseng, Yen-Liang Lin, Hao-Yi Tsai, Chi-Ming Tsai, Chung-Shi Liu, Chih-Wei Lin, Ming-Che Ho
  • Publication number: 20240077914
    Abstract: A foldable electronic device includes a first body having an end and a first inclined surface, a second body having a second inclined surface, and a hinge module. The end includes an accommodating area. A virtual shaft line exists between sides of the first inclined surface and the second inclined surface that are closest to each other. The second body rotates relative to the first body through the virtual shaft line. The hinge module includes a first bracket adjacent to the first inclined surface, connected to the first body, and located in the accommodating area, a second bracket adjacent to the second inclined surface and connected to the second body, and a third bracket including a first end and a second end. The first bracket is connected to the first end through a first torsion assembly. The second bracket is connected to the second end through a second torsion assembly.
    Type: Application
    Filed: April 27, 2023
    Publication date: March 7, 2024
    Applicant: ASUSTeK COMPUTER INC.
    Inventors: Chih-Han Chang, Tsung-Ju Chiang, Chi-Hung Lin, Yen-Ting Liu
  • Patent number: 8426547
    Abstract: A phosphorus-containing epoxy resin and a method for synthesizing the same are disclosed. The method includes the step of catalytically reacting compound (i) with compound (ii) to synthesize the phosphorus-containing epoxy resin having the structure of compound (I). R is methyl or phenyl, and n is the integer from 1 to 9.
    Type: Grant
    Filed: March 29, 2010
    Date of Patent: April 23, 2013
    Assignee: Chang Chun Plastics Co., Ltd
    Inventors: Fang-Hsien Su, Chi-Hung Liu, Chun-Hsiung Kao, An-Pang Tu, Kuen-Yuan Hwang
  • Publication number: 20120315724
    Abstract: A method for deposition of a selenium thin-film includes the following steps. First, a plasma head is provided. Then, a substrate is supported in an atmospheric pressure. Next, a solid-state selenium source is dissociated by the plasma head to deposit the selenium thin-film on the substrate. The plasma head includes a chamber, a housing and the solid-state selenium source. Plasma is produced in the chamber. The chamber is surrounded by the housing. The solid-state selenium source is supported by the housing.
    Type: Application
    Filed: September 12, 2011
    Publication date: December 13, 2012
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chi-Hung Liu, Kuo-Hui Yang, Chen-Der Tsai, Ying-Fang Chang, Ta-Hsin Chou
  • Patent number: 8316796
    Abstract: A film coating system for coating an object includes a working station and an isolating device. The object is disposed on the working station, and the isolating device is utilized to isolate the object. The isolating device includes a body generating a first power, a first working fluid, a second working fluid, a first guiding portion and a second guiding portion. The first guiding portion guides the first working fluid to pass through the body, thereby forming a first working region to coat the object thereon. The second guiding portion guides the second working fluid excited by the first power of the body to pass through the body, thereby forming a second working region to separate the first working region from the object.
    Type: Grant
    Filed: December 12, 2007
    Date of Patent: November 27, 2012
    Assignee: Industrial Technology Research Institute
    Inventors: Chi-Hung Liu, Chih-Ming Chen, Chun-Hsien Su, Chih-Wei Chen, Wen-Tung Hsu, Chun-Hung Lin
  • Patent number: 8277616
    Abstract: A surface treating method for treating a tooth surface and a surface treating device thereof are provided. First, a working gas is filled into a tube. Next, a voltage is provided to the working gas for exciting the working gas into plasma. After that, the plasma is discharged through an opening of the tube for contacting the tooth surface.
    Type: Grant
    Filed: August 28, 2007
    Date of Patent: October 2, 2012
    Assignee: Industrial Technology Research Institute
    Inventors: Chi-Hung Liu, Chun-Hung Lin, Chun-Hsien Su, Wen-Tung Hsu
  • Patent number: 8092750
    Abstract: A plasma system for generating a plasma is generated. The plasma system includes a tube, a positive electrode and a negative electrode. The tube has a plasma jet opening, a first end surface and a second end surface. The plasma jet opening penetrates the wall of the tube. The plasma passes through the plasma jet opening and is emitted to the outside of the tube. The positive electrode has a side surface facing and adjacent to the tube. The negative electrode is separated from the positive electrode by a first predetermined distance. The negative electrode has a negative electrode side surface facing and adjacent to the tube. The first positive electrode and the first negative electrode are disposed between the first end surface and the second end surface, and a portion of the plasma jet opening is disposed between the positive electrode and the negative electrode.
    Type: Grant
    Filed: February 19, 2009
    Date of Patent: January 10, 2012
    Assignee: Industrial Technology Research Institute
    Inventors: Chi-Hung Liu, Chen-Der Tsai, Chun-Hsien Su, Wen-Tung Hsu, Jen-Hui Tsai, Chun Huang
  • Publication number: 20110172384
    Abstract: A phosphorus-containing epoxy resin and a method for synthesizing the same are disclosed. The method includes the step of catalytically reacting compound (i) with compound (ii) to synthesize the phosphorus-containing epoxy resin having the structure of compound (I). R is methyl or phenyl, and n is the integer from 1 to 9.
    Type: Application
    Filed: March 29, 2010
    Publication date: July 14, 2011
    Applicant: CHANG CHUN PLASTICS CO., LTD
    Inventors: Fang-Hsien SU, Chi-Hung LIU, Chun-Hsiung KAO, An-Pang TU, Kuen-Yuan HWANG
  • Publication number: 20110100556
    Abstract: A plasma system with an injection device is provided. The plasma system comprises a plasma cavity and an injection device. The plasma cavity comprises a first electrode and a second for generating plasma. The injection device comprises a plasma injection tube and at least a reactant injection tube. The plasma injection tube is connected to the plasma cavity. The plasma injection tube comprises an inlet, an outlet and an outer sidewall. The plasma injection tube injects the plasma from the inlet and guides the plasma out through the outlet. The outer sidewall has a width decreasing from the inlet to the outlet. The reactant injection tube is disposed outside of the outer sidewall. The reactant injection tube injects a reactant to the outer sidewall so that the reactant flows along the outer sidewall toward the outlet and mixes with the plasma at the outlet.
    Type: Application
    Filed: December 24, 2009
    Publication date: May 5, 2011
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chi-Hung Liu, Chen-Der Tsai, Wen-Tung Hsu, Chun-Hsien Su, Wen-Chin Cheng, Liang-Yi Chen
  • Publication number: 20100098600
    Abstract: A plasma system for generating a plasma is generated. The plasma system includes a tube, a positive electrode and a negative electrode. The tube has a plasma jet opening, a first end surface and a second end surface. The plasma jet opening penetrates the wall of the tube. The plasma passes through the plasma jet opening and is emitted to the outside of the tube. The positive electrode has a side surface facing and adjacent to the tube. The negative electrode is separated from the positive electrode by a first predetermined distance. The negative electrode has a negative electrode side surface facing and adjacent to the tube. The first positive electrode and the first negative electrode are disposed between the first end surface and the second end surface, and a portion of the plasma jet opening is disposed between the positive electrode and the negative electrode.
    Type: Application
    Filed: February 19, 2009
    Publication date: April 22, 2010
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chi-Hung Liu, Chen-Der Tsai, Chun-Hsien Su, Wen-Tung Hsu, Jen-Hui Tsai, Chun Huang
  • Patent number: 7626662
    Abstract: A method for fabricating liquid crystal (LC) alignment includes the steps of processing an alignment film having a plurality of liquid crystal molecules with a single or plurality of plasma generating devices, such that the liquid crystal molecules are aligned at a high pretilt angle. Compared with the prior art, the present invention is suitable for modifying the alignment film surface adjustablely in directions and angles, and can attain the effect of alignment stability with a high pretilt angle in a single process, thus overcoming the drawbacks of the prior art.
    Type: Grant
    Filed: August 3, 2007
    Date of Patent: December 1, 2009
    Assignee: Industrial Technology Research Institute
    Inventors: Chin-Yang Lee, Huang-Chin Tang, Kei-Hsiung Yang, Chih-Wei Chen, Chi-Hung Liu, Yu-Jung Shih
  • Publication number: 20090064933
    Abstract: A film coating system for coating an object includes a working station and an isolating device. The object is disposed on the working station, and the isolating device is utilized to isolate the object. The isolating device includes a body generating a first power, a first working fluid, a second working fluid, a first guiding portion and a second guiding portion. The first guiding portion guides the first working fluid to pass through the body, thereby forming a first working region to coat the object thereon. The second guiding portion guides the second working fluid excited by the first power of the body to pass through the body, thereby forming a second working region to separate the first working region from the object.
    Type: Application
    Filed: December 12, 2007
    Publication date: March 12, 2009
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chi-Hung Liu, Chih-Ming Chen, Chun-Hsien Su, Chih-Wei Chen, Wen-Tung Hsu, Chun-Hung Lin
  • Publication number: 20090004620
    Abstract: A surface treating method for treating a tooth surface and a surface treating device thereof are provided. First, a working gas is filled into a tube. Next, a voltage is provided to the working gas for exciting the working gas into plasma. After that, the plasma is discharged through an opening of the tube for contacting the tooth surface.
    Type: Application
    Filed: August 28, 2007
    Publication date: January 1, 2009
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chi-Hung LIU, Chun-Hung LIN, Chun-Hsien SU, Wen-Tung HSU
  • Publication number: 20080066679
    Abstract: A processing system is used for processing an object by a first fluid. The processing system includes a base and a plasma generation device. The base supports the object and the plasma generation device ionizes the first fluid. The plasma generation device includes at least one guiding element comprising a path guiding the first fluid to sequentially flow through a first position and a second position and at least one electrode element including a first electrode corresponding to the first position and a second electrode corresponding to the second position. The first and second electrodes energize the first fluid located between the first and second electrodes to form a second fluid, to thereby utilize the second fluid to perform surfacing, activating, cleaning, photoresist ashing or etching process on the object supported by the base.
    Type: Application
    Filed: November 29, 2006
    Publication date: March 20, 2008
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chi-Hung Liu, Wen-Tzong Hsieh, Chen-Der Tsai, Chun-Hsien Su, Chih Wei Chen, Chun-Hung Lin
  • Publication number: 20080030673
    Abstract: A method for fabricating liquid crystal (LC) alignment includes the steps of processing an alignment film having a plurality of liquid crystal molecules with a single or plurality of plasma generating devices, such that the liquid crystal molecules are aligned at a high pretilt angle. Compared with the prior art, the present invention is suitable for modifying the alignment film surface adjustablely in directions and angles, and can attain the effect of alignment stability with a high pretilt angle in a single process, thus overcoming the drawbacks of the prior art.
    Type: Application
    Filed: August 3, 2007
    Publication date: February 7, 2008
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chin-Yang Lee, Huang-Chin Tang, Kei-Hsiung Yang, Chih-Wei Chen, Chi-Hung Liu, Yu-Jung Shih
  • Patent number: 6821127
    Abstract: A socket assembly (1) includes a socket (2) and a vacuum pickup cap (3). The socket includes a base (20), a cover (21) movably assembled upon the base and an actuating rod (22) assembled on both the base and the cover for driving the cover to move in relative to the base. The cover defines a through hole (200) in a center thereof. The vacuum pickup cap includes a flexible bottom plate (31) and a flexible film (32). The flexible bottom plate has a sticky bottom surface (310) adhered to an upper surface of the cover and covering the through hole of the cover. The flexible film has a sticky bottom surface (320) adhered to the flexible bottom plate and a smooth upper surface (321) adapted for being sucked by a vacuum pickup device.
    Type: Grant
    Filed: November 4, 2002
    Date of Patent: November 23, 2004
    Assignee: Hon Hai Precision Ind. Co., LTD
    Inventors: Nick Lin, Fang-Jwu Liao, Hsiang-Ping Chen, Chi-Hung Liu
  • Publication number: 20030194891
    Abstract: A socket assembly (1) includes a socket (2) and a vacuum pickup cap (3). The socket includes a base (20), a cover (21) movably assembled upon the base and an actuating rod (22) assembled on both the base and the cover for driving the cover to move in relative to the base. The cover defines a through hole (200) in a center thereof. The vacuum pickup cap includes a flexible bottom plate (31) and a flexible film (32). The flexible bottom plate has a sticky bottom surface (310) adhered to an upper surface of the cover and covering the through hole of the cover. The flexible film has a sticky bottom surface (320) adhered to the flexible bottom plate and a smooth upper surface (321) adapted for being sucked by a vacuum pickup device.
    Type: Application
    Filed: November 4, 2002
    Publication date: October 16, 2003
    Inventors: Nick Lin, Fang-Jwu Liao, Hsiang-Ping Chen, Chi-Hung Liu