Patents by Inventor Chi-Jung Cheng

Chi-Jung Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240115410
    Abstract: An assistive device structure for positioning and pressure relief is provided, including a first elastic layer and a second elastic layer, which are attached by using a high-frequency encapsulation process, sealing, bagging, thermoforming, or an integrally molding process. Each of the first and second elastic layers has a bottom surface and an arc surface disposed opposite to each other. The arc surface includes two protrusions and a recess formed there in between. The two protrusions have different heights. A hollow area is disposed in the recess of the first and second elastic layers. Based on such structure, the bottom surfaces of the first and second elastic layers are attached to form the proposed assistive device structure for a user to lean against and providing multiple positioning effects and pressure relief. More than four axial directions of supporting forces are generated to effectively enhance muscle relaxation and stress relief.
    Type: Application
    Filed: December 18, 2023
    Publication date: April 11, 2024
    Inventors: SY-WEN HORNG, LONG-YING CHENG, CHI-WEI HUNG, HSIANG-JUNG HUNG, LI-CHE HUNG
  • Patent number: 10571430
    Abstract: A chemical vapor deposition or atomic layer deposition system includes a gas concentration sensor for determining the quantity of precursor gases admitted thereto. The gas concentration sensor can include a transmitter and a receiver for transmitting an acoustic signal across a chamber. In embodiments, the transmitter and receiver are designed to increase transmitted signal while reducing transmitted noise, facilitating use of the gas concentration sensor at low pressure and high temperature.
    Type: Grant
    Filed: March 10, 2017
    Date of Patent: February 25, 2020
    Assignee: Veeco Instruments Inc.
    Inventors: Chi-Jung Cheng, Leo Chin, Christopher J. Morath, Arindam Sinharoy, Raymond C. Logue
  • Publication number: 20170261471
    Abstract: A chemical vapor deposition or atomic layer deposition system includes a gas concentration sensor for determining the quantity of precursor gases admitted thereto. The gas concentration sensor can include a transmitter and a receiver for transmitting an acoustic signal across a chamber. In embodiments, the transmitter and receiver are designed to increase transmitted signal while reducing transmitted noise, facilitating use of the gas concentration sensor at low pressure and high temperature.
    Type: Application
    Filed: March 10, 2017
    Publication date: September 14, 2017
    Inventors: Chi-Jung Cheng, Leo Chin, Christopher J. Morath, Arindam Sinharoy, Raymond C. Logue