Abstract: A method for CMP includes following operations. A metal stack is received. The metal layer stack includes at least a first metal layer and a second metal layer, and a top surface of the first metal layer and a top surface of the second metal layer are exposed. A protecting layer is formed over the second metal layer. A portion of the first metal layer is etched. The protecting layer protects the second metal layer during the etching of the portion of the first metal layer. A top surface of the etched first metal layer is lower than a top surface of the protecting layer. The protecting layer is removed from the second metal layer.

Abstract: An autonomous platform can obtain sensor data descriptive of an actor in an environment of an autonomous vehicle and at least a portion of the environment of the autonomous vehicle that does not include the actor, the sensor data comprising at least one sweep of the environment of the autonomous vehicle; process the sensor data with a machine-learned perception model to generate a detection of the actor and one or more predicted future velocities; and determine a motion trajectory for the autonomous vehicle based at least in part on the detection and the one or more predicted future velocities.