Patents by Inventor Chi-Lin Lu

Chi-Lin Lu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method to improve mask critical dimension uniformity (CDU)
    Patent number: 8609545
    Abstract: A method and system for fabricating a substrate is disclosed. First, a plurality of process chambers are provided, at least one of the plurality of process chambers adapted to receive at least one plasma filtering plate and at least one of the plurality of process chambers containing a plasma filtering plate library. A plasma filtering plate is selected and removed from the plasma filtering plate library. Then, the plasma filtering plate is inserted into at least one of the plurality of process chambers adapted to receive at least one plasma filtering plate. Subsequently, an etching process is performed in the substrate.
    Type: Grant
    Filed: February 14, 2008
    Date of Patent: December 17, 2013
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: I-Hsiung Huang, Chi-Lin Lu, Heng-Jen Lee, Sheng-Chi Chin, Yao-Ching Ku