Patents by Inventor Chi-Min TU

Chi-Min TU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electronic system of specimen qualification
    Patent number: 12253473
    Abstract: The present disclosure provides an electronic system with defect identification function and a method of qualifying a photoresist pattern formed using a lithography process. The electronic system includes an inspection apparatus and a processor associated with the inspection apparatus. The inspection apparatus is used for acquiring at least one image of the specimen on which a photoresist pattern is formed using a lithography process. The processor is configured to automatically apply machine learning processes implemented through one or more neural networks to identify at least one defect present in the photoresist pattern.
    Type: Grant
    Filed: May 13, 2024
    Date of Patent: March 18, 2025
    Assignee: NANYA TECHNOLOGY CORPORATION
    Inventors: Hung-Chih Chang, Chug-Chi Chu, Chi-Min Tu, Wun-Ye Ku
  • ELECTRONIC SYSTEM OF SPECIMEN QUALIFICATION
    Publication number: 20240295505
    Abstract: The present disclosure provides an electronic system with defect identification function and a method of qualifying a photoresist pattern formed using a lithography process. The electronic system includes an inspection apparatus and a processor associated with the inspection apparatus. The inspection apparatus is used for acquiring at least one image of the specimen on which a photoresist pattern is formed using a lithography process. The processor is configured to automatically apply machine learning processes implemented through one or more neural networks to identify at least one defect present in the photoresist pattern.
    Type: Application
    Filed: May 13, 2024
    Publication date: September 5, 2024
    Inventors: HUNG-CHIH CHANG, CHUG-CHI CHU, CHI-MIN TU, WUN-YE KU
  • Electronic system and method of specimen qualification
    Patent number: 12019032
    Abstract: The present disclosure provides an electronic system with defect identification function and a method of qualifying a photoresist pattern formed using a lithography process. The electronic system includes an inspection apparatus and a processor associated with the inspection apparatus. The inspection apparatus is used for acquiring at least one image of the specimen on which a photoresist pattern is formed using a lithography process. The processor is configured to automatically apply machine learning processes implemented through one or more neural networks to identify at least one defect present in the photoresist pattern.
    Type: Grant
    Filed: December 7, 2020
    Date of Patent: June 25, 2024
    Assignee: NANYA TECHNOLOGY CORPORATION
    Inventors: Hung-Chih Chang, Chug-Chi Chu, Chi-Min Tu, Wun-Ye Ku
  • ELECTRONIC SYSTEM AND METHOD OF SPECIMEN QUALIFICATION
    Publication number: 20220178845
    Abstract: The present disclosure provides an electronic system with defect identification function and a method of qualifying a photoresist pattern formed using a lithography process. The electronic system includes an inspection apparatus and a processor associated with the inspection apparatus. The inspection apparatus is used for acquiring at least one image of the specimen on which a photoresist pattern is formed using a lithography process. The processor is configured to automatically apply machine learning processes implemented through one or more neural networks to identify at least one defect present in the photoresist pattern.
    Type: Application
    Filed: December 7, 2020
    Publication date: June 9, 2022
    Inventors: Hung-Chih CHANG, Chug-Chi CHU, Chi-Min TU, Wun-Ye KU