Patents by Inventor Chi-Min Yang

Chi-Min Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Exposure apparatus, method of forming patterned layer, method of forming patterned photoresist layer, active device array substrate and patterned layer
    Patent number: 8427631
    Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.
    Type: Grant
    Filed: November 17, 2010
    Date of Patent: April 23, 2013
    Assignee: Au Optronics Corporation
    Inventors: Hsiang-Chih Hsiao, Ta-Wen Liao, Chi-Min Yang, Shan-Fang Chen, Ya-Ping Chang, Chi-Hung Yang, Chung-Yuan Liao
  • EXPOSURE APPARATUS, METHOD OF FORMING PATTERNED LAYER, METHOD OF FORMING PATTERNED PHOTORESIST LAYER, ACTIVE DEVICE ARRAY SUBSTRATE AND PATTERNED LAYER
    Publication number: 20110223393
    Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.
    Type: Application
    Filed: November 17, 2010
    Publication date: September 15, 2011
    Applicant: Au Optronics Corporation
    Inventors: Hsiang-Chih Hsiao, Ta-Wen Liao, Chi-Min Yang, Shan-Fang Chen, Ya-Ping Chang, Chi-Hung Yang, Chung-Yuan Liao