Patents by Inventor Chi Seng Ng

Chi Seng Ng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9322643
    Abstract: An apparatus for 3D surface measurement of a target surface, the apparatus comprising: a first projector configured to project a fringe pattern onto the target surface; a second projector configured to project a fringe pattern onto the target surface; a first camera configured to capture the fringe patterns projected by the first projector and the second projector; a second camera configured to capture the fringe patterns projected by the first projector and the second projector; and a computer configured to perform fringe pattern processing of the fringe patterns captured by the first camera and the second camera and to perform data stitching and merging to obtain a 3D surface reconstruction.
    Type: Grant
    Filed: October 17, 2012
    Date of Patent: April 26, 2016
    Assignee: NANYANG TECHNOLOGICAL UNIVERSITY
    Inventors: Lei Huang, Chi Seng Ng, Hoe Jyh Koh, Anand Krishna Asundi
  • Publication number: 20150069247
    Abstract: There is provided a method and system for real time inspection of a silicon wafer. The method includes using an infrared plane polariscope to obtain an image of a bonded interface of the silicon wafer, the image showing stress patterns; and assessment of the stress patterns. The stress patterns in a form of at least one butterfly pattern indicates a presence of at least one of: at least one trapped particle, trapped gases and at least one de-bonding region. No computer/algorithm processing is carried out to locate defects/de-bondings at the bonded interface. Furthermore, the stress fields being generated can be used to approximate the size of the de-bonding region/trapped particle. The system employs the infrared plane polariscope to obtain an image of a bonded interface of the silicon wafer.
    Type: Application
    Filed: April 14, 2013
    Publication date: March 12, 2015
    Applicant: NANYANG TECHNOLOGIAL UNIVERSITY
    Inventors: Anand Krishna Asundi, Chi Seng Ng
  • Publication number: 20140253929
    Abstract: An apparatus for 3D surface measurement of a target surface, the apparatus comprising: a first projector configured to project a fringe pattern onto the target surface; a second projector configured to project a fringe pattern onto the target surface; a first camera configured to capture the fringe patterns projected by the first projector and the second projector; a second camera configured to capture the fringe patterns projected by the first projector and the second projector; and a computer configured to perform fringe pattern processing of the fringe patterns captured by the first camera and the second camera and to perform data stitching and merging to obtain a 3D surface reconstruction.
    Type: Application
    Filed: October 17, 2012
    Publication date: September 11, 2014
    Inventors: Lei Huang, Chi Seng Ng, Hoe Jyh Koh, Anand Krishna Asundi