Patents by Inventor Chi Sung Ihn

Chi Sung Ihn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Etchant composition, method for etching multilayered film, and method for preparing display device
    Patent number: 10501853
    Abstract: Embodiments provide an etchant composition including (A) a copper ion source, (B) a source of an organic acid ion having one or more carboxyl groups in a molecule, (C) a fluoride ion source, (D) an etching controller, a surface oxidizing power enhancer or a combination thereof as a first additive, and (E) a surfactant as a second additive; a method for etching a multilayered film; and a method for preparing a display device.
    Type: Grant
    Filed: October 7, 2015
    Date of Patent: December 10, 2019
    Assignees: SAMYOUNG PURE CHEMICALS CO., LTD., MITSUBISHI GAS CHEMICAL COMPANY, INC., SAMSUNG DISPLAY CO., LTD.
    Inventors: Jung-Ig Jeon, Chi-Sung Ihn, Mi-Soon Lee, Hyun-Eok Shin, Joon-Woo Bae
  • ETCHANT COMPOSITION, METHOD FOR ETCHING MULTILAYERED FILM, AND METHOD FOR PREPARING DISPLAY DEVICE
    Publication number: 20170306501
    Abstract: Embodiments provide an etchant composition including (A) a copper ion source, (B) a source of an organic acid ion having one or more carboxyl groups in a molecule, (C) a fluoride ion source, (D) an etching controller, a surface oxidizing power enhancer or a combination thereof as a first additive, and (E) a surfactant as a second additive; a method for etching a multilayered film; and a method for preparing a display device.
    Type: Application
    Filed: October 7, 2015
    Publication date: October 26, 2017
    Applicants: SAMYOUNG PURE CHEMICALS CO., LTD., MITSUBISHI GAS CHEMICAL COMPANY, INC., SAMSUNG DISPLAY CO., LTD.
    Inventors: Jung-Ig JEON, Chi-Sung IHN, Mi-Soon LEE, Hyun-Eok SHIN, Joon-Woo BAE
  • Anionic polymerization of functionalized styrene derivatives containing carbazole
    Patent number: 6569978
    Abstract: Disclosed are functionalized styrene derivatives containing carbazole and their anionic polymerization. Styrene derivatives containing carbazole, and homopolymers or copolymers of the styrene derivatives can be synthesized by the anionic polymerization method. Thusly synthesized high molecular weight polymer containing carbazole has advantages of thermal stability, optical properties, and defined molecular weight and limited molecular weight distribution.
    Type: Grant
    Filed: May 23, 2001
    Date of Patent: May 27, 2003
    Assignee: Kwangju Institute of Science and Technology
    Inventors: Jae Suk Lee, Young Sun Cho, Chi Sung Ihn, Hye Kyung Lee
  • Anionic polymerization of functionalized styrene derivatives containing carbazole
    Publication number: 20020115810
    Abstract: Disclosed are functionalized styrene derivatives containing carbazole and their anionic polymerization. Styrene derivatives containing carbazole, and homopolymers or copolymers of the styrene derivatives can be synthesized by the anionic polymerization method. Thusly synthesized high molecular weight polymer containing carbazole has advantages of thermal stability, optical properties, and defined molecular weight and limited molecular weight distribution.
    Type: Application
    Filed: May 23, 2001
    Publication date: August 22, 2002
    Inventors: Jae Suk Lee, Young Sun Cho, Chi Sung Ihn, Hye Kyung Lee