Abstract: The present disclosure relates to a semiconductor structure and a manufacturing method thereof. The manufacturing method of a semiconductor structure includes: providing a substrate, where a plurality of contact pads are formed on the substrate; depositing a dielectric layer on the substrate, where the dielectric layer fills gaps between the contact pads and covers the contact pads; and etching the dielectric layer through a plasma etching process to expose the contact pads, where an etching gas used in the plasma etching process includes an oxygen-free etching gas. The manufacturing method can avoid the formation of metal oxides on the contact pads, and avoid residual conductive metal particles or metal compounds on surfaces of the contact pads and the adjacent dielectric layers, which is beneficial to ensure the electrical performance of the semiconductor structure, thereby improving the use reliability of the semiconductor structure.

Abstract: The present invention relates to a capacitor and its formation method and to a DRAM cell. In various embodiments, a substrate is provided such that an electrical contact portion is formed thereon. A dielectric layer is formed on a surface of the substrate, including alternately stacked supporting layers and sacrificial layers. At least two capacitor holes penetrating the sacrificial layers and the supporting layers can formed to expose the same electrical contact portion. A lower electrode layer covering the inner surface of the capacitor holes can be formed. The lower electrode layer is connected to the electrical contact portion. The sacrificial layers are then removed and a capacitor dielectric layer and an upper electrode layer are formed successively on the inner and outer surfaces of the lower electrode layer and on the surface of the supporting layers. This can increase capacitance value per unit area of the capacitor.

Abstract: The present invention relates to a capacitor and its formation method and to a DRAM cell. In various embodiments, a substrate is provided such that an electrical contact portion is formed thereon. A dielectric layer is formed on a surface of the substrate, including alternately stacked supporting layers and sacrificial layers. At least two capacitor holes penetrating the sacrificial layers and the supporting layers can formed to expose the same electrical contact portion. A lower electrode layer covering the inner surface of the capacitor holes can be formed. The lower electrode layer is connected to the electrical contact portion. The sacrificial layers are then removed and a capacitor dielectric layer and an upper electrode layer are formed successively on the inner and outer surfaces of the lower electrode layer and on the surface of the supporting layers. This can increase capacitance value per unit area of the capacitor.