Abstract: The present disclosure provides a substrate processing apparatus including at least one input/output chamber. The load lock device includes a base, a guide rail, a platform and an optical measuring module. The guide rail is connected to the base. The platform, carrying a cassette for holding a batch of spaced substrates, is movably disposed on the guide rail. The optical measuring module is configured to acquire an actual moving distance traveled by the platform along the guide rail based on at least one optical signal reflected from the platform.

Abstract: The present disclosure provides a substrate processing apparatus including at least one input/output chamber. The load lock device includes a base, a guide rail, a platform and an optical measuring module. The guide rail is connected to the base. The platform, carrying a cassette for holding a batch of spaced substrates, is movably disposed on the guide rail. The optical measuring module is configured to acquire an actual moving distance traveled by the platform along the guide rail based on at least one optical signal reflected from the platform.

Abstract: A connection assembly includes a housing, an adaptor and a conducting element. The housing has a chamber and an opening communicating with the chamber. The adaptor has a first through hole. The adaptor is at least partially connected outside the housing. The opening communicates with the first through hole. The conducting element penetrates through the first through hole and the opening. The conducting element is detachably connected with the adaptor.

Abstract: A connection assembly includes a housing, an adaptor and a conducting element. The housing has a chamber and an opening communicating with the chamber. The adaptor has a first through hole. The adaptor is at least partially connected outside the housing. The opening communicates with the first through hole. The conducting element penetrates through the first through hole and the opening. The conducting element is detachably connected with the adaptor.

Abstract: A system and method are provided for establishing an automated debugging environment in an Electronic Design Automation (EDA) work flow. A user interface is provided for interfacing with a user by displaying a list of debuggable parameters, accepting a selection thereof from a user, and automatically locating both the callback function which sets the selected parameter, and the source code file which contains the callback function. Additionally, it is determined whether the callback function sets solely the selected parameter, or several different parameters, and an automatic breakpoint is set accordingly to break only responsive to the selected parameter. On execution of the modified callback function, execution will be arrested by the automatically-set intelligent breakpoint and a debugging user interface will be generated and provided to the user with a display of the relevant source code, callback function, parameter names and values, system state, and the like.

Abstract: A system and method are provided for establishing a debugging environment in an Electronic Design Automation work-flow. A user-interface is provided for interfacing with users by displaying a list of debuggable parameters, accepting a selection thereof, and automatically locating both the callback function which sets the selected parameter, and the source code file which contains the callback function. Additionally, it is determined whether the callback function sets solely the selected parameter, or several different parameters, and an automatic breakpoint is set accordingly to break only responsive to the selected parameter. On execution of the modified callback function, execution will be arrested by the automatically-set intelligent breakpoint and a debugging user-interface will be generated for the user to display the relevant source code, callback function, parameter names and values, system state, and the like. Upon completion of the debugging process, the automatically-set breakpoint will be removed.

Abstract: A system and method are provided for establishing an automated debugging environment in an Electronic Design Automation (EDA) work flow for the debugging of parameterized cells (PCELLS/PyCELLS) in a layout. A user may merely select a particular PCELL within a hierarchical PCELL and the system and method will determine dependencies thereof. The source code for the selected PCELL and its dependencies may be located and loaded. At least one breakpoint may be set in the source code of the selected PCELL. The source code for the selected PCELL and its dependencies may be executed to be arrested at the set breakpoints. Upon the arrest of execution, a debugging environment may be established and the located source code of the selected PCELL may be displayed along with values for parametric components thereof and progression control tools.

Abstract: A flatbed scanner includes a transparent window and an optical ruler close to the transparent window along a scanning direction. The optical ruler has at least one oblique line arranged thereon. The flatbed scanner includes a scanner head having a scanning width larger than the width of the transparent window for capturing an image of the optical ruler while the scanner head is being progressively moved by a step motor. The flatbed scanner further includes a processing unit for calculating a jag width of a captured oblique line in the captured image and a controlling unit for controlling the step motor to adjust the speed of movement of the scanner head according to the jag width of the captured oblique line.

Abstract: A system and method are provided for establishing an automated debugging environment in an Electronic Design Automation (EDA) work flow for the debugging of parameterized cells (PCELLS/PyCELLS) in a layout. A user may merely select a particular PCELL within a hierarchical PCELL and the system and method will determine dependencies thereof. The source code for the selected PCELL and its dependencies may be located and loaded. At least one breakpoint may be set in the source code of the selected PCELL. The source code for the selected PCELL and its dependencies may be executed to be arrested at the set breakpoints. Upon the arrest of execution, a debugging environment may be established and the located source code of the selected PCELL may be displayed along with values for parametric components thereof and progression control tools.

Abstract: A flatbed scanner includes a transparent window and an optical ruler close to the transparent window along a scanning direction. The optical ruler has at least one oblique line arranged thereon. The flatbed scanner includes a scanner head having a scanning width larger than the width of the transparent window for capturing an image of the optical ruler while the scanner head is being progressively moved by a step motor. The flatbed scanner further includes a processing unit for calculating a jag width of a captured oblique line in the captured image and a controlling unit for controlling the step motor to adjust the speed of movement of the scanner head according to the jag width of the captured oblique line.

Abstract: A decoration film, a decoration device and a method for manufacturing a decoration device are provided. The decoration film includes a substrate, a transparent material layer, a pattern layer, a plurality of aroma units and an adhesion layer. The transparent material layer is disposed on the substrate. The pattern layer is disposed on the transparent material layer at a side far from the substrate. The adhesion layer is exposed and disposed on the pattern layer. The aroma units are scattered in the transparent material layer, the pattern layer or the adhesion layer.

Abstract: The present invention discloses a voltage adjusting system and method for adjusting a driving voltage of a thermal print head by utilizing an electronic variable resistor. The voltage adjusting system includes a power converter, a voltage divider, an analog-to-digital converter (ADC), and a controller. The system and method of the present invention obtains a detecting voltage value through a feedback mechanism and the ADC, and then utilizes the detecting voltage value to control the electronic variable resistor implemented in the voltage divider to adjust the driving voltage of the thermal print head.

Abstract: The present invention discloses a voltage adjusting system and method for adjusting a driving voltage of a thermal print head by utilizing an electronic variable resistor. The voltage adjusting system includes a power converter, a voltage divider, an analog-to-digital converter (ADC), and a controller. The system and method of the present invention obtains a detecting voltage value through a feedback mechanism and the ADC, and then utilizes the detecting voltage value to control the electronic variable resistor implemented in the voltage divider to adjust the driving voltage of the thermal print head.

Abstract: The present invention provides a process for selectively depositing diamond films, which includes two stages of diamond deposition and the gas source used is a mixture of C.sub.x H.sub.y plus CO.sub.2 or C.sub.x H.sub.y O.sub.z plus CO.sub.2. In the period between the first and second stage, the substrate is immersed in an aqueous solution of HF plus HNO.sub.3. The obtained diamond films exhibit good crystallinity and selectivity and the growth rate is fast.

Abstract: A method is provided for efficiently producing an entirely quality-controlled CVD diamond. A CVD process is interrupted at an early stage and the deposit is taken out of the reaction chamber, before a significant mass is accumulated, and is inspected by means of cathodoluminescence. The spectrum are compared with a given reference in terms of peak position, half width and 20%-value width in coordination. The observed deviation allows to determine whether to maintain or alter the settings.A diamond substance of acceptable quality which is properly specified in terms of the CL parameters is also provided.

Abstract: The present invention provides a process for depositing diamond by chemical vapor deposition without using conventionally-used hydrogen, which is an explosive gas, as a reaction gases. The process includes contacting a substrate with a two-component gas mixture, under the conditions of a substrate temperature of 150.degree. C.-900.degree. C., a pressure of 1-50 torr, an input microwave power of 250-450 W. The two-component gas mixture is a hydrocarbon (C.sub.x H.sub.y) plus CO.sub.2 with a flow rate ratio of the C.sub.x H.sub.y to CO.sub.2 of 0.2-0.8, or a gasified liquid state oxygen-containing hydrocarbon (C.sub.x H.sub.y O.sub.z) plus CO.sub.2 with a flow rate ratio of the C.sub.x H.sub.y O.sub.z to CO.sub.2 of 12-17. High quality diamond can be obtained even at low temperature of 180.degree. C.

Abstract: A method of forming boron-doped diamond film by, chemical vapor deposition (CVD) utilizing two-component system reactant gas doped with trimethyl borate.

Abstract: Making a diamond substance exhibiting a cathodoluminescence spectrum with the peak at a photon energy greater than 2.8 eV (electron volt), the half-value and 20%-value width not exceeding 0.5 eV and 0.8 eV, respectively, comprising: providing a substrate in a closed chamber, introducing a matrix gas comprising H.sub.2 and one selected from hydrocarbon and CO to said chamber, exciting the gas to create a plasma while heating said substrate to a temperature of at least 700.degree. C. and, thus, causing deposition and growth of diamond substance which is crystallographically diamond, controlling parameters of the deposition by means of the cathodoluminescence record and recovering the diamond substance from the chamber.

Abstract: Diamond abrasive comprising a mass of idiomorphic crystal grits which each have an irregular shaped core of diamond formed under pressure where diamond is thermodynamically favored phase, and a growth layer of diamond and/or diamond-like carbon formed over said core by chemical vapor deposition.