Patents by Inventor CHIA-HSIN CHUNG
CHIA-HSIN CHUNG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240053610Abstract: A near-eye display device, including a substrate, a light-emitting element, an active element, an optical layer, and a light guide structure, is provided. The light-emitting element is located on the substrate and includes a first type semiconductor pattern. The active element is located adjacent to the light-emitting element. A channel layer of the active element and the first type semiconductor pattern of the light-emitting element belong to the same layer. The optical layer covers the light-emitting element and the active element. The light guide structure is located on the optical layer and includes an in-coupling portion and an out-coupling portion, wherein an orthogonal projection of the in-coupling portion on the substrate is overlapped with an orthogonal projection of the light-emitting element on the substrate. A manufacturing method of the near-eye display device is also provided.Type: ApplicationFiled: May 10, 2023Publication date: February 15, 2024Applicant: AUO CorporationInventors: Wei-Syun Wang, Hsin-Hung Li, Chih-Chiang Chen, Yu-Cheng Shih, Chia-Hsin Chung, Cheng-Chan Wang, Ming-Jui Wang, Han-Sheng Nian
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Publication number: 20240019620Abstract: A display device includes a first image generating unit and a first waveguide glass. The first image generating unit is configured to emit first light. The first waveguide glass faces toward the first image generating unit. The first waveguide glass includes a first microstructure, two second microstructures and a third microstructure. The first microstructure is located between two ends at the same side of the two second microstructures. The third microstructure is located between the two second microstructures. The third microstructure has a first grating and a second grating. An extending direction of the first grating is different from an extending direction of the second grating. The second microstructure is configured to receive the first light of the first image generating unit transmitted through the first microstructure and transmit the first light to the third microstructure.Type: ApplicationFiled: November 30, 2022Publication date: January 18, 2024Inventors: Han-Sheng NIAN, Ming-Jui WANG, Chih-Chiang CHEN, Chia-Hsin CHUNG, Yu-Cheng SHIH, Wei-Syun WANG, Cheng-Chan WANG, Hsin-Hung LI, Sheng-Ming HUANG
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Publication number: 20240012241Abstract: A head-up display includes an image generating unit and a waveguide glass. The waveguide glass faces toward the image generating unit. The waveguide glass includes a first microstructure, a second microstructure and a third microstructure. The first microstructure has a first width. The second microstructure is adjacent to the first microstructure. The third microstructure is adjacent to the second microstructure. The third microstructure has tiling areas adjacent to each other. A gap between the two adjacent tiling areas is less than half of the first width.Type: ApplicationFiled: November 29, 2022Publication date: January 11, 2024Inventors: Han-Sheng NIAN, Seok-Lyul LEE, Ming-Jui WANG, Chih-Chiang CHEN, Chia-Hsin CHUNG, Yu-Cheng SHIH, Cheng-Chan WANG, Hsin-Hung LI, Wei-Syun WANG, Sheng-Ming HUANG
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Publication number: 20220375989Abstract: A light-emitting device, including a first type semiconductor layer, a patterned insulating layer, a light-emitting layer, and a second type semiconductor layer, is provided. The patterned insulating layer covers the first type semiconductor layer and has a plurality of insulating openings. The insulating openings are separated from each other. The light-emitting layer is located in the plurality of insulating openings and covers a portion of the first type semiconductor layer. The second type semiconductor layer is located on the light-emitting layer.Type: ApplicationFiled: September 9, 2021Publication date: November 24, 2022Applicant: Au Optronics CorporationInventors: Hsin-Hung Li, Wei-Syun Wang, Chih-Chiang Chen, Yu-Cheng Shih, Cheng-Chan Wang, Chia-Hsin Chung, Ming-Jui Wang, Sheng-Ming Huang
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Patent number: 11442210Abstract: A polarizer substrate includes a substrate, a reflective layer, and a metal pattern layer. The reflective layer is located on the substrate and has a transmission area and a reflective area. The metal pattern layer is located on the reflective layer and the substrate. The metal pattern layer includes a polarizer structure and a microstructure. The polarizer structure includes a plurality of grid lines overlapping the transmission area. A thickness of each of the grid lines is 200 nm to 500 nm, a width of each of the grid lines is 30 nm to 70 nm, and a distance between each adjacent two of the grid lines is 30 nm to 70 nm. The microstructure overlaps the reflective area, and a thickness of the microstructure is 20 nm to 500 nm.Type: GrantFiled: July 20, 2020Date of Patent: September 13, 2022Assignee: Au Optronics CorporationInventors: Sheng-Kai Lin, Chia-Hsin Chung, Tsai-Sheng Lo, Sheng-Ming Huang, Ming-Jui Wang, Chih-Chiang Chen, Hui-Ku Chang, Cheng-Chan Wang, Chia-Po Lin, Jen-Kuei Lu
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Patent number: 11392003Abstract: An active device substrate including a substrate, first metal grid wires, a first transparent conductive layer, a gate insulating layer, a semiconductor layer, a source, and a drain is provided. The first metal grid wires are located on the substrate. The first transparent conductive layer includes a scan line and a gate connected to the scan line. The scan line and/or the gate is directly connected to at least a part of the first metal grid wires. The gate insulating layer is located on the first transparent conductive layer. The semiconductor layer is located on the gate insulating layer and overlapped with the gate. The source and the drain are electrically connected to the semiconductor layer.Type: GrantFiled: July 24, 2020Date of Patent: July 19, 2022Assignee: Au Optronics CorporationInventors: Cheng-Chan Wang, Tsai-Sheng Lo, Chia-Hsin Chung, Chih-Chiang Chen, Hui-Ku Chang, Sheng-Kai Lin, Chia-Po Lin, Ming-Jui Wang, Sheng-Ming Huang, Jen-Kuei Lu
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Patent number: 11181769Abstract: A polarizer substrate includes a substrate, an organic planarization layer, an inorganic buffer layer, and a plurality of strip-shaped polarizer structures. The organic planarization layer is located on the substrate. The inorganic buffer layer is located on the organic planarization layer. The inorganic buffer layer has a plurality of trenches located on a first surface. The trenches do not penetrate through the inorganic buffer layer. The strip-shaped polarizer structures are located on the first surface of the inorganic buffer layer. Each of the trenches is located between two adjacent polarizer structures. A display panel is also provided.Type: GrantFiled: May 9, 2019Date of Patent: November 23, 2021Assignee: Au Optronics CorporationInventors: Tsai-Sheng Lo, Chih-Chiang Chen, Ming-Jui Wang, Sheng-Kai Lin, Sheng-Ming Huang, Chia-Hsin Chung, Hui-Ku Chang, Wei-Chi Wang, Jen-Kuei Lu
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Publication number: 20210255379Abstract: A polarizer substrate includes a substrate, a reflective layer, and a metal pattern layer. The reflective layer is located on the substrate and has a transmission area and a reflective area. The metal pattern layer is located on the reflective layer and the substrate. The metal pattern layer includes a polarizer structure and a microstructure. The polarizer structure includes a plurality of grid lines overlapping the transmission area. A thickness of each of the grid lines is 200 nm to 500 nm, a width of each of the grid lines is 30 nm to 70 nm, and a distance between each adjacent two of the grid lines is 30 nm to 70 nm. The microstructure overlaps the reflective area, and a thickness of the microstructure is 20 nm to 500 nm.Type: ApplicationFiled: July 20, 2020Publication date: August 19, 2021Applicant: Au Optronics CorporationInventors: Sheng-Kai Lin, Chia-Hsin Chung, Tsai-Sheng Lo, Sheng-Ming Huang, Ming-Jui Wang, Chih-Chiang Chen, Hui-Ku Chang, Cheng-Chan Wang, Chia-Po Lin, Jen-Kuei Lu
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Publication number: 20210248341Abstract: A photosensitive device includes a display panel, a photosensitive element substrate, and a first quarter wave plate. The photosensitive element substrate is located on the back of the display panel. The photosensitive element substrate includes a first substrate, a plurality of first light emitting diodes, a plurality of photosensitive elements, and a first polarizer structure. The first light emitting diodes and the photosensitive elements are located on the first substrate. The first polarizer structure is located on the first light emitting diodes and the photosensitive elements. The first quarter wave plate is located between the first polarizer structure and the display panel.Type: ApplicationFiled: July 21, 2020Publication date: August 12, 2021Applicant: Au Optronics CorporationInventors: Chia-Po Lin, Tsai-Sheng Lo, Chih-Chiang Chen, Sheng-Ming Huang, Sheng-Kai Lin, Ming-Jui Wang, Chia-Hsin Chung, Hui-Ku Chang, Cheng-Chan Wang, Jen-Kuei Lu
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Publication number: 20210247652Abstract: An active device substrate including a substrate, first metal grid wires, a first transparent conductive layer, a gate insulating layer, a semiconductor layer, a source, and a drain is provided. The first metal grid wires are located on the substrate. The first transparent conductive layer includes a scan line and a gate connected to the scan line. The scan line and/or the gate is directly connected to at least a part of the first metal grid wires. The gate insulating layer is located on the first transparent conductive layer. The semiconductor layer is located on the gate insulating layer and overlapped with the gate. The source and the drain are electrically connected to the semiconductor layer.Type: ApplicationFiled: July 24, 2020Publication date: August 12, 2021Applicant: Au Optronics CorporationInventors: Cheng-Chan Wang, Tsai-Sheng Lo, Chia-Hsin Chung, Chih-Chiang Chen, Hui-Ku Chang, Sheng-Kai Lin, Chia-Po Lin, Ming-Jui Wang, Sheng-Ming Huang, Jen-Kuei Lu
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Patent number: 11054740Abstract: An imprint mold and a method for manufacturing the same are provided. The imprint mold includes a plurality of substantially identical or different mold patterns, wherein there isn't any height difference between the mold patterns.Type: GrantFiled: September 10, 2018Date of Patent: July 6, 2021Assignee: AU OPTRONICS CORPORATIONInventors: Sheng-Ming Huang, Sheng-Kai Lin, Chih-Chiang Chen, Hui-Ku Chang, Chia-Hsin Chung, Wei-Chi Wang, Ming-Jui Wang, Jen-Kuei Lu, Tsai-Sheng Lo, Huang-Kai Shen
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Patent number: 10802189Abstract: A wire grid polarizer and a display panel using the same are provided. The wire grid polarizer includes a substrate, a plurality of wire grids, a plurality of patterned light absorbing layers, and a surface covering layer. The plurality of wire grids are disposed on the substrate, wherein there are a plurality of gaps between every two wire grids. The plurality of patterned light absorbing layers are disposed corresponding to and overlapping the wire grids respectively, wherein every two of the patterned light absorbing layers have one of the gaps. The surface covering layer is disposed on the patterned light absorbing layers and directly contacts the patterned light absorbing layers.Type: GrantFiled: August 28, 2018Date of Patent: October 13, 2020Assignee: AU OPTRONICS CORPORATIONInventors: Huang-Kai Shen, Sheng-Ming Huang, Jen-Kuei Lu, Chih-Chiang Chen, Hui-Ku Chang, Tsai-Sheng Lo, Chia-Hsin Chung, Wei-Chi Wang, Sheng-Kai Lin, Ming-Jui Wang
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Publication number: 20200133061Abstract: A polarizer substrate includes a substrate, an organic planarization layer, an inorganic buffer layer, and a plurality of strip-shaped polarizer structures. The organic planarization layer is located on the substrate. The inorganic buffer layer is located on the organic planarization layer. The inorganic buffer layer has a plurality of trenches located on a first surface. The trenches do not penetrate through the inorganic buffer layer. The strip-shaped polarizer structures are located on the first surface of the inorganic buffer layer. Each of the trenches is located between two adjacent polarizer structures. A display panel is also provided.Type: ApplicationFiled: May 9, 2019Publication date: April 30, 2020Applicant: Au Optronics CorporationInventors: Tsai-Sheng Lo, Chih-Chiang Chen, Ming-Jui Wang, Sheng-Kai Lin, Sheng-Ming Huang, Chia-Hsin Chung, Hui-Ku Chang, Wei-Chi Wang, Jen-Kuei Lu
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Publication number: 20200103572Abstract: A polarizer substrate and manufacturing method thereof are provided. The polarizer substrate includes a substrate, a plurality of polarizer structures, a plurality of barrier structures, and a passivation layer. The polarizer structures are disposed on the substrate. Each of the polarizer structures includes a wire-grid and a capping structure disposed on the wire-grid. The barrier structures are disposed on the capping structures and not contacting with the side walls of the wire-grids. A gap between two adjacent barrier structures is smaller than a gap between two adjacent wire-grids. The passivation layer is disposed on the barrier structures.Type: ApplicationFiled: May 14, 2019Publication date: April 2, 2020Applicant: Au Optronics CorporationInventors: Wei-Chi Wang, Chih-Chiang Chen, Tsai-Sheng Lo, Sheng-Kai Lin, Chia-Hsin Chung, Hui-Ku Chang, Ming-Jui Wang, Sheng-Ming Huang, Jen-Kuei Lu
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Publication number: 20190094435Abstract: A wire grid polarizer and a display panel using the same are provided. The wire grid polarizer includes a substrate, a plurality of wire grids, a plurality of patterned light absorbing layers, and a surface covering layer. The plurality of wire grids are disposed on the substrate, wherein there are a plurality of gaps between every two wire grids. The plurality of patterned light absorbing layers are disposed corresponding to and overlapping the wire grids respectively, wherein every two of the patterned light absorbing layers have one of the gaps. The surface covering layer is disposed on the patterned light absorbing layers and directly contacts the patterned light absorbing layers.Type: ApplicationFiled: August 28, 2018Publication date: March 28, 2019Inventors: HUANG-KAI SHEN, SHENG-MING HUANG, JEN-KUEI LU, CHIH-CHIANG CHEN, HUI-KU CHANG, TSAI-SHENG LO, CHIA-HSIN CHUNG, WEI-CHI WANG, SHENG-KAI LIN, MING-JUI WANG
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Publication number: 20190079394Abstract: An imprint mold and a method for manufacturing the same are provided. The imprint mold includes a plurality of substantially identical or different mold patterns, wherein there isn't any height difference between the mold patterns.Type: ApplicationFiled: September 10, 2018Publication date: March 14, 2019Inventors: SHENG-MING HUANG, SHENG-KAI LIN, CHIH-CHIANG CHEN, HUI-KU CHANG, CHIA-HSIN CHUNG, WEI-CHI WANG, MING-JUI WANG, JEN-KUEI LU, TSAI-SHENG LO, HUANG-KAI SHEN