Patents by Inventor Chia-Hui Huang

Chia-Hui Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11151724
    Abstract: An automatic detecting method and an automatic detecting apparatus using the same are provided. The automatic detecting apparatus includes an inputting unit, a dividing unit, a contouring unit, a range analyzing unit, a boundary analyzing unit, an edge detecting unit, an expanding unit and an overlapping unit. The dividing unit is used for dividing an overlooking image into four clusters via a clustering algorithm. The contouring unit is used for obtaining a contour. The range analyzing unit is used for obtaining a detecting range. The boundary analyzing unit is used for obtaining a circular boundary in the detecting range. The edge detecting unit is used for obtaining a plurality of edges in the circular boundary. The expanding unit is used for expanding the edges to obtain a plurality of expanded edges. The overlapping unit is used for overlapping the expanded edges and the contour to obtain a defect pattern.
    Type: Grant
    Filed: June 3, 2019
    Date of Patent: October 19, 2021
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Tzu-Ping Kao, Ching-Hsing Hsieh, Chia-Chi Chang, Ju-Te Chen, Chen-Hui Huang, Cheng-Hsien Chen
  • Patent number: 11152262
    Abstract: A method includes etching a gate structure to form a trench extending into the gate structure, wherein sidewalls of the trench comprise a metal oxide material, applying a sidewall treatment process to the sidewalls of the trench, wherein the metal oxide material has been removed as a result of applying the sidewall treatment process and filling the trench with a first dielectric material to form a dielectric region, wherein the dielectric region is in contact with the sidewall of the gate structure.
    Type: Grant
    Filed: November 12, 2019
    Date of Patent: October 19, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chun-Yi Lee, Ting-Gang Chen, Chieh-Ping Wang, Hong-Hsien Ke, Chia-Hui Lin, Tai-Chun Huang
  • Publication number: 20210272941
    Abstract: A package structure including a first redistribution layer, a semiconductor die, through insulator vias, an insulating encapsulant and a second redistribution layer. The first redistribution layer includes a dielectric layer, a conductive layer, and connecting portions electrically connected to the conductive layer. The dielectric layer has first and second surfaces, the connecting portions has a first side, a second side, and sidewalls joining the first side to the second side. The first side of the connecting portions is exposed from and coplanar with the first surface of the dielectric layer. The semiconductor die is disposed on the second surface of the dielectric layer. The through insulator vias are connected to the conductive layer. The insulating encapsulant is disposed on the dielectric layer and encapsulating the semiconductor die and the through insulator vias. The second redistribution layer is disposed on the semiconductor die and over the insulating encapsulant.
    Type: Application
    Filed: May 17, 2021
    Publication date: September 2, 2021
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chih-Hsuan Tai, Hao-Yi Tsai, Yu-Chih Huang, Chia-Hung Liu, Ting-Ting Kuo, Ban-Li Wu, Ying-Cheng Tseng, Chi-Hui Lai
  • Publication number: 20210217866
    Abstract: A non-volatile memory device includes a substrate. A plurality of shallow trench isolation (STI) lines are disposed on the substrate and extend along a first direction. A memory gate structure is disposed on the substrate between adjacent two of the plurality of STI lines. A trench line is disposed in the substrate and extends along a second direction intersecting the first direction, wherein the trench line also crosses top portions of the plurality of STI lines. A conductive line is disposed in the trench line and used as a selection line to be coupled to the memory gate structure.
    Type: Application
    Filed: February 18, 2020
    Publication date: July 15, 2021
    Applicant: United Microelectronics Corp.
    Inventors: Chia-Wen Wang, Chien-Hung Chen, Chia-Hui Huang, Jen Yang Hsueh, Ling Hsiu Chou, Chih-Yang Hsu
  • Patent number: 10668698
    Abstract: Disclosed is an assembly manufacturing method comprising: cutting a prepreg into a prepreg sheet according to a first parameter; moving the prepreg sheet to an assembly arrangement area according to a second parameter; superimposing a metal foil and a plate according to a fourth parameter to form a copper foil set; and assembling the copper foil set and the prepreg sheet according to a third parameter to form an assembly.
    Type: Grant
    Filed: October 22, 2019
    Date of Patent: June 2, 2020
    Assignee: ELITE MATERIAL CO., LTD.
    Inventors: Chia-Hui Huang, Hsing-Lung Li
  • Publication number: 20200047463
    Abstract: Disclosed is an assembly manufacturing method comprising: cutting a prepreg into a prepreg sheet according to a first parameter; moving the prepreg sheet to an assembly arrangement area according to a second parameter; superimposing a metal foil and a plate according to a fourth parameter to form a copper foil set; and assembling the copper foil set and the prepreg sheet according to a third parameter to form an assembly.
    Type: Application
    Filed: October 22, 2019
    Publication date: February 13, 2020
    Inventors: Chia-Hui HUANG, Hsing-Lung LI
  • Patent number: 10493727
    Abstract: Disclosed is an assembly arrangement system, comprising a feeding unit, a conveyor unit and an assembling unit. The feeding unit comprises a supplying part and a cutting part. The supplying part is provided with a prepreg and configured to supply the prepreg to the cutting part. The cutting part cuts the prepreg to continuously form one or more prepreg sheets. The conveyor unit receives and conveys the prepreg sheet. The assembling unit comprises a metal foil supplying part, a first assembling part and a second assembling part. The second assembling part assembles a plate and a metal foil from the metal foil supplying part with the prepreg sheet from the conveyor unit into an assembly, and the first assembling part bears the assembly. Also provided is an assembly manufacturing method.
    Type: Grant
    Filed: July 7, 2017
    Date of Patent: December 3, 2019
    Assignee: ELITE MATERIAL CO., LTD.
    Inventors: Chia-Hui Huang, Hsing-Lung Li
  • Patent number: 10340282
    Abstract: A semiconductor memory device includes a substrate, having a plurality of cell regions, wherein the cell regions are parallel and extending along a first direction. A plurality of STI structures is disposed in the substrate, extending along the first direction to isolate the cell regions, wherein the STI structures have a uniform height lower than the substrate in the cell regions. A selection gate line is extending along a second direction and crossing over the cell regions and the STI structures. A control gate line is adjacent to the selection gate line in parallel extending along the second direction and also crosses over the cell regions and the STI structures. The selection gate line and the control gate line together form a two-transistor (2T) memory cell.
    Type: Grant
    Filed: February 13, 2018
    Date of Patent: July 2, 2019
    Assignee: United Microelectronics Corp.
    Inventors: Shu-Hung Yu, Chun-Hung Cheng, Chuan-Fu Wang, An-Hsiu Cheng, Ping-Chia Shih, Chi-Cheng Huang, Kuo-Lung Li, Chia-Hui Huang, Chih-Yao Wang, Zi-Jun Liu, Chih-Hao Pan
  • Publication number: 20180170011
    Abstract: Disclosed is an assembly arrangement system, comprising a feeding unit, a conveyor unit and an assembling unit. The feeding unit comprises a supplying part and a cutting part. The supplying part is provided with a prepreg and configured to supply the prepreg to the cutting part. The cutting part cuts the prepreg to continuously form one or more prepreg sheets. The conveyor unit receives and conveys the prepreg sheet. The assembling unit comprises a metal foil supplying part, a first assembling part and a second assembling part. The second assembling part assembles a plate and a metal foil from the metal foil supplying part with the prepreg sheet from the conveyor unit into an assembly, and the first assembling part bears the assembly. Also provided is an assembly manufacturing method.
    Type: Application
    Filed: July 7, 2017
    Publication date: June 21, 2018
    Inventors: Chia-Hui HUANG, Hsing-Lung LI
  • Patent number: 8941202
    Abstract: A method for forming an image sensor device is provided. First, a lens is provided and a first sacrificial element is formed thereon. An electromagnetic interference layer is formed on the lens and the first sacrificial element, and the first sacrificial element and electromagnetic interference layer thereon are removed to form an electromagnetic interference pattern having an opening exposing a selected portion of the lens. A second sacrificial element is formed in the opening to cover a center region of the selected portion of the lens. A peripheral region of the selected portion of the lens remains exposed. A light-shielding layer is formed on the electromagnetic interference pattern, second sacrificial element, and peripheral region of the selected portion of the lens. The second sacrificial element and light-shielding pattern are removed to expose the center region of the selected portion of the lens as a light transmitting region.
    Type: Grant
    Filed: September 5, 2013
    Date of Patent: January 27, 2015
    Assignees: OmniVision Technologies, Inc., VisEra Technologies Company Limited
    Inventors: Ming-Kai Liu, Tzu-Wei Huang, Jui-Hung Chang, Chia-Hui Huang, Teng-Sheng Chen
  • Publication number: 20140001590
    Abstract: A method for forming an image sensor device is provided. First, a lens is provided and a first sacrificial element is formed thereon. An electromagnetic interference layer is formed on the lens and the first sacrificial element, and the first sacrificial element and electromagnetic interference layer thereon are removed to form an electromagnetic interference pattern having an opening exposing a selected portion of the lens. A second sacrificial element is formed in the opening to cover a center region of the selected portion of the lens. A peripheral region of the selected portion of the lens remains exposed. A light-shielding layer is formed on the electromagnetic interference pattern, second sacrificial element, and peripheral region of the selected portion of the lens. The second sacrificial element and light-shielding pattern are removed to expose the center region of the selected portion of the lens as a light transmitting region.
    Type: Application
    Filed: September 5, 2013
    Publication date: January 2, 2014
    Applicants: Omnivision Technologies, Inc., VisEra Technologies Company Limited
    Inventors: Ming-Kai LIU, Tzu-Wei HUANG, Jui-Hung CHANG, Chia-Hui HUANG, Teng-Sheng CHEN
  • Patent number: 8557626
    Abstract: Disclosed is a method for forming an image sensor device. First, a lens is provided, and a first sacrificial element is then formed on the lens. Subsequently, an electromagnetic interference layer is formed on the lens and the first sacrificial element, and the first sacrificial element and the electromagnetic interference layer thereon are removed to form an electromagnetic interference pattern having an opening exposing a selected portion of the lens. A second sacrificial element is formed in the opening to cover a center region of the selected portion of the lens, while a peripheral region of the selected portion of the lens remains exposed. Next, a light-shielding layer is formed on the electromagnetic interference pattern, the second sacrificial element, and the peripheral region of the selected portion of the lens. Thereafter, the second sacrificial element and the light-shielding pattern thereon are removed to expose the center region of the selected portion of the lens as a light transmitting region.
    Type: Grant
    Filed: June 4, 2010
    Date of Patent: October 15, 2013
    Assignees: Omnivision Technologies, Inc., VisEra Technologies Company Limited
    Inventors: Ming-Kai Liu, Tzu-Wei Huang, Jui-Hung Chang, Chia-Hui Huang, Teng-Sheng Chen
  • Patent number: 8251601
    Abstract: The invention provides a camera module and a method for fabricating the same. A camera module includes an image sensor device chip having a plurality of solder balls on a bottom surface thereof. An optical lens is disposed on the image sensor device chip. A metal plate has a part that extending over the bottom surface of the image sensor device. A metal coating layer surrounds vertical surfaces of the optical lens and a top surface of the part of the metal plate. A first light shielding layer covers vertical surfaces of the metal coating layer.
    Type: Grant
    Filed: December 21, 2010
    Date of Patent: August 28, 2012
    Assignees: VisEra Technologies Company Limited, OmniVision Technologies, Inc.
    Inventors: Tzu-Wei Huang, Wei-Ping Chen, Jui-Hung Chang, Chia-Hui Huang, Teng-Sheng Chen
  • Publication number: 20120155854
    Abstract: The invention provides a camera module and a method for fabricating the same. A camera module includes an image sensor device chip having a plurality of solder balls on a bottom surface thereof. An optical lens is disposed on the image sensor device chip. A metal plate has a part that extending over the bottom surface of the image sensor device. A metal coating layer surrounds vertical surfaces of the optical lens and a top surface of the part of the metal plate. A first light shielding layer covers vertical surfaces of the metal coating layer.
    Type: Application
    Filed: December 21, 2010
    Publication date: June 21, 2012
    Inventors: Tzu-Wei HUANG, Wei-Ping Chen, Jui-Hung Chang, Chia-Hui Huang, Teng-Sheng Chen
  • Publication number: 20110298073
    Abstract: Disclosed is a method for forming an image sensor device. First, a lens is provided, and a first sacrificial element is then formed on the lens. Subsequently, an electromagnetic interference layer is formed on the lens and the first sacrificial element, and the first sacrificial element and the electromagnetic interference layer thereon are removed to form an electromagnetic interference pattern having an opening exposing a selected portion of the lens. A second sacrificial element is formed in the opening to cover a center region of the selected portion of the lens, while a peripheral region of the selected portion of the lens remains exposed. Next, a light-shielding layer is formed on the electromagnetic interference pattern, the second sacrificial element, and the peripheral region of the selected portion of the lens. Thereafter, the second sacrificial element and the light-shielding pattern thereon are removed to expose the center region of the selected portion of the lens as a light transmitting region.
    Type: Application
    Filed: June 4, 2010
    Publication date: December 8, 2011
    Inventors: Ming-Kai Liu, Tzu-Wei Huang, Jui-Hung Chang, Chia-Hui Huang, Teng-Sheng Chen
  • Patent number: 5484837
    Abstract: A black masterbatch for polyester polymer consisting of:(a) 25-99.7% of polyester polymer by weight;(b) 0.1-20% of dispersive second polyester by weight and/or 0.1-15% EVA by weight; and(c) 0.1-40% of carbon black by weight;whereby the black masterbatch can be easily manufactured by a simple process without polluting the environment.
    Type: Grant
    Filed: October 25, 1994
    Date of Patent: January 16, 1996
    Assignee: Far Eastern Textile, Ltd.
    Inventors: Hsiang-Peng Kung, Yao-Tsung Chang, Cherng-Jyh Lee, Rong-Shiun Pan, Chia-Hui Huang