Abstract: A method of forming a semiconductor-on-insulator (SOI) substrate includes: forming a first dielectric layer on a first substrate; forming a buffer layer on a second substrate; forming a semiconductor cap on the buffer layer over the second substrate; forming a cleavage plane in the buffer layer; forming a second dielectric layer on the semiconductor cap after forming the cleavage plane; bonding the second dielectric layer on the second substrate to the first dielectric layer on the first substrate; performing a splitting process along the cleavage plane in the buffer layer; removing a first split buffer layer from the semiconductor cap; and removing a second split buffer layer from the second substrate.

Abstract: A semiconductor-on-insulator (SOI) structure and a method for forming the SOI structure. The method includes forming a first dielectric layer on a first semiconductor layer. A second semiconductor layer is formed over an etch stop layer. A cleaning solution is provided to a first surface of the first dielectric layer. The first dielectric layer is bonded under the second semiconductor layer in an environment having a substantially low pressure. An index guiding layer may be formed over the second semiconductor layer. A third semiconductor layer is formed over the second semiconductor layer. A distance between a top of the third semiconductor layer and a bottom of the second semiconductor layer varies between a maximum distance and a minimum distance. A planarization process is performed on the third semiconductor layer to reduce the maximum distance.

Abstract: A semiconductor structure includes a first gate structure, a second gate structure coupled to the first gate structure, a source region, a first drain region, and a second drain region. The source region is surrounded by the first gate structure and the second gate structure. The first drain region is separated from the source region by the first gate structure. The second drain region is separated from the source region by the second gat structure. A shape of the first drain region and a shape of the second drain region are different from each other from a plan view.

Abstract: In some implementations, one or more semiconductor processing tools may form a metal cap on a metal gate. The one or more semiconductor processing tools may form one or more dielectric layers on the metal cap. The one or more semiconductor processing tools may form a recess to the metal cap within the one or more dielectric layers. The one or more semiconductor processing tools may perform a bottom-up deposition of metal material on the metal cap to form a metal plug within the recess and directly on the metal cap.

Abstract: The present invention relates to a method of treating moderate or severe symptoms of COVID-19 using a plant composition. The plant composition comprises Prepared Monkshood Daughter Root (Aconitum carmichaelii), Fragrant Solomonseal Rhizome (Polygonatum odoratum), Indian Bread (Poria cocos), Pinellia tuber (Pinellia ternata), Oriental Wormwood Herb (Artemisia scoparia), Scutellaria Root (Scutellaria baicalensis), Mongolian Snakegourd Fruit (Trichosanthes kirilowii), Magnolia Bark (Magnolia officinalis), Heartleaf Houttuynia Herb (Houttuynia cordata), and Baked Licorice Root and Rhizome (Glycyrrhiza glabra), which is used as a traditional Chinese medicine composition.

Abstract: A chip package structure includes a flexible substrate, a patterned circuit layer, a fingerprint sensor chip, a plurality of bumps, a patterned dielectric layer and an encapsulant layer. The patterned circuit layer disposed on the flexible substrate includes a fingerprint sensing circuit and a plurality of terminals. The fingerprint sensor chip disposed on the flexible substrate is electrically connected to the fingerprint sensing circuit and includes an active surface, a back surface, and a plurality of bonding pads disposed on the active surface. The bumps disposed between the fingerprint sensor chip and the patterned circuit layer electrically connect the bonding pads and the terminals. The patterned dielectric layer including a first surface and a second surface having a fingerprint sensing region at least covers the fingerprint sensing circuit with the first surface. The encapsulant layer is filled between the flexible substrate and the fingerprint sensor chip and covers the bumps.

Abstract: A chip package including a flexible substrate, a plurality of conductive plugs, a wiring layer, and a chip is provided. The flexible substrate has a first surface and a second surface opposite to the first surface. The conductive plugs pass through the flexible substrate. The wiring layer is located on the first surface and has a plurality of inner leads electrically connected to the conductive plugs respectively. The chip has an active surface and a plurality of bumps on the active surface, wherein the chip is disposed on the second surface of the flexible substrate and connected with the conductive plugs by the bumps. As bumps on the chip are electrically connected to the conductive plugs by hot pressing, the chip is quickly and reliably electrically connected to the inner leads.