Patents by Inventor Chia-Jung Liou

Chia-Jung Liou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for establishing scattering bar rule
    Patent number: 8103978
    Abstract: A method for establishing a scattering bar rule for a mask pattern for fabricating a device is provided. The method is described as follows. First, at least one image simulation model is established according to the mask pattern and a process reference set used for fabricating the device based on the mask pattern. Next, a plurality of scattering bar reference sets is applied to the image simulation model so as to generate a plurality of simulation images, respectively. Further, a portion of the simulation images are selected to be a plurality of candidate layouts according to a screening criterion. Next, one of the candidate layouts is determined to be a pattern layout according to a selection rule, and the scattering bar reference set corresponding to the pattern layout is determined to be a scattering bar rule of the mask pattern.
    Type: Grant
    Filed: August 26, 2008
    Date of Patent: January 24, 2012
    Assignee: ProMOS Technologies Inc.
    Inventors: Chun-Yu Lin, Chia-Jung Liou, Cheng-Hung Ku, Feng-Yuan Chiu, Chun-Kuang Lin, Chih-Chiang Huang
  • METHOD FOR ESTABLISHING SCATTERING BAR RULE
    Publication number: 20090276750
    Abstract: A method for establishing a scattering bar rule for a mask pattern for fabricating a device is provided. The method is described as follows. First, at least one image simulation model is established according to the mask pattern and a process reference set used for fabricating the device based on the mask pattern. Next, a plurality of scattering bar reference sets is applied to the image simulation model so as to generate a plurality of simulation images, respectively. Further, a portion of the simulation images are selected to be a plurality of candidate layouts according to a screening criterion. Next, one of the candidate layouts is determined to be a pattern layout according to a selection rule, and the scattering bar reference set corresponding to the pattern layout is determined to be a scattering bar rule of the mask pattern.
    Type: Application
    Filed: August 26, 2008
    Publication date: November 5, 2009
    Applicant: PROMOS TECHNOLOGIES INC.
    Inventors: Chun-Yu Lin, Chia-Jung Liou, Cheng-Hung Ku, Feng-Yuan Chiu, Chun-Kuang Lin, Chih-Chiang Huang