Patents by Inventor Chia-Kuei Hsu

Chia-Kuei Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220037243
    Abstract: A package structure and a method of forming the same are provided. The package structure includes an integrated circuit die and a redistribution structure bonded to the integrated circuit die. The redistribution structure includes a first insulating layer, a second insulating layer interposed between the first insulating layer and the integrated circuit die, and a first metallization pattern in the first insulating layer and the second insulating layer. The first metallization pattern includes a first conductive line and a first conductive via coupled to the first conductive line. The first conductive line is in the second insulating layer. The first conductive via is in the first insulating layer. The first conductive line includes a first conductive pad coupled to the first conductive via, a second conductive pad, and a curved portion connecting the first conductive pad to the second conductive pad.
    Type: Application
    Filed: December 18, 2020
    Publication date: February 3, 2022
    Inventors: Shu-Shen Yeh, Che-Chia Yang, Chin-Hua Wang, Chia-Kuei Hsu, Po-Yao Lin, Shin-Puu Jeng
  • Publication number: 20220020693
    Abstract: A method includes forming a first dielectric layer, forming a first redistribution line including a first via extending into the first dielectric layer, and a first trace over the first dielectric layer, forming a second dielectric layer covering the first redistribution line, and patterning the second dielectric layer to form a via opening. The first redistribution line is revealed through the via opening. The method further includes depositing a conductive material into the via opening to form a second via in the second dielectric layer, and a conductive pad over and contacting the second via, and forming a conductive bump over the conductive pad. The conductive pad is larger than the conductive bump, and the second via is offset from a center line of the conductive bump.
    Type: Application
    Filed: December 18, 2020
    Publication date: January 20, 2022
    Inventors: Shu-Shen Yeh, Che-Chia Yang, Chia-Kuei Hsu, Po-Yao Lin, Shin-Puu Jeng, Chia-Hsiang Lin
  • Patent number: 11164754
    Abstract: Embodiments include forming an interposer having reinforcing structures disposed in a core layer of the interposer. The interposer may be attached to a package device by electrical connectors. The reinforcing structures provide rigidity and thermal dissipation for the package device. Some embodiments may include an interposer with an opening in an upper core layer of the interposer to a recessed bond pad. Some embodiments may also use connectors between the interposer and the package device where a solder material connected to the interposer surrounds a metal pillar connected to the package device.
    Type: Grant
    Filed: April 1, 2019
    Date of Patent: November 2, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Po-Hao Tsai, Ming-Chih Yew, Chia-Kuei Hsu, Shin-Puu Jeng, Po-Yao Chuang, Meng-Liang Lin, Shih-Ting Hung, Po-Yao Lin
  • Publication number: 20210335753
    Abstract: An embodiment is package structure including a first integrated circuit die, a redistribution structure bonded to the first integrated circuit die, the redistribution structure including a first metallization pattern in a first dielectric layer, the first metallization pattern including a plurality of first conductive features, each of the first conductive features including a first conductive via in the first dielectric layer and first conductive line over the first dielectric layer and electrically coupled to the respective first conductive via, each of the first conductive lines comprising a curve in a plan view, a second dielectric layer over the first dielectric layer and the first metallization pattern, and a second metallization pattern in the second dielectric layer, the second metallization pattern including a plurality of second conductive via in the second dielectric layer, each of the second conductive vias being over and electrically coupled to a respective first conductive line.
    Type: Application
    Filed: September 22, 2020
    Publication date: October 28, 2021
    Inventors: Chia-Kuei Hsu, Ming-Chih Yew, Shu-Shen Yeh, Che-Chia Yang, Po-Yao Lin, Shin-Puu Jeng
  • Publication number: 20210296220
    Abstract: A method includes forming a redistribution structure, which formation process includes forming a plurality of dielectric layers over a carrier, forming a plurality of redistribution lines extending into the plurality of dielectric layers, and forming a reinforcing patch over the carrier. The method further includes bonding a package component to the redistribution structure, with the package component having a peripheral region overlapping a portion of the reinforcing patch. And de-bonding the redistribution structure and the first package component from the carrier.
    Type: Application
    Filed: March 19, 2020
    Publication date: September 23, 2021
    Inventors: Chia-Kuei Hsu, Ming-Chih Yew, Po-Yao Lin, Shuo-Mao Chen, Feng-Cheng Hsu, Shin-Puu Jeng
  • Publication number: 20210082847
    Abstract: A redistribution structure includes a first dielectric layer, a pad pattern, and a second dielectric layer. The pad pattern is disposed on the first dielectric layer and includes a pad portion and a peripheral portion. The pad portion is embedded in the first dielectric layer, wherein a lower surface of the pad portion is substantially coplanar with a lower surface of the first dielectric layer. The peripheral portion surrounds the pad portion. The second dielectric layer is disposed on the pad pattern and includes a plurality of extending portions extending through the peripheral portion.
    Type: Application
    Filed: November 29, 2020
    Publication date: March 18, 2021
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Kuei Hsu, Ming-Chih Yew, Po-Hao Tsai, Po-Yao Lin, Shin-Puu Jeng
  • Patent number: 10854563
    Abstract: A redistribution structure includes a first dielectric layer, a pad pattern, and a second dielectric layer. The pad pattern is disposed on the first dielectric layer and includes a pad portion and a peripheral portion. The pad portion is embedded in the first dielectric layer, wherein a lower surface of the pad portion is substantially coplanar with a lower surface of the first dielectric layer. The peripheral portion surrounds the pad portion. The second dielectric layer is disposed on the pad pattern and includes a plurality of extending portions extending through the peripheral portion.
    Type: Grant
    Filed: May 21, 2020
    Date of Patent: December 1, 2020
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Kuei Hsu, Ming-Chih Yew, Po-Hao Tsai, Po-Yao Lin, Shin-Puu Jeng
  • Publication number: 20200286843
    Abstract: A redistribution structure includes a first dielectric layer, a pad pattern, and a second dielectric layer. The pad pattern is disposed on the first dielectric layer and includes a pad portion and a peripheral portion. The pad portion is embedded in the first dielectric layer, wherein a lower surface of the pad portion is substantially coplanar with a lower surface of the first dielectric layer. The peripheral portion surrounds the pad portion. The second dielectric layer is disposed on the pad pattern and includes a plurality of extending portions extending through the peripheral portion.
    Type: Application
    Filed: May 21, 2020
    Publication date: September 10, 2020
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chia-Kuei Hsu, Ming-Chih Yew, Po-Hao Tsai, Po-Yao Lin, Shin-Puu Jeng
  • Patent number: 10665559
    Abstract: A redistribution structure includes a first dielectric layer, a pad pattern, and a second dielectric layer. The pad pattern is disposed on the first dielectric layer and includes a pad portion and a peripheral portion. The pad portion is embedded in the first dielectric layer, wherein a lower surface of the pad portion is substantially coplanar with a lower surface of the first dielectric layer. The peripheral portion surrounds the pad portion. The second dielectric layer is disposed on the pad pattern and includes a plurality of extending portions extending through the peripheral portion.
    Type: Grant
    Filed: September 12, 2018
    Date of Patent: May 26, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chia-Kuei Hsu, Ming-Chih Yew, Po-Hao Tsai, Po-Yao Lin, Shin-Puu Jeng
  • Publication number: 20200105544
    Abstract: Embodiments include forming an interposer having reinforcing structures disposed in a core layer of the interposer. The interposer may be attached to a package device by electrical connectors. The reinforcing structures provide rigidity and thermal dissipation for the package device. Some embodiments may include an interposer with an opening in an upper core layer of the interposer to a recessed bond pad. Some embodiments may also use connectors between the interposer and the package device where a solder material connected to the interposer surrounds a metal pillar connected to the package device.
    Type: Application
    Filed: April 1, 2019
    Publication date: April 2, 2020
    Inventors: Po-Hao Tsai, Ming-Chih Yew, Chia-Kuei Hsu, Shin-Puu Jeng, Po-Yao Chuang, Meng-Liang Lin, Shih-Ting Hung, Po-Yao Lin
  • Patent number: 10601427
    Abstract: A clock generating device includes a divisor register, a reference clock generator, a first counter, a second counter, and a delay regulator circuit. The divisor register provides a divisor. The reference clock generator outputs a reference clock signal. The first counter counts a first number of cycles of the reference clock signal and generates a first count. The first counter outputs a first clock signal according to the first count and the divisor. The second counter counts a second number of cycles of the first clock signal and generates a second count. The second counter outputs a second clock signal according to the second count and a coefficient. The delay regulator circuit determines whether to control the first counter to delay outputting the first clock signal according to the first clock signal.
    Type: Grant
    Filed: July 11, 2019
    Date of Patent: March 24, 2020
    Assignee: REALTEK SEMICONDUCTOR CORPORATION
    Inventors: Chia-Kuei Hsu, Ming-Kai Chuang, Mei-Chuan Lu
  • Publication number: 20190319002
    Abstract: A redistribution structure includes a first dielectric layer, a pad pattern, and a second dielectric layer. The pad pattern is disposed on the first dielectric layer and includes a pad portion and a peripheral portion. The pad portion is embedded in the first dielectric layer, wherein a lower surface of the pad portion is substantially coplanar with a lower surface of the first dielectric layer. The peripheral portion surrounds the pad portion. The second dielectric layer is disposed on the pad pattern and includes a plurality of extending portions extending through the peripheral portion.
    Type: Application
    Filed: September 12, 2018
    Publication date: October 17, 2019
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chia-Kuei Hsu, Ming-Chih Yew, Po-Hao Tsai, Po-Yao Lin, Shin-Puu Jeng