Abstract: A method for generating and outputting a message is implemented using an electronic device the stores a computer program product and a text database. The text database includes a main message template, a template text that includes a placeholder, and a word group that includes a plurality of preset words for replacing the placeholder. The method includes: in response to receipt of a command for execution of the computer program product, displaying an editing interface including the main message template; in response to receipt of user operation of a selection of the main message template, displaying the template text; in response to receipt of user operation of a selection of one of the preset words via the user interface, generating an edited text by replacing the placeholder with the one of the preset words in the template text; and outputting the edited text as a message.

Abstract: The present invention discloses a wound dressing which may be a double-layer wound dressing, comprising a polymer material layer in combination with anti-infective antibiotics or anti-infective Chinese herb medicine at the upper layer of the wound dressing, and a porous carbon material layer capable of loading with skin-associated epithelial cells at the lower layer of the wound dressing. The wound dressing with the antibiotics can block effectively the invasion of bacteria in the external environment, thereby preventing the wound from secondary infection. While covering the wound site, the porous carbon material layer with the epithelial cells can thus provide the healthy epithelial cells and attract the surrounding healthy cells to aggregate for secreting collagen so as to promote the wound healing process. According to the present invention, there is an obviously enhancing effect on wound tissue regeneration, restoration and healing, and there is a grant development potential in clinical applications.

Abstract: A rinsing lid for a wet bench cleaning chamber used in the rinsing of acids, chemicals and/or particles from semiconductor wafers. The rinsing lid includes a lid housing having an upper water reservoir for receiving a stream of deionized water or other cleaning liquid. A water distribution plate is provided in the lid housing beneath the water reservoir. Small water openings extend through the water distribution plate at the water inlet end, and large water openings extend through the water distribution plate at the opposite end, of the lid housing. A nozzle plate provides multiple nozzle openings in the lid housing beneath the water distribution plate. The large water openings at the end of the lid housing opposite the water inlet end compensate for diminishing water pressure along the length of the lid housing, providing water sprays of uniform force and volume.

Abstract: A rinsing lid for a wet bench cleaning chamber used in the rinsing of acids, chemicals and/or particles from semiconductor wafers. The rinsing lid includes a lid housing having an upper water reservoir for receiving a stream of deionized water or other cleaning liquid. A water distribution plate is provided in the lid housing beneath the water reservoir. Small water openings extend through the water distribution plate at the water inlet end, and large water openings extend through the water distribution plate at the opposite end, of the lid housing. A nozzle plate provides multiple nozzle openings in the lid housing beneath the water distribution plate. The large water openings at the end of the lid housing opposite the water inlet end compensate for diminishing water pressure along the length of the lid housing, providing water sprays of uniform force and volume.

Abstract: A sleeve means is described. The sleeve means comprises a round plane and ring-shaped side adjacent to the round plane. The round plane has a central hole and six periphery holes thereon. The central hole and six peripheral holes respectively correspond to a central opening and six screw holes of a heater adapter flange used in Gasonics L3510 (trademark) etcher. The sleeve means could be jacketed onto the heater adapter flange for dispersing the stress on and reducing deformation of the heater adapter flange when the heater adapter flange is mounted on the chamber of the etcher.

Abstract: The present invention discloses a piping system for etch equipment including an exhaust gas tube connected with an etching chamber for conveying exhaust gas out of the chamber. A cooling gas tube connected to the etching chamber allows cooling gas to flow around a back side of the wafer placed in the chamber for cooling the wafer's temperature. A cooling gas bypass tube connected between the cooling gas tube and the exhaust gas tube is used for regulating a gas flow in the cooling gas tube. Moreover, a plurality of heaters are set out of conjunctions of the cooling gas tube and cooling gas bypass tube with the exhaust gas tube so as to retard particle accumulation in the conjunctions of these tubes.