Abstract: A method of making a ROM structure includes the operations of forming an active area having a channel, a source region, and a drain region; depositing a gate electrode over the channel; depositing a conductive line over at least one of the source region and the drain region; adding dopants to the source region and the drain region of the active area; forming contacts to the gate electrode, the source region, and the drain; depositing a power rail, a bit line, and at least one word line of the integrated circuit against the contacts; and dividing the active area with a trench isolation structure to electrically isolate the gate electrode from the source region and the drain region.

Abstract: A method for manufacturing a semiconductor structure includes forming a plurality of dummy structures spaced apart from each other, forming a plurality of dielectric spacers laterally covering the dummy structures to form a plurality of trenches defined by the dielectric spacers, filling a conductive material into the trenches to form electrically conductive features, selectively depositing a capping material on the electrically conductive features to form a capping layer, removing the dummy structures to form a plurality of recesses defined by the dielectric spacers, filling a sacrificial material into the recesses so as to form sacrificial features, depositing a sustaining layer on the sacrificial features, and removing the sacrificial features to form air gaps confined by the sustaining layer and the dielectric spacers.

Abstract: An image capture method for flash photography includes: capturing at least one first image while a strobe device is operating under a first strobe intensity setting for emitting main flash, capturing at least one second image while the strobe device is operating under a second strobe intensity setting different from the first strobe intensity setting, and generating an output image by blending the at least one first image and the at least one second image.

Abstract: The invention discloses a stereo enhancement system and a stereo enhancement method. The stereo enhancement system includes a beamforming unit and a signal processing unit. The beamforming unit is used for receiving a plurality of input sound signals and generating a plurality of beamforming sound signals corresponding to a plurality of direction intervals respectively. The signal processing unit is coupled to the beamforming unit and used for receiving the plurality of beamforming sound signals corresponding to the plurality of direction intervals respectively and generating a first synthesized output sound signal and a second synthesized sound signal accordingly.

Abstract: An image capture method for flash photography includes: capturing at least one first image while a strobe device is operating under a first strobe intensity setting for emitting main flash, capturing at least one second image while the strobe device is operating under a second strobe intensity setting different from the first strobe intensity setting, and generating an output image by blending the at least one first image and the at least one second image.

Abstract: A method and apparatus for texture image compression in a 3D video coding system are disclosed. Embodiments according to the present invention derive depth information related to a depth map associated with a texture image and then process the texture image based on the depth information derived. The invention can be applied to the encoder side as well as the decoder side. The encoding order or decoding order for the depth maps and the texture images can be based on block-wise interleaving or picture-wise interleaving. One aspect of the present invent is related to partitioning of the texture image based on depth information of the depth map. Another aspect of the present invention is related to motion vector or motion vector predictor processing based on the depth information.

Abstract: An exemplary method for determining a control output in a control domain includes: obtaining a control input of an input domain, wherein the control input includes a previous input value and a current input value; and dynamically adjusting a control resolution setting, and converting the control input of the input domain into the control output in the control domain according to the control resolution setting, wherein the control output includes a previous output value and a current output value corresponding to the previous input value and the current input value, respectively, the control resolution setting for the current input value is determined according to at least the previous input value, and the current output value is identical to the previous output value when the current input value and the previous input value are generated in response to a same user input.

Abstract: The invention provides an input-output calibration method performed by a processing unit connected to an output device and an input device. The output and the input device correspond to an output and an input device coordinate systems, respectively. The processing unit uses the input device to derive a plurality of lines in the input device coordinate system for M calibration points by sensing a viewer specifying the M calibration points' positions, the plurality of lines are between the M calibration points and the viewer's the predetermined object's different positions, M is a positive integer equal to or larger than three. The processing unit derives the M calibration points' coordinates in the input device coordinate system according to the plurality of lines and uses the M calibration points' coordinates in the output and the input device coordinate systems to derive the relationship between the output and the input device coordinate systems.

Abstract: A method for changing a setting of a mobile communication device is disclosed. The method includes receiving context information of the mobile communication device, changing the setting of the mobile communication device according to the context information and a user preference rule, and updating the user preference rule according to the context information and the changed setting.

Abstract: A method of performing optical proximity correction for preparing a mask projected onto a wafer by photolithography includes the following steps. An integrated circuit layout design including a first feature and a second feature is obtained, wherein the first feature overlaps a first boundary of two structures in the wafer. An edge of the first feature close to the second feature pertaining to a specific trend section of an experimental chart having trend sections is recognized. An optical proximity correction value is evaluated for the edge through a computer system according to a rule corresponding to the specific trend section. The layout design is compensated with the optical proximity correction value.

Abstract: One of the embodiments of the invention provides an input-output calibration method performed by a processing unit connected to an output device and an input device. The output device and the input device correspond to an output device coordinate system and an input device coordinate system, respectively. The processing unit first uses the input device to derive a plurality of lines in the input device coordinate system for M calibration points by sensing a viewer specifying the M calibration points' positions, wherein the plurality of lines are between the M calibration points and the viewer's the predetermined object's different positions, and M is a positive integer equal to or larger than three.

Abstract: A method of making a photomask layout is provided. A graphic data of a photomask is provided. The graphic data includes at least one rectangular pattern. A correction step is performed to the graphic data by using a computer. The correction step includes adding a substantially ring-shaped pattern inside the rectangular pattern. A method of forming a photomask by using the photomask layout obtained by the said method is also provided. In an embodiment, the photomask is suitable for defining micro-lenses of a solid-state image sensor.

Abstract: One of the embodiments of the invention provides an input-output calibration method performed by a processing unit connected to an output device and an input device. The output device and the input device correspond to an output device coordinate system and an input device coordinate system, respectively. The processing unit first derives M calibration points' coordinates in the input device coordinate system by using the input device to sense a viewer specifying the M calibration points' positions, wherein M is a positive integer. Then, the processing unit uses the M calibration points' coordinates in the output device coordinate system and coordinates in the input device coordinate system to derive the relationship between the output device coordinate system and the input device coordinate system.

Abstract: A method of performing optical proximity correction for preparing a mask projected onto a wafer by photolithography includes the following steps. An integrated circuit layout design including a first feature and a second feature is obtained, wherein the first feature overlaps a first boundary of two structures in the wafer. An edge of the first feature close to the second feature pertaining to a specific trend section of an experimental chart having trend sections is recognized. An optical proximity correction value is evaluated for the edge through a computer system according to a rule corresponding to the specific trend section. The layout design is compensated with the optical proximity correction value.

Abstract: A method of making a photomask layout is provided. A graphic data of a photomask is provided. The graphic data includes at least one rectangular pattern. A correction step is performed to the graphic data by using a computer. The correction step includes adding a substantially ring-shaped pattern inside the rectangular pattern. A method of forming a photomask by using the photomask layout obtained by the said method is also provided. In an embodiment, the photomask is suitable for defining micro-lenses of a solid-state image sensor.

Abstract: A method of performing optical proximity correction for preparing a mask projected onto a wafer by photolithography includes the following steps. An integrated circuit layout design comprising a first feature and a second feature is obtained, wherein the first feature overlaps a first boundary of two structures in the wafer. An edge of the first feature close to the second feature pertaining to a specific trend section of an experimental chart having trend sections is recognized. An optical proximity correction value is evaluated for the edge through a computer system by a rule corresponding to the specific trend section. The layout design is compensated with the optical proximity correction value.

Abstract: A method and apparatus for texture image compression in a 3D video coding system are disclosed. Embodiments according to the present invention derive depth information related to a depth map associated with a texture image and then process the texture image based on the depth information derived. The invention can be applied to the encoder side as well as the decoder side. The encoding order or decoding order for the depth maps and the texture images can be based on block-wise interleaving or picture-wise interleaving. One aspect of the present invent is related to partitioning of the texture image based on depth information of the depth map. Another aspect of the present invention is related to motion vector or motion vector predictor processing based on the depth information.

Abstract: A wireless communications device is provided with a first cache unit coupled to a memory unit, a wireless communications module, and a hybrid automatic repeat request (HARQ) combine component coupled to the first cache unit. The wireless communications module receives from a cellular network a wireless signal carrying first data corresponding to an HARQ process. The HARQ combine component reads second data corresponding to the HARQ process from the memory unit into the first cache unit, and combines the first data and the second data for an HARQ combining procedure.

Abstract: One of the embodiments of the invention provides an input-output calibration method performed by a processing unit connected to an output device and an input device. The output device and the input device correspond to an output device coordinate system and an input device coordinate system, respectively. The processing unit first derives M calibration points' coordinates in the input device coordinate system by using the input device to sense a viewer specifying the M calibration points' positions, wherein M is a positive integer. Then, the processing unit uses the M calibration points' coordinates in the output device coordinate system and coordinates in the input device coordinate system to derive the relationship between the output device coordinate system and the input device coordinate system.

Abstract: An exemplary method for determining a control output in a control domain includes: obtaining a control input of an input domain, wherein the control input includes a previous input value and a current input value; and dynamically adjusting a control resolution setting, and converting the control input of the input domain into the control output in the control domain according to the control resolution setting, wherein the control output includes a previous output value and a current output value corresponding to the previous input value and the current input value, respectively, the control resolution setting for the current input value is determined according to at least the previous input value, and the current output value is identical to the previous output value when the current input value and the previous input value are generated in response to a same user input.