Patents by Inventor Chia-Sui Hsu

Chia-Sui Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for photolithography in semiconductor manufacturing
    Patent number: 7601466
    Abstract: A method for photolithography in semiconductor manufacturing includes providing a mask with first and second focus planes for a wafer. The wafer includes corresponding first and second wafer regions. The first wafer region receives a first image during a first exposure utilizing the first focus plane. The second wafer region receives a second image during a second exposure utilizing the second focus plane.
    Type: Grant
    Filed: February 9, 2005
    Date of Patent: October 13, 2009
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yung-Sung Yen, Kuei Shun Chen, Chia-Sui Hsu, Yuh-Sen Chang, Hsiao-Tzu Lu
  • Marine algal extracts comprising marine algal polysaccharides of low degree polymerizaton, and the preparation processes and uses thereof
    Publication number: 20080226740
    Abstract: Disclosed herein are marine algal extracts containing marine algal polysaccharides of low degree polymerization, and nanoparticles fabricated from the extracts. Preparation processes and applications of the marine algal extracts and the nanoparticles are also disclosed.
    Type: Application
    Filed: September 12, 2007
    Publication date: September 18, 2008
    Applicant: NATIONAL TAIWAN OCEAN UNIVERSITY
    Inventors: Rong-Huei Chen, Szu-Kai Chen, Wei-Yu Chen, Szu-Hui Chen, Kun-Chi Huang, Chia-Sui Hsu, Yo-Ru Hsu, Shi-Wei Bai
  • System and method for photolithography in semiconductor manufacturing
    Publication number: 20060177778
    Abstract: A method for photolithography in semiconductor manufacturing includes providing a mask with first and second focus planes for a wafer. The wafer includes corresponding first and second wafer regions. The first wafer region receives a first image during a first exposure utilizing the first focus plane. The second wafer region receives a second image during a second exposure utilizing the second focus plane.
    Type: Application
    Filed: February 9, 2005
    Publication date: August 10, 2006
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yung-Sung Yen, Kuei Chen, Chia-Sui Hsu, Yuh-Sen Chang, Hsiao-Tzu Lu