Abstract: A method includes depositing a high-k gate dielectric layer over and along sidewalls of a semiconductor fin. The method further includes depositing an n-type work function metal layer over the high-k gate dielectric layer and performing a passivation treatment on the high-k gate dielectric layer through the n-type work function metal layer. The passivation treatment comprises a remote plasma process. The method further includes depositing a fill metal over the n-type work function metal layer to form a metal gate stack over the high-k gate dielectric layer. The metal gate stack comprising the n-type work function metal layer and the fill metal.

Abstract: A method includes depositing a high-k gate dielectric layer over and along sidewalls of a semiconductor fin. The method further includes depositing an n-type work function metal layer over the high-k gate dielectric layer and performing a passivation treatment on the high-k gate dielectric layer through the n-type work function metal layer. The passivation treatment comprises a remote plasma process. The method further includes depositing a fill metal over the n-type work function metal layer to form a metal gate stack over the high-k gate dielectric layer. The metal gate stack comprising the n-type work function metal layer and the fill metal.

Abstract: A memory storage device and a read/write method thereof, first defining logically the flash memory as at least one particular data management area and at least one common data management area; next, determining the logical block address located in the particular data management area or the common data management area according to data transmitted to an external system by an area decision mechanism, wherein the method of writing to the particular data management area is by using a method of dynamic deviation value, and the method of writing to the common data management area is by using a method of same displacement value. Whereby, the particular data management area can be avoided moving frequently caused by updating data from the external system to improve read/write performance of the flash memory.

Abstract: A memory storage device and a read/write method thereof, first defining logically the flash memory as at least one particular data management area and at least one common data management area; next, determining the logical block address located in the particular data management area or the common data management area according to data transmitted to an external system by an area decision mechanism, wherein the method of writing to the particular data management area is by using a method of dynamic deviation value, and the method of writing to the common data management area is by using a method of same displacement value. Whereby, the particular data management area can be avoided moving frequently caused by updating data from the external system to improve read/write performance of the flash memory.