Patents by Inventor Chia-Yi Chuang

Chia-Yi Chuang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10858736
    Abstract: An atomic layer deposition apparatus includes a chamber including a plurality of regions; and a heating device respectively providing specific temperature ranges for the plurality of regions. By flowing precursor gases at different flow rates in the different regions, thin films can be simultaneously formed in the different regions having different film thicknesses.
    Type: Grant
    Filed: December 6, 2016
    Date of Patent: December 8, 2020
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Yi Chuang, Hsing-Jui Lee, Ming-Te Chen
  • Publication number: 20170081761
    Abstract: An atomic layer deposition apparatus includes a chamber including a plurality of regions; and a heating device respectively providing specific temperature ranges for the plurality of regions. By flowing precursor gases at different flow rates in the different regions, thin films can be simultaneously formed in the different regions having different film thicknesses.
    Type: Application
    Filed: December 6, 2016
    Publication date: March 23, 2017
    Inventors: Chia-Yi Chuang, Hsing-Jui Lee, Ming-Te Chen
  • Patent number: 9512519
    Abstract: An atomic layer deposition apparatus includes a chamber including a plurality of regions; and a heating device respectively providing specific temperature ranges for the plurality of regions.
    Type: Grant
    Filed: December 3, 2012
    Date of Patent: December 6, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Yi Chuang, Hsing-Jui Lee, Ming-Te Chen
  • Patent number: 9209243
    Abstract: Embodiments of the disclosure include a shallow trench isolation (STI) structure and a method of forming the same. A trench is formed in a substrate. A silicon oxide and a silicon liner layer are formed on sidewalls and a bottom surface of the trench. A flowable silicon oxide material fills in the trench, is cured, and then is partially removed. Another silicon oxide is deposited in the trench to fill the trench. The STI structure in a fabricated device includes a bottom portion having silicon oxide and a top portion having additionally a silicon oxide liner and a silicon liner on the sidewalls.
    Type: Grant
    Filed: February 12, 2015
    Date of Patent: December 8, 2015
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Yi Chuang, Ta-Hsiang Kung, Hsing-Jui Lee, Ming-Te Chen
  • Publication number: 20150155352
    Abstract: Embodiments of the disclosure include a shallow trench isolation (STI) structure and a method of forming the same. A trench is formed in a substrate. A silicon oxide and a silicon liner layer are formed on sidewalls and a bottom surface of the trench. A flowable silicon oxide material fills in the trench, is cured, and then is partially removed. Another silicon oxide is deposited in the trench to fill the trench. The STI structure in a fabricated device includes a bottom portion having silicon oxide and a top portion having additionally a silicon oxide liner and a silicon liner on the sidewalls.
    Type: Application
    Filed: February 12, 2015
    Publication date: June 4, 2015
    Inventors: Chia-Yi Chuang, Ta-Hsiang Kung, Hsing-Jui Lee, Ming-Te Chen
  • Patent number: 8975155
    Abstract: Embodiments of the disclosure include a shallow trench isolation (STI) structure and a method of forming the same. A trench is formed in a substrate. A silicon oxide and a silicon liner layer are formed on sidewalls and a bottom surface of the trench. A flowable silicon oxide material fills in the trench, is cured, and then is partially removed. Another silicon oxide is deposited in the trench to fill the trench. The STI structure in a fabricated device includes a bottom portion having silicon oxide and a top portion having additionally a silicon oxide liner and a silicon liner on the sidewalls.
    Type: Grant
    Filed: July 10, 2013
    Date of Patent: March 10, 2015
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Yi Chuang, Ta-Hsiang Kung, Hsing-Jui Lee, Ming-Te Chen
  • Publication number: 20150014807
    Abstract: Embodiments of the disclosure include a shallow trench isolation (STI) structure and a method of forming the same. A trench is formed in a substrate. A silicon oxide and a silicon liner layer are formed on sidewalls and a bottom surface of the trench. A flowable silicon oxide material fills in the trench, is cured, and then is partially removed. Another silicon oxide is deposited in the trench to fill the trench. The STI structure in a fabricated device includes a bottom portion having silicon oxide and a top portion having additionally a silicon oxide liner and a silicon liner on the sidewalls.
    Type: Application
    Filed: July 10, 2013
    Publication date: January 15, 2015
    Inventors: Chia-Yi Chuang, Ta-Hsiang Kung, Hsing-Jui Lee, Ming-Te Chen
  • Publication number: 20140154414
    Abstract: An atomic layer deposition apparatus includes a chamber including a plurality of regions; and a heating device respectively providing specific temperature ranges for the plurality of regions.
    Type: Application
    Filed: December 3, 2012
    Publication date: June 5, 2014
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Yi CHUANG, Hsing-Jui Lee, Ming-Te Chen
  • Patent number: 8367161
    Abstract: A method of preparing carbon nanotube/polymer composite having electromagnetic interference (EMI) shielding effectiveness is disclosed, which includes: dispersing multi-walled carbon nanotubes (MWCNT) in an organic solvent such as N,N-Dimethylacetamide (DMAc); dissolving monomers such as methyl methacrylate (MMA) and an initiator such as 2,2-azobisisobutyronitrile (AIBN) in the MWCNT dispersion; and polymerizing the monomers in the resulting mixture at an elevated temperature such as 120° C. to form a MWCNT/PMMA composite. The composite is coated onto a PET film, and the coated PET film alone or a stack of multiple coated PET films can be applied as an EMI shielding material.
    Type: Grant
    Filed: April 26, 2011
    Date of Patent: February 5, 2013
    Assignee: National Tsing Hua University
    Inventors: Chen-Chi Martin Ma, Siu-Ming Yuen, Chia-Yi Chuang, Kuo-Chi Yu, Sheng Yen Wu
  • Publication number: 20110200740
    Abstract: A method of preparing carbon nanotube/polymer composite having electromagnetic interference (EMI) shielding effectiveness is disclosed, which includes: dispersing multi-walled carbon nanotubes (MWCNT) in an organic solvent such as N,N-Dimethylacetamide (DMAc); dissolving monomers such as methyl methacrylate (MMA) and an initiator such as 2,2-azobisisobutyronitrile (AIBN) in the MWCNT dispersion; and polymerizing the monomers in the resulting mixture at an elevated temperature such as 120° C. to form a MWCNT/PMMA composite. The composite is coated onto a PET film, and the coated PET film alone or a stack of multiple coated PET films can be applied as an EMI shielding material.
    Type: Application
    Filed: April 26, 2011
    Publication date: August 18, 2011
    Applicant: National Tsing Hua University
    Inventors: Chen-Chi Martin MA, Siu-Ming Yuen, Chia-Yi Chuang, Kuo-Chi Yu, Sheng Yen Wu
  • Patent number: 7955654
    Abstract: A method of preparing carbon nanotube/polymer composite having electromagnetic interference (EMI) shielding effectiveness is disclosed, which includes: dispersing multi-walled carbon nanotubes (MWCNT) in an organic solvent such as N,N-Dimethylacetamide (DMAc); dissolving monomers such as methyl methacrylate (MMA) and an initiator such as 2,2-azobisisobutyronitrile (AIBN) in the MWCNT dispersion; and polymerizing the monomers in the resulting mixture at an elevated temperature such as 120° C. to form a MWCNT/PMMA composite. The composite is coated onto a PET film, and the coated PET film alone or a stack of multiple coated PET films can be applied as an EMI shielding material.
    Type: Grant
    Filed: April 17, 2008
    Date of Patent: June 7, 2011
    Assignee: National Tsing Hua University
    Inventors: Chen-Chi Martin Ma, Siu-Ming Yuen, Chia-Yi Chuang, Kuo-Chi Yu, Sheng Yen Wu
  • Publication number: 20100136327
    Abstract: The present invention provides a modified carbon nanotube having —C(O)—R? or —C(O)—R—COOH covalently bounded to a surface of carbon nanotube, wherein R? is C1-C26 alkyl or C2-C26 alkenyl, and R is C1-C26 alkylene or C2-C26 alkenylene. The present invention also discloses a carbon nanotubes/polymer composite having electromagnetic interference shielding effectiveness, which contains 0.1-10% of modified carbon nanotubes, based on the weight of the polymer. The present invention further provides methods for preparing the modified carbon nanotubes and the composite.
    Type: Application
    Filed: December 17, 2009
    Publication date: June 3, 2010
    Applicant: National Tsing Hua University
    Inventors: Chen-Chi Martin Ma, Siu-Ming Yuen, Chia-Yi Chuang, Kuo-Chi Yu, Sheng Yen Wu
  • Publication number: 20100040858
    Abstract: A method of preparing carbon nanotube/polymer composite is disclosed, which includes: forming a layer of TiO2 on carbon nanotubes (CNTs) with a precursor of TiO2 by a sol-gel or hydrothermal method, a weight ratio of the TiO2 precursor to CNT being 0.3:1 to 30:1; modifying the TiO2-coated CNTs with a coupling agent to improve the affinity thereof to a polymer; and mixing a polymer with the resulting modified TiO2-coated CNTs to form a TiO2-coated CNT reinforced polymer composite. The mechanical properties of the polymer composite can be enhanced by using an additional fiber reinforcement material.
    Type: Application
    Filed: October 20, 2009
    Publication date: February 18, 2010
    Applicant: National Tsing Hua University
    Inventors: Chen-Chi Martin Ma, Siu-Ming Yuen, Chia-Yi Chuang
  • Publication number: 20090104361
    Abstract: A method of preparing carbon nanotube/polymer composite having electromagnetic interference (EMI) shielding effectiveness is disclosed, which includes: dispersing multi-walled carbon nanotubes (MWCNT) in an organic solvent such as N,N-Dimethylacetamide (DMAc); dissolving monomers such as methyl methacrylate (MMA) and an initiator such as 2,2-azobisisobutyronitrile (AIBN) in the MWCNT dispersion; and polymerizing the monomers in the resulting mixture at an elevated temperature such as 120° C. to form a MWCNT/PMMA composite. The composite is coated onto a PET film, and the coated PET film alone or a stack of multiple coated PET films can be applied as an EMI shielding material.
    Type: Application
    Filed: April 17, 2008
    Publication date: April 23, 2009
    Applicant: National Tsing Hua University
    Inventors: Chen-Chi Martin Ma, Siu-Ming Yuen, Chia-Yi Chuang, Kuo-Chi Yu, Sheng Yen Wu
  • Publication number: 20080242785
    Abstract: A method of preparing carbon nanotube/polymer composite is disclosed, which includes: forming a layer of TiO2 on carbon nanotubes (CNTs) with a precursor of TiO2 by a sol-gel or hydrothermal method, a weight ratio of the TiO2 precursor to CNT being 0.3:1 to 30:1; modifying the TiO2-coated CNTs with a coupling agent to improve the affinity thereof to a polymer; and mixing a polymer with the resulting modified TiO2-coated CNTs to form a TiO2-coated CNT reinforced polymer composite. The mechanical properties of the polymer composite can be enhanced by using an additional fiber reinforcement material.
    Type: Application
    Filed: June 19, 2007
    Publication date: October 2, 2008
    Applicant: National Tsing Hua University
    Inventors: Chen-Chi Martin Ma, Siu-Ming Yuen, Chia-Yi Chuang