Patents by Inventor Chia-Yin Joyce Wei

Chia-Yin Joyce Wei has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Aluminum post-etch residue removal with simultaneous surface passivation
    Patent number: 8951950
    Abstract: Al post-etch residue removal composition doped with an alkanoic acid of the formula R—COOH, where R can be a linear or branched alkyl group in the form of CnH2n+1, where n is from 4 to 19, simultaneously passivates exposed Al surfaces while removing post-etch residues.
    Type: Grant
    Filed: March 11, 2013
    Date of Patent: February 10, 2015
    Inventor: Chia-Yin Joyce Wei
  • ALUMINUM POST-ETCH RESIDUE REMOVAL WITH SIMULTANEOUS SURFACE PASSIVATION
    Publication number: 20130237469
    Abstract: Al post-etch residue removal composition doped with an alkanoic acid of the formula R—COOH, where R can be a linear or branched alkyl group in the form of CnH2n+1, where n is from 4 to 19, simultaneously passivates exposed Al surfaces while removing post-etch residues.
    Type: Application
    Filed: March 11, 2013
    Publication date: September 12, 2013
    Applicant: EKC Technology, Inc.
    Inventor: Chia-Yin Joyce Wei