Patents by Inventor Chiaki Hatsuta

Chiaki Hatsuta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11118258
    Abstract: A deposition mask includes a mask body and a through-hole provided in the mask body and through which a deposition material passes when the deposition material is deposited on a deposition target substrate. The mask body satisfies y?950 and y?23x?1280 when an indentation elastic modulus is x (GPa) and a 0.2% yield strength is y (MPa).
    Type: Grant
    Filed: February 5, 2019
    Date of Patent: September 14, 2021
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao Ikenaga, Yo Shimazaki, Kentarou Seki, Hiroki Furushou, Chiaki Hatsuta
  • Publication number: 20210214843
    Abstract: A vapor deposition mask includes: a metal mask in which a metal mask opening is provided; and a resin mask in which a resin mask opening corresponding to a pattern to be produced by vapor deposition is provided at a position overlapping with the metal mask opening, the metal mask and the resin mask being stacked, wherein an arithmetic average height (Sa) of a surface of the resin mask exposed from the metal mask opening is not more than 0.8 ?m.
    Type: Application
    Filed: December 15, 2020
    Publication date: July 15, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Yasuko SONE, Hiroshi KAWASAKI, Yoshinori HIROBE, Katsunari OBATA, Asako NARITA, Hitoshi ISHIRO, Chiaki HATSUTA
  • Publication number: 20210157232
    Abstract: A metal plate used for manufacturing a deposition mask has a thickness of equal to or less than 30 ?m. An average cross-sectional area of the crystals grains on a cross section of the metal plate is from 0.5 ?m2 to 50 ?m2. The average cross-sectional area of crystal grains is calculated by analyzing measurement results obtained by an EBSD method, the measuring results being analyzed by an area method under conditions where a portion with a difference in crystal orientation of 5 degrees or more is recognized as a crystal grain boundary.
    Type: Application
    Filed: February 5, 2021
    Publication date: May 27, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao IKENAGA, Chiaki HATSUTA, Hiroki OKA, Sachiyo MATSUURA, Hideyuki OKAMOTO, Masato USHIKUSA
  • Publication number: 20210108312
    Abstract: A method for manufacturing a metal plate, the metal plate including a first surface and a second surface positioned on the opposite side of the first surface, may include a step of rolling a base metal having an iron alloy containing nickel to produce the metal plate. The metal plate may include particles containing as a main component an element other than iron and nickel. In a sample including the first surface and the second surface of the metal plate, the following conditions (1) and (2) regarding the particles may be satisfied: (1) The number of the particles having an equivalent circle diameter of 1 ?m or more is 50 or more and 3000 or less per 1 mm3 in the sample, and (2) The number of the particles having an equivalent circle diameter of 3 ?m or more is 50 or less per 1 mm3 in the sample.
    Type: Application
    Filed: October 14, 2020
    Publication date: April 15, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Hiroki OKA, Chikao IKENAGA, Sachiyo MATSUURA, Shogo ENDO, Chiaki HATSUTA, Asako NARITA
  • Publication number: 20210102268
    Abstract: A method for manufacturing a metal plate, the metal plate including a first surface and a second surface positioned on the opposite side of the first surface, may include a step of rolling a base metal having an iron alloy containing nickel to produce the metal plate. The metal plate may include particles containing as a main component an element other than iron and nickel. In a sample including the first surface and the second surface of the metal plate, the following conditions (1) and (2) regarding the particles may be satisfied: (1) The number of the particles having an equivalent circle diameter of 1 ?m or more is 50 or more and 3000 or less per 1 mm3 in the sample, and (2) The number of the particles having an equivalent circle diameter of 3 ?m or more is 50 or less per 1 mm3 in the sample.
    Type: Application
    Filed: July 28, 2020
    Publication date: April 8, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Hiroki OKA, Chikao IKENAGA, Sachiyo MATSUURA, Shogo ENDO, Chiaki HATSUTA, Asako NARITA
  • Patent number: 10895008
    Abstract: A vapor deposition mask includes: a metal mask in which a metal mask opening is provided; and a resin mask in which a resin mask opening corresponding to a pattern to be produced by vapor deposition is provided at a position overlapping with the metal mask opening, the metal mask and the resin mask being stacked, wherein an arithmetic average height (Sa) of a surface of the resin mask exposed from the metal mask opening is not more than 0.8 ?m.
    Type: Grant
    Filed: March 30, 2018
    Date of Patent: January 19, 2021
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Yasuko Sone, Hiroshi Kawasaki, Yoshinori Hirobe, Katsunari Obata, Asako Narita, Hitoshi Ishiro, Chiaki Hatsuta
  • Publication number: 20200259090
    Abstract: A vapor deposition mask includes: a metal mask in which a metal mask opening is provided; and a resin mask in which a resin mask opening corresponding to a pattern to be produced by vapor deposition is provided at a position overlapping with the metal mask opening, the metal mask and the resin mask being stacked, wherein an arithmetic average height (Sa) of a surface of the resin mask exposed from the metal mask opening is not more than 0.8 ?m.
    Type: Application
    Filed: March 30, 2018
    Publication date: August 13, 2020
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Yasuko SONE, Hiroshi KAWASAKI, Yoshinori HIROBE, Katsunari OBATA, Asako NARITA, Hitoshi ISHIRO, Chiaki HATSUTA
  • Publication number: 20200149139
    Abstract: A metal plate used for manufacturing a deposition mask has a thickness of equal to or less than 30 ?m. An average cross-sectional area of the crystals grains on a cross section of the metal plate is from 0.5 ?m2 to 50 ?m2. The average cross-sectional area of crystal grains is calculated by analyzing measurement results obtained by an EBSD method, the measuring results being analyzed by an area method under conditions where a portion with a difference in crystal orientation of 5 degrees or more is recognized as a crystal grain boundary.
    Type: Application
    Filed: November 12, 2019
    Publication date: May 14, 2020
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Hiroki Oka, Sachiyo Matsuura, Chiaki Hatsuta, Chikao Ikenaga, Hideyuki Okamoto, Masato Ushikusa
  • Patent number: 10612124
    Abstract: The present invention provides a metal sheet, on a first surface of which a resist pattern having a narrow width can be stably provided. This manufacturing method for a metal sheet includes a preparation step of preparing a sheet material comprising an iron alloy that contains nickel. When a composition analysis of the first surface of the metal sheet obtained from the sheet material is performed using X-ray photoelectron spectroscopy, the ratio A1/A2 obtained by the result of the X-ray photoelectron spectroscopy does not exceed 0.4, where A1 is the sum of the peak area value of nickel oxide and the peak area value of nickel hydroxide, and A2 is the sum of the peak area value of iron oxide and the peak area value of iron hydroxide.
    Type: Grant
    Filed: January 17, 2019
    Date of Patent: April 7, 2020
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao Ikenaga, Hiroaki Nakayama, Kazunari Ikeda, Chiaki Hatsuta, Utako Oouchi
  • Patent number: 10570498
    Abstract: The present invention provides a metal sheet, on a first surface of which a resist pattern having a narrow width can be stably provided. This manufacturing method for a metal sheet includes a preparation step of preparing a sheet material comprising an iron alloy that contains nickel. When a composition analysis of the first surface of the metal sheet obtained from the sheet material is performed using X-ray photoelectron spectroscopy, the ratio A1/A2 obtained by the result of the X-ray photoelectron spectroscopy does not exceed 0.4, where A1 is the sum of the peak area value of nickel oxide and the peak area value of nickel hydroxide, and A2 is the sum of the peak area value of iron oxide and the peak area value of iron hydroxide.
    Type: Grant
    Filed: February 5, 2016
    Date of Patent: February 25, 2020
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao Ikenaga, Hiroaki Nakayama, Kazunari Ikeda, Chiaki Hatsuta, Utako Oouchi
  • Patent number: 10541387
    Abstract: A deposition mask includes a mask body and a through-hole provided in the mask body and through which a deposition material passes when the deposition material is deposited on a deposition target substrate. The mask body satisfies y?950 and y?23x?1280 when an indentation elastic modulus is x (GPa) and a 0.2% yield strength is y (MPa). When the mask body satisfies these inequalities, the generation of recesses during ultrasonic cleaning of the mask can be suppressed.
    Type: Grant
    Filed: May 23, 2018
    Date of Patent: January 21, 2020
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao Ikenaga, Yo Shimazaki, Kentarou Seki, Hiroki Furushou, Chiaki Hatsuta
  • Patent number: 10538838
    Abstract: A deposition mask includes a mask body and a through-hole provided in the mask body and through which a deposition material passes when the deposition material is deposited on a deposition target substrate. The mask body satisfies y?950 and y?23x?1280 when an indentation elastic modulus is x (GPa) and a 0.2% yield strength is y (MPa). When the mask body satisifies these inequalities, the generation of recesses during ultrasonic cleaning of the mask can be suppressed.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: January 21, 2020
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao Ikenaga, Yo Shimazaki, Kentarou Seki, Hiroki Furushou, Chiaki Hatsuta
  • Publication number: 20200017950
    Abstract: The metal plate includes a plurality of pits located on the surface of the metal plate. The manufacturing method for a metal plate for use in manufacturing of a deposition mask includes an inspection step of determining a quality of the metal plate based on a sum of volumes of a plurality of pits located at a portion of the surface of the metal plate.
    Type: Application
    Filed: September 21, 2019
    Publication date: January 16, 2020
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Hiroki OKA, Sachiyo Matsuura, Chiaki Hatsuta, Chikao Ikenaga, Hideyuki Okamoto, Masato Ushikusa
  • Publication number: 20200017951
    Abstract: A metal plate used for manufacturing a deposition mask has a thickness of equal to or less than 30 ?m. An average cross-sectional area of the crystals grains on a cross section of the metal plate is from 0.5 ?m2 to 50 ?m2. The average cross-sectional area of crystal grains is calculated by analyzing measurement results obtained by an EBSD method, the measuring results being analyzed by an area method under conditions where a portion with a difference in crystal orientation of 5 degrees or more is recognized as a crystal grain boundary.
    Type: Application
    Filed: September 24, 2019
    Publication date: January 16, 2020
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao IKENAGA, Chiaki Hatsuta, Hiroki Oka, Sachiyo Matsuura, Hideyuki Okamoto, Masato Ushikusa
  • Publication number: 20200019056
    Abstract: A metal plate includes a surface including a longitudinal direction of the metal plate and a width direction orthogonal to the longitudinal direction. A surface reflectance by regular reflection of a light is 8% or more and 25% or less. The surface reflectance is measured when the light is incident on the surface at an angle of 45°±0.2°. The light is in at least one plane orthogonal to the surface.
    Type: Application
    Filed: September 24, 2019
    Publication date: January 16, 2020
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao IKENAGA, Hideyuki Okamoto, Masato Ushikusa, Chiaki Hatsuta, Hiroki Oka, Sachiyo Matsuura
  • Publication number: 20190363312
    Abstract: Aluminum alloy foil that, when used for battery packaging material, unlikely to develop pinholes or cracks even during molding of battery packaging material, and can exhibit excellent moldability. Aluminum alloy foil, which is for use in battery packaging material, wherein, with respect to cross section obtained by cutting aluminum alloy foil in vertical direction to rolling direction of aluminum alloy foil, which is a vertical direction to surface of aluminum alloy foil, proportion of total area of a {111} plane in total area of crystal planes of face-centered cubic structure, obtained by performing crystal analysis using EBSD method, is 10% or more; and with respect to cross section, a number average grain diameter R (rpm) of crystals in face-centered cubic structure, obtained by performing crystal analysis using EBSD method, satisfies following equation: number average grain diameter R?0.056X+2.0, where X=thickness (rpm) of aluminum alloy foil.
    Type: Application
    Filed: December 27, 2017
    Publication date: November 28, 2019
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Atsuko TAKAHAGI, Tatsuro ISHITOBI, Chiaki HATSUTA, Makoto KOMUKAI, Mayo SUGANO
  • Publication number: 20190169733
    Abstract: A deposition mask includes a mask body and a through-hole provided in the mask body and through which a deposition material passes when the deposition material is deposited on a deposition target substrate. The mask body satisfies y?950 and y?23x?1280 when an indentation elastic modulus is x (GPa) and a 0.2% yield strength is y (MPa).
    Type: Application
    Filed: February 5, 2019
    Publication date: June 6, 2019
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao IKENAGA, Yo SHIMAZAKI, Kentarou SEKI, Hiroki FURUSHOU, Chiaki HATSUTA
  • Publication number: 20190161848
    Abstract: The present invention provides a metal sheet, on a first surface of which a resist pattern having a narrow width can be stably provided. This manufacturing method for a metal sheet includes a preparation step of preparing a sheet material comprising an iron alloy that contains nickel. When a composition analysis of the first surface of the metal sheet obtained from the sheet material is performed using X-ray photoelectron spectroscopy, the ratio A1/A2 obtained by the result of the X-ray photoelectron spectroscopy does not exceed 0.4, where A1 is the sum of the peak area value of nickel oxide and the peak area value of nickel hydroxide, and A2 is the sum of the peak area value of iron oxide and the peak area value of iron hydroxide.
    Type: Application
    Filed: January 17, 2019
    Publication date: May 30, 2019
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao IKENAGA, Hiroaki Nakayama, Kazunari Ikeda, Chiaki Hatsuta, Utako Oouchi
  • Publication number: 20180334740
    Abstract: A deposition mask includes a mask body and a through-hole provided in the mask body and through which a deposition material passes when the deposition material is deposited on a deposition target substrate. The mask body satisfies y?950 and y?23x?1280 when an indentation elastic modulus is x (GPa) and a 0.2% yield strength is y (MPa).
    Type: Application
    Filed: September 29, 2016
    Publication date: November 22, 2018
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao IKENAGA, Yo SHIMAZAKI, Kentarou SEKI, Hiroki FURUSHOU, Chiaki HATSUTA
  • Publication number: 20180277799
    Abstract: A deposition mask includes a mask body and a through-hole provided in the mask body and through which a deposition material passes when the deposition material is deposited on a deposition target substrate. The mask body satisfies y?950 and y?23x?1280 when an indentation elastic modulus is x (GPa) and a 0.2% yield strength is y (MPa).
    Type: Application
    Filed: May 23, 2018
    Publication date: September 27, 2018
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao Ikenaga, Yo Shimazaki, Kentarou Seki, Hiroki Furushou, Chiaki Hatsuta