Patents by Inventor Chian-Chih Hsiao
Chian-Chih Hsiao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8440482Abstract: A method for manufacturing a transflective liquid crystal display panel includes providing an array substrate having a plurality of pixel regions, each of the pixel regions includes a device region, a transmission region and a reflection region defined therein; forming a first metal layer on the array substrate; patterning the first metal layer to simultaneously form a gate electrode in the device region and a plurality of metal bumps in the reflection region; forming a first insulating layer having a rough surface and covering the gate electrode and the metal bumps on the array substrate; forming a patterned semiconductor layer on the gate electrode; forming a reflective layer covering the first insulating layer and having a rough surface in the reflection region; and sequentially forming a patterned second insulating layer and a transparent pixel electrode on the array substrate.Type: GrantFiled: December 15, 2010Date of Patent: May 14, 2013Assignee: HannStar Display Corp.Inventors: Sweehan J. H. Yang, Po-Sheng Shih, Chian-Chih Hsiao, Hsien-Tang Hu, Ting-Chung Liu
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Publication number: 20110147749Abstract: A method for manufacturing a transflective liquid crystal display panel includes providing an array substrate having a plurality of pixel regions, each of the pixel regions includes a device region, a transmission region and a reflection region defined therein; forming a first metal layer on the array substrate; patterning the first metal layer to simultaneously form a gate electrode in the device region and a plurality of metal bumps in the reflection region; forming a first insulating layer having a rough surface and covering the gate electrode and the metal bumps on the array substrate; forming a patterned semiconductor layer on the gate electrode; forming a reflective layer covering the first insulating layer and having a rough surface in the reflection region; and sequentially forming a patterned second insulating layer and a transparent pixel electrode on the array substrate.Type: ApplicationFiled: December 15, 2010Publication date: June 23, 2011Inventors: Sweehan J.H. Yang, Po-Sheng Shih, Chian-Chih Hsiao, Hsien-Tang Hu, Ting-Chung Liu
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Patent number: 7791080Abstract: A method of fabricating an image TFT array of a direct X-ray image sensor includes forming a first transparent conductive layer on a substrate; forming a gate line including a gate electrode, a common line, and a common electrode jutting out from the common line; forming an insulation layer; forming a semiconducting island on the insulation layer in the transistor region; forming a first via hole for the common electrode; forming a data line and a source electrode and a drain electrode; forming a passivation layer and a second via hole penetrating the passivation layer for the source electrode; forming a second transparent conductive layer as a top electrode. The insulation layer is formed on the first transparent conductive layer to serve as a dielectric layer of a capacitor before the TFT structure formed and can be formed at a relatively high temperature.Type: GrantFiled: October 14, 2008Date of Patent: September 7, 2010Assignee: HannStar Display Corp.Inventors: Chian-Chih Hsiao, Chih-Chieh Lan
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Publication number: 20090032892Abstract: A method of fabricating an image TFT array of a direct X-ray image sensor includes forming a first transparent conductive layer on a substrate; forming a gate line including a gate electrode, a common line, and a common electrode jutting out from the common line; forming an insulation layer; forming a semiconducting island on the insulation layer in the transistor region; forming a first via hole for the common electrode; forming a data line and a source electrode and a drain electrode; forming a passivation layer and a second via hole penetrating the passivation layer for the source electrode; forming a second transparent conductive layer as a top electrode. The insulation layer is formed on the first transparent conductive layer to serve as a dielectric layer of a capacitor before the TFT structure formed and can be formed at a relatively high temperature.Type: ApplicationFiled: October 14, 2008Publication date: February 5, 2009Inventors: Chian-Chih Hsiao, Chih-Chieh Lan
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Patent number: 7452782Abstract: A method of fabricating an image TFT array of a direct X-ray image sensor includes forming a first transparent conductive layer on a substrate; forming a gate line including a gate electrode, a common line, and a common electrode jutting out from the common line; forming an insulation layer; forming a semiconducting island on the insulation layer in the transistor region; forming a first via hole for the common electrode; forming a data line and a source electrode and a drain electrode; forming a passivation layer and a second via hole penetrating the passivation layer for the source electrode; forming a second transparent conductive layer as a top electrode. The insulation layer is formed on the first transparent conductive layer to serve as a dielectric layer of a capacitor before the TFT structure formed and can be formed at a relatively high temperature.Type: GrantFiled: November 21, 2005Date of Patent: November 18, 2008Assignee: HannStar Display Corp.Inventors: Chian-Chih Hsiao, Chih-Chieh Lan
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Patent number: 7439544Abstract: The present invention provides a manufacturing method of an image TFT array, which includes providing a substrate including a thin film transistor region, a storage capacitor region, a pad region, and a common electrode region, forming a photoresist layer on the substrate, and performing a photolithographic and etching process by utilizing a half-tone mask to pattern the photoresist layer to define a position of a through hole on the storage capacitor region and form the photoresist layer of a first thickness on the thin film transistor region and the photoresist layer of a second thickness on the region between the thin film transistor region and the storage capacitor region, wherein the first thickness is greater than the second thickness.Type: GrantFiled: April 25, 2005Date of Patent: October 21, 2008Assignee: HannStar Display Corp.Inventors: Chin-Mao Lin, Kei-Hsiung Yang, Chian-Chih Hsiao
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Publication number: 20070114625Abstract: A method of fabricating an image TFT array of a direct X-ray image sensor includes forming a first transparent conductive layer on a substrate; forming a gate line including a gate electrode, a common line, and a common electrode jutting out from the common line; forming an insulation layer; forming a semiconducting island on the insulation layer in the transistor region; forming a first via hole for the common electrode; forming a data line and a source electrode and a drain electrode; forming a passivation layer and a second via hole penetrating the passivation layer for the source electrode; forming a second transparent conductive layer as a top electrode. The insulation layer is formed on the first transparent conductive layer to serve as a dielectric layer of a capacitor before the TFT structure formed and can be formed at a relatively high temperature.Type: ApplicationFiled: November 21, 2005Publication date: May 24, 2007Inventors: Chian-Chih Hsiao, Chih-Chieh Lan
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Patent number: 7145172Abstract: A thin film transistor array substrate of a thin film transistor liquid crystal display (TFT-LCD) is provided. The gate dielectric layer of the TFT includes a silicon nitride layer, a dielectric layer and a silicon nitride layer, and the etching selectivity of the amorphous silicon layer over the dielectric layer is not less than about 5.0. Therefore, the dielectric layer can be an etching stop layer when doped and undoped amorphous silicon layers are etched to form source/drain stacked layers or a conductive layer is etched to form a gate on the gate dielectric layer. Hence, the dielectric layer thickness can be controlled, and thereby the capacitance of the storage capacitor can be controlled.Type: GrantFiled: September 2, 2004Date of Patent: December 5, 2006Assignee: Hannstar Display CorporationInventors: Chih-Yu Peng, Wei-Chuan Lin, Chian-Chih Hsiao, Ta-Ko Chuang, Chun-Hung Chu, Chih-Lung Lin, Chin-Mao Lin
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Publication number: 20060183263Abstract: The present invention provides a manufacturing method of an image TFT array, which includes providing a substrate including a thin film transistor region, a storage capacitor region, a pad region, and a common electrode region, forming a photoresist layer on the substrate, and performing a photolithographic and etching process by utilizing a half-tone mask to pattern the photoresist layer to define a position of a through hole on the storage capacitor region and form the photoresist layer of a first thickness on the thin film transistor region and the photoresist layer of a second thickness on the region between the thin film transistor region and the storage capacitor region, wherein the first thickness is greater than the second thickness.Type: ApplicationFiled: April 25, 2005Publication date: August 17, 2006Inventors: Chin-Mao Lin, Kei-Hsiung YANG, Chian-Chih Hsiao
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Patent number: 7087469Abstract: A method of controlling the capacitance of a thin film transistor liquid crystal display (TFT-LCD) storage capacitor is disclosed. In certain embodiments, the method includes i) forming a silicon island and a bottom electrode on the transparent substrate, the silicon island having an undoped region located on the central portion, and two doped regions respectively located on both sides, ii) forming a first silicon nitride layer on the transparent substrate, and iii) forming a stacked layer comprising a second silicon nitride layer and a conductive layer on the undoped region of the silicon island, and the first conductive layer of the stacked layer serving as a gate of a thin film transistor, wherein an etching selectivity ratio of the conductive layer over the dielectric layer is not less than about 5.0.Type: GrantFiled: September 3, 2004Date of Patent: August 8, 2006Assignee: Hannstar Display Corp.Inventors: Chih-Yu Peng, Wei-Chuan Lin, Chian-Chih Hsiao, Ta-Ko Chuang, Chun-Hung Chu, Chih-Lung Lin, Chin-Mao Lin
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Patent number: 6953715Abstract: A method of controlling the capacitance of a thin film transistor liquid crystal display (TFT-LCD) storage capacitor is disclosed. In certain embodiments, the method includes i) forming an undoped amorphous silicon layer on a silicon nitride layer, ii) forming an etching mask on the undoped amorphous silicon layer, and iii) forming two doped amorphous silicon layers on portion of the undoped amorphous silicon layer and the etching mask, the two doped amorphous silicon layers being spaced apart and located on either side of the gate, wherein an etching selectivity ratio of the undpoed and doped amorphous silicon layers over the dielectric layer being not less than about 5.0.Type: GrantFiled: September 3, 2004Date of Patent: October 11, 2005Assignee: HannStar Display CorporationInventors: Chih-Yu Peng, Wei-Chuan Lin, Chian-Chih Hsiao, Ta-Ko Chuang, Chun-Hung Chu, Chih-Lung Lin, Chin-Mao Lin
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Publication number: 20050037533Abstract: A method of controlling the capacitance of a thin film transistor liquid crystal display (TFT-LCD) storage capacitor is disclosed. In certain embodiments, the method includes i) forming an undoped amorphous silicon layer on a silicon nitride layer, ii) forming an etching mask on the undoped amorphous silicon layer, and iii) forming two doped amorphous silicon layers on portion of the undoped amorphous silicon layer and the etching mask, the two doped amorphous silicon layers being spaced apart and located on either side of the gate, wherein an etching selectivity ratio of the undpoed and doped amorphous silicon layers over the dielectric layer being not less than about 5.0.Type: ApplicationFiled: September 3, 2004Publication date: February 17, 2005Inventors: Chih-Yu Peng, Wei-Chuan Lin, Chian-Chih Hsiao, Ta-Ko Chuang, Chun-Hung Chu, Chih-Lung Lin, Chin-Mao Lin
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Publication number: 20050032263Abstract: A method of controlling the capacitance of a thin film transistor liquid crystal display (TFT-LCD) storage capacitor is disclosed. In certain embodiments, the method includes i) forming a silicon island and a bottom electrode on the transparent substrate, the silicon island having an undoped region located on the central portion, and two doped regions respectively located on both sides, ii) forming a first silicon nitride layer on the transparent substrate, and iii) forming a stacked layer comprising a second silicon nitride layer and a conductive layer on the undoped region of the silicon island, and the first conductive layer of the stacked layer serving as a gate of a thin film transistor, wherein an etching selectivity ratio of the conductive layer over the dielectric layer is not less than about 5.0.Type: ApplicationFiled: September 3, 2004Publication date: February 10, 2005Inventors: Chih-Yu Peng, Wei-Chuan Lin, Chian-Chih Hsiao, Ta-Ko Chuang, Chun-Hung Chu, Chih-Lung Lin, Chin-Mao Lin
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Publication number: 20050023533Abstract: A thin film transistor array substrate of a thin film transistor liquid crystal display (TFT-LCD) is provided. The gate dielectric layer of the TFT includes a silicon nitride layer, a dielectric layer and a silicon nitride layer, and the etching selectivity of the amorphous silicon layer over the dielectric layer is not less than about 5.0. Therefore, the dielectric layer can be an etching stop layer when doped and undoped amorphous silicon layers are etched to form source/drain stacked layers or a conductive layer is etched to form a gate on the gate dielectric layer. Hence, the dielectric layer thickness can be controlled, and thereby the capacitance of the storage capacitor can be controlled.Type: ApplicationFiled: September 2, 2004Publication date: February 3, 2005Inventors: Chih-Yu Peng, Wei-Chuan Lin, Chian-Chih Hsiao, Ta-Ko Chuang, Chun-Hung Chu, Chih-Lung Lin, Chin-Mao Lin
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Method of controlling storage capacitor's capacitance of thin film transistor liquid crystal display
Patent number: 6800510Abstract: A method of controlling the capacitance of the TFT-LCD storage capacitor is provided. The gate dielectric layer of the TFT is composed of a silicon nitride layer, a dielectric layer and a silicon nitride layer, and the etching selectivity of the amorphous silicon layer over the dielectric layer is not less than about 5.0. Therefore, the dielectric layer can be an etching stop layer when a doped and an undoped amorphous silicon layers are etched to form source/drain stacked layers or a conductive layer is etched to form a gate on the gate dielectric layer. Hence, the dielectric layer thickness can be controlled; thereby the capacitance of the storage capacitor can be controlled.Type: GrantFiled: November 6, 2002Date of Patent: October 5, 2004Assignee: HannStar Display CorporationInventors: Chih-Yu Peng, Wei-Chuan Lin, Chian-Chih Hsiao, Ta-Ko Chuang, Chun-Hung Chu, Chih-Lung Lin, Chin-Mao Lin -
Method of controlling storage capacitor's capacitance of thin film transistor liquid crystal display
Publication number: 20040084678Abstract: A method of controlling the capacitance of the TFT-LCD storage capacitor is provided. The gate dielectric layer of the TFT is composed of a silicon nitride layer, a dielectric layer and a silicon nitride layer, and the etching selectivity of the amorphous silicon layer over the dielectric layer is not less than about 5.0. Therefore, the dielectric layer can be an etching stop layer when a doped and an undoped amorphous silicon layers are etched to form source/drain stacked layers or a conductive layer is etched to form a gate on the gate dielectric layer. Hence, the dielectric layer thickness can be controlled; thereby the capacitance of the storage capacitor can be controlled.Type: ApplicationFiled: November 6, 2002Publication date: May 6, 2004Inventors: Chih-Yu Peng, Wei-Chuan Lin, Chian-Chih Hsiao, Ta-Ko Chuang, Chun-Hung Chu, Chih-Lung Lin, Chin-Mao Lin