Patents by Inventor Chian Wen HONG

Chian Wen HONG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polyhydric phenol resin, glycidyl ether of polyhydric phenol resin, and uses thereof
    Patent number: 11629216
    Abstract: A polyhydric phenol resin is provided. The polyhydric phenol resin comprises a polyhydric phenol resin component and a first component. When the polyhydric phenol resin is characterized in a high-performance liquid chromatography (HPLC), the first component is eluted at a retention time ranging from 27.1 minutes to 28.0 minutes, and based on the total area of the chromatographic peaks of the polyhydric phenol resin, the area percentage of the chromatographic peak of the first component at the corresponding retention time in the spectrum ranges from 1.0% to 20%.
    Type: Grant
    Filed: January 18, 2022
    Date of Patent: April 18, 2023
    Assignee: CHANG CHUN PLASTICS CO., LTD.
    Inventors: Chian Wen Hong, Sung-Kuang Chung, An-Pang Tu
  • POLYHYDRIC PHENOL RESIN, GLYCIDYL ETHER OF POLYHYDRIC PHENOL RESIN, AND USES THEREOF
    Publication number: 20220306794
    Abstract: A polyhydric phenol resin is provided. The polyhydric phenol resin comprises a polyhydric phenol resin component and a first component. When the polyhydric phenol resin is characterized in a high-performance liquid chromatography (HPLC), the first component is eluted at a retention time ranging from 27.1 minutes to 28.0 minutes, and based on the total area of the chromatographic peaks of the polyhydric phenol resin, the area percentage of the chromatographic peak of the first component at the corresponding retention time in the spectrum ranges from 1.0% to 20%.
    Type: Application
    Filed: January 18, 2022
    Publication date: September 29, 2022
    Inventors: Chian Wen HONG, Sung-Kuang CHUNG, An-Pang TU