Patents by Inventor Chiang-Jeh Chen

Chiang-Jeh Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230384185
    Abstract: The present disclosure includes methods and systems for monitoring real time quality of specialty fluids within one or more specialty fluid containers stored within one or more gas cabinets. The methods and systems monitoring the real time quality of the specialty fluids may utilize an analyzer and sampler to perform one or more tests on the specialty fluids to determine the quality of the specialty fluids in real time. The data collected by the analyzer and sampler may be stored on and processed with the on-line data system to determine if the quality of the specialty fluids is sufficient to be introduced to one or more workpiece processing tools for processing one or more workpieces. The data collected may be compared to a manufacturer technical specification with respect to the specialty fluid to determine if the manufacturer is providing specialty fluids of sufficient quality.
    Type: Application
    Filed: May 24, 2022
    Publication date: November 30, 2023
    Inventors: Chiang Jeh CHEN, Lien-Fang WU, Chieh-Jan HUANG
  • Publication number: 20230326772
    Abstract: A method includes moving a drum containing a chemical liquid into a chamber of a chemical liquid supplying system. The drum is connected with a testing pipe. The chemical liquid is pumped from the drum to the testing pipe. A condition of the chemical liquid flowing through the testing pipe is monitored. Whether the chemical liquid is supplied to a processing tool is determined based on the condition of the chemical liquid.
    Type: Application
    Filed: June 9, 2023
    Publication date: October 12, 2023
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yu-Cheng CHANG, Keng-Hui PAN, Chieh-Jan HUANG, Ming-Lee LEE, Chiang-Jeh CHEN
  • Patent number: 11715656
    Abstract: In accordance with some embodiments, a method for processing semiconductor wafer is provided. The method includes connecting a drum which stores the chemical liquid with a testing pipe. The method also includes guiding the chemical liquid in the drum into the testing pipe. In addition, the method includes detecting a condition of the chemical liquid in the testing pipe. The method further includes determining if the condition of the chemical liquid is acceptable. When the condition of the chemical liquid is acceptable, supplying the chemical liquid to a processing tool at which the semiconductor wafer is processed.
    Type: Grant
    Filed: April 1, 2020
    Date of Patent: August 1, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yu-Cheng Chang, Keng-Hui Pan, Chieh-Jan Huang, Ming-Lee Lee, Chiang-Jeh Chen
  • Publication number: 20210202285
    Abstract: In accordance with some embodiments, a method for processing semiconductor wafer is provided. The method includes connecting a drum which stores the chemical liquid with a testing pipe. The method also includes guiding the chemical liquid in the drum into the testing pipe. In addition, the method includes detecting a condition of the chemical liquid in the testing pipe. The method further includes determining if the condition of the chemical liquid is acceptable. When the condition of the chemical liquid is acceptable, supplying the chemical liquid to a processing tool at which the semiconductor wafer is processed.
    Type: Application
    Filed: April 1, 2020
    Publication date: July 1, 2021
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yu-Cheng CHANG, Keng-Hui PAN, Chieh-Jan HUANG, Ming-Lee LEE, Chiang-Jeh CHEN
  • Patent number: 7392818
    Abstract: A slurry dispensing system comprises a first supply station, a second supply station, a first loop, a second loop, a first valve and a second valve. The first loop is selectively connected to the first supply station and the second supply station. The second loop is also selectively connected to the first supply station and the second supply station. The first valve connects the first loop to points of use. The second valve connects the second loop to the points of use. When slurry is supplied to the first loop from the first slurry station, slurry is supplied to the second loop from the second slurry station. When the first valve is opened and the second valve is closed, slurry is supplied to the points of use from the first loop.
    Type: Grant
    Filed: November 7, 2006
    Date of Patent: July 1, 2008
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Ming-Tzung Hsu, Paul Tan, Chiang-Jeh Chen, Cho-Ching Chen, Hui-Ming Chu
  • Publication number: 20080017249
    Abstract: A slurry dispensing system comprises a first supply station, a second supply station, a first loop, a second loop, a first valve and a second valve. The first loop is selectively connected to the first supply station and the second supply station. The second loop is also selectively connected to the first supply station and the second supply station. The first valve connects the first loop to points of use. The second valve connects the second loop to the points of use. When slurry is supplied to the first loop from the first slurry station, slurry is supplied to the second loop from the second slurry station. When the first valve is opened and the second valve is closed, slurry is supplied to the points of use from the first loop.
    Type: Application
    Filed: November 7, 2006
    Publication date: January 24, 2008
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Ming-Tzung Hsu, Paul Tan, Chiang-Jeh Chen, Cho-Ching Chen, Hui-Ming Chu