Patents by Inventor Chiao-Lin Peng

Chiao-Lin Peng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photo mask with an ESD protective function
    Patent number: 6372390
    Abstract: The invention provides a photo mask with an electric discharge (ESD) protective function. The photo mask has a transparent substrate comprising quartz or glass, a patterned shielding layer located in the predetermined area of the surface of the transparent substrate, and an ESD protective layer positioned on the surface of the transparent substrate and surrounding the shielding layer. The ESD protective layer comprises a plurality of discharging peaks. The peaks aid in a neutralizing discharge reaction, which discharges harmful static electricity into the air.
    Type: Grant
    Filed: June 1, 2000
    Date of Patent: April 16, 2002
    Assignee: United Microelectronics Corp.
    Inventors: En-Chuan Liu, Chiao-Lin Peng, Tai-Yuan Lee