Patents by Inventor CHIAO-YANG LIN

CHIAO-YANG LIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photocurable coating composition and application thereof
    Patent number: 10774222
    Abstract: The present disclosure provides a photocurable coating composition, including: (a) a (meth)acrylate monomer or oligomer with at least four functional groups; (b) a difunctional (meth)acrylate monomer, (c) a monofunctional (meth)acrylate monomer, and (d) an initiator. The difunctional (meth)acrylate monomer is present in an amount of 30 to 70 wt % based on the total weight of the photocurable coating composition. The present disclosure also provides an optical film having a microstructure layer made from the photocurable coating composition. The optical film can be as a light guide film in a back light module of a display.
    Type: Grant
    Filed: June 28, 2019
    Date of Patent: September 15, 2020
    Assignee: ETERNAL MATERIALS CO., LTD.
    Inventors: Chiao-Yang Lin, Te-Sheng Yen, Hung-Yu Wang, Kun-Fu Yang
  • PHOTOCURABLE COATING COMPOSITION AND APPLICATION THEREOF
    Publication number: 20200002545
    Abstract: The present disclosure provides a photocurable coating composition, including: (a) a (meth)acrylate monomer or oligomer with at least four functional groups; (b) a difunctional (meth)acrylate monomer, (c) a monofunctional (meth)acrylate monomer, and (d) an initiator. The difunctional (meth)acrylate monomer is present in an amount of 30 to 70 wt % based on the total weight of the photocurable coating composition. The present disclosure also provides an optical film having a microstructure layer made from the photocurable coating composition. The optical film can be as a light guide film in a back light module of a display.
    Type: Application
    Filed: June 28, 2019
    Publication date: January 2, 2020
    Applicant: ETERNAL MATERIALS CO., LTD.
    Inventors: CHIAO-YANG LIN, TE-SHENG YEN, HUNG-YU WANG, KUN-FU YANG