Patents by Inventor Chidambara A. Ramalingam

Chidambara A. Ramalingam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200173017
    Abstract: Embodiments of the present disclosure generally relate to substrate support assemblies used in semiconductor device manufacturing. In one embodiment, a substrate support includes a ceramic body having at least one aperture formed therein defined by a sidewall. A plurality of recesses extend into the sidewall, a rod member is disposed in the at least one aperture, and an eyelet member is circumferentially disposed about the rod member. The eyelet member has a plurality of protrusions extending outwardly therefrom, each disposed in a corresponding recess of the plurality of recesses. A first portion of each protrusion is in contact with a sidewall of the respective recess of the ceramic body and a second portion of each protrusion is separated by a gap from the sidewall of the respective recess of the ceramic body. A first portion of a brazing material is disposed between an upper surface of the at least one aperture and an end of the rod member.
    Type: Application
    Filed: November 27, 2019
    Publication date: June 4, 2020
    Inventors: Chidambara A. RAMALINGAM, Juan Carlos ROCHA, Joseph M. POLESE, Katty Marie Lydia Gamon GUYOMARD, Jian LI
  • Publication number: 20190376202
    Abstract: An enhanced anodization method includes forming a porous anodization layer comprising columns of anodization layer material with pores between adjacent columns. The method further includes sealing the porous layer by forming a sealing layer at a top of the porous layer. The sealing layer may be formed by using a hybrid sealing process that combines, in any order, two or more of de-ionized (DI) water seal, Ni sealing, and, PTFE sealing. Alternatively, the sealing layer is formed by conformally coating the columns in the porous layer with one or more layers of a coating material. Further, the coating material may be surface-fluorinated to improve plasma resistance.
    Type: Application
    Filed: June 6, 2019
    Publication date: December 12, 2019
    Inventors: Xiao-Ming HE, Jennifer Y. SUN, David FENWICK, Cheng-Hsuan CHOU, Xiaowei WU, Chidambara A. RAMALINGAM, Michael R. RICE
  • Publication number: 20170352569
    Abstract: A heated support assembly is disclosed which includes a body comprising aluminum nitride doped with magnesium oxide having a volume resistivity of about 1×1010 ?-cm at about 600 degrees Celsius, an electrode embedded in the body, and a heater mesh embedded in the body.
    Type: Application
    Filed: June 2, 2017
    Publication date: December 7, 2017
    Inventors: Abdul Aziz KHAJA, Xing LIN, Edward P. HAMMOND, IV, Juan Carlos ROCHA-ALVAREZ, Chidambara A. RAMALINGAM, Ganesh BALASUBRAMANIAN, Ren-Guan DUAN, Jianhua ZHOU, Jonathan J. STRAHLE
  • Patent number: 8205352
    Abstract: Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip for contacting an edge area of a substrate, wherein the end effector is configured to support the substrate while the substrate is in a rinsing bath and while the substrate is being dried from the rinsing bath, and the contact tip comprises a hydrophilic material.
    Type: Grant
    Filed: July 13, 2011
    Date of Patent: June 26, 2012
    Assignee: Applied Materials, Inc.
    Inventors: John S. Lewis, Michael Biese, Garrett H. Sin, Chidambara A. Ramalingam, Balaji Chandrasekaran, Tak Fan (Kerry) Ling
  • Publication number: 20110266736
    Abstract: Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip for contacting an edge area of a substrate, wherein the end effector is configured to support the substrate while the substrate is in a rinsing bath and while the substrate is being dried from the rinsing bath, and the contact tip comprises a hydrophilic material.
    Type: Application
    Filed: July 13, 2011
    Publication date: November 3, 2011
    Inventors: JOHN S. LEWIS, Michael Biese, Garrett H. Sin, Chidambara A. Ramalingam, Balaji Chandrasekaran, Tak Fan (Kerry) Ling
  • Patent number: 7980000
    Abstract: Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip for contacting an edge area of a substrate, wherein the end effector is configured to support the substrate while the substrate is in a rinsing bath and while the substrate is being dried from the rinsing bath, and the contact tip comprises a hydrophilic material.
    Type: Grant
    Filed: October 21, 2008
    Date of Patent: July 19, 2011
    Assignee: Applied Materials, Inc.
    Inventors: John S. Lewis, Michael Biese, Garrett H. Sin, Chidambara A. Ramalingam, Balaji Chandrasekaran, Tak Fan (Kerry) Ling
  • Publication number: 20090217953
    Abstract: A drive roller for use in a semiconductor substrate cleaning system is provided. In one embodiment, a drive roller includes an outer ring having a disk-shaped body, wherein the disk-shaped body has an inner cylindrical, an upper wall, and an outer cylindrical wall defining a cavity within the disk-shaped body. An inner ring is disposed within the cavity. A groove is formed along an outer side of the inner ring. The groove faces an inner surface of the outer cylindrical wall of the outer ring.
    Type: Application
    Filed: February 28, 2008
    Publication date: September 3, 2009
    Inventors: HUI CHEN, Martin S. Kurnadi, Chidambara A. Ramalingam
  • Publication number: 20090084413
    Abstract: Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip for contacting an edge area of a substrate, wherein the end effector is configured to support the substrate while the substrate is in a rinsing bath and while the substrate is being dried from the rinsing bath, and the contact tip comprises a hydrophilic material.
    Type: Application
    Filed: October 21, 2008
    Publication date: April 2, 2009
    Inventors: JOHN S. LEWIS, Michael Biese, Garrett H. Sin, Chidambara A. Ramalingam, Balaji Chandrasekaran, Tak Fan (Kerry) Ling